JP2005242083A5 - - Google Patents
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- Publication number
- JP2005242083A5 JP2005242083A5 JP2004053252A JP2004053252A JP2005242083A5 JP 2005242083 A5 JP2005242083 A5 JP 2005242083A5 JP 2004053252 A JP2004053252 A JP 2004053252A JP 2004053252 A JP2004053252 A JP 2004053252A JP 2005242083 A5 JP2005242083 A5 JP 2005242083A5
- Authority
- JP
- Japan
- Prior art keywords
- dielectric medium
- concavo
- optical wavelength
- heat treatment
- wavelength plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 8
- 238000010438 heat treatment Methods 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 5
- 238000005530 etching Methods 0.000 claims 4
- 239000013081 microcrystal Substances 0.000 claims 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- 230000000737 periodic effect Effects 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 239000010955 niobium Substances 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000004408 titanium dioxide Substances 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004053252A JP4444693B2 (ja) | 2004-02-27 | 2004-02-27 | 光学波長板の製造方法 |
| US11/064,602 US7428101B2 (en) | 2004-02-27 | 2005-02-24 | Optical retardation plate and method of manufacturing the same |
| DE602005007782T DE602005007782D1 (de) | 2004-02-27 | 2005-02-25 | Optische Verzögerungsplatte und Verfahren zu ihrer Herstellung |
| EP05251146A EP1569014B1 (en) | 2004-02-27 | 2005-02-25 | Optical retardation plate and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004053252A JP4444693B2 (ja) | 2004-02-27 | 2004-02-27 | 光学波長板の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005242083A JP2005242083A (ja) | 2005-09-08 |
| JP2005242083A5 true JP2005242083A5 (enExample) | 2007-04-12 |
| JP4444693B2 JP4444693B2 (ja) | 2010-03-31 |
Family
ID=34747536
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004053252A Expired - Fee Related JP4444693B2 (ja) | 2004-02-27 | 2004-02-27 | 光学波長板の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7428101B2 (enExample) |
| EP (1) | EP1569014B1 (enExample) |
| JP (1) | JP4444693B2 (enExample) |
| DE (1) | DE602005007782D1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4814002B2 (ja) * | 2005-09-30 | 2011-11-09 | 株式会社リコー | 位相板の製造方法・光学素子および画像投射装置 |
| JP4597848B2 (ja) * | 2005-11-30 | 2010-12-15 | 京セラキンセキ株式会社 | 偏光変換素子 |
| JP2008008990A (ja) * | 2006-06-27 | 2008-01-17 | Ricoh Co Ltd | 波長板、画像投射装置、及び光ピックアップ装置 |
| JP2008164680A (ja) * | 2006-12-27 | 2008-07-17 | Canon Inc | 光学波長板及び該波長板の製造方法 |
| US7635634B2 (en) * | 2007-04-16 | 2009-12-22 | Infineon Technologies Ag | Dielectric apparatus and associated methods |
| US8512916B2 (en) * | 2008-03-31 | 2013-08-20 | Hoya Corporation | Photomask blank, photomask, and method for manufacturing photomask blank |
| CN103033862A (zh) * | 2012-12-17 | 2013-04-10 | 武汉电信器件有限公司 | 一种用于制备dfb激光器相移光栅的反射镜装置及其制备方法 |
| KR102501643B1 (ko) * | 2015-09-24 | 2023-02-20 | 삼성전자주식회사 | 고굴절률 광학 기능층을 포함하는 광학 장치 및 상기 광학 장치의 제조 방법 |
| US11740399B2 (en) * | 2018-02-06 | 2023-08-29 | Raytheon Company | Low cost dispersive optical elements |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2909363B2 (ja) | 1993-09-28 | 1999-06-23 | 日立金属株式会社 | 静磁波マイクロ波装置 |
| DE19502727A1 (de) * | 1995-01-28 | 1996-08-01 | Heidenhain Gmbh Dr Johannes | Phasengitter |
| JP2002182003A (ja) * | 2000-12-14 | 2002-06-26 | Canon Inc | 反射防止機能素子、光学素子、光学系および光学機器 |
| US6947215B2 (en) * | 2001-12-27 | 2005-09-20 | Canon Kabushiki Kaisha | Optical element, optical functional device, polarization conversion device, image display apparatus, and image display system |
| US6930326B2 (en) * | 2002-03-26 | 2005-08-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor circuit and method of fabricating the same |
-
2004
- 2004-02-27 JP JP2004053252A patent/JP4444693B2/ja not_active Expired - Fee Related
-
2005
- 2005-02-24 US US11/064,602 patent/US7428101B2/en not_active Expired - Fee Related
- 2005-02-25 DE DE602005007782T patent/DE602005007782D1/de not_active Expired - Lifetime
- 2005-02-25 EP EP05251146A patent/EP1569014B1/en not_active Expired - Lifetime
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