JP4444693B2 - 光学波長板の製造方法 - Google Patents

光学波長板の製造方法 Download PDF

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Publication number
JP4444693B2
JP4444693B2 JP2004053252A JP2004053252A JP4444693B2 JP 4444693 B2 JP4444693 B2 JP 4444693B2 JP 2004053252 A JP2004053252 A JP 2004053252A JP 2004053252 A JP2004053252 A JP 2004053252A JP 4444693 B2 JP4444693 B2 JP 4444693B2
Authority
JP
Japan
Prior art keywords
heat treatment
phase difference
etching
dielectric
dielectric medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004053252A
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English (en)
Japanese (ja)
Other versions
JP2005242083A (ja
JP2005242083A5 (enExample
Inventor
太輔 伊佐野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004053252A priority Critical patent/JP4444693B2/ja
Priority to US11/064,602 priority patent/US7428101B2/en
Priority to DE602005007782T priority patent/DE602005007782D1/de
Priority to EP05251146A priority patent/EP1569014B1/en
Publication of JP2005242083A publication Critical patent/JP2005242083A/ja
Publication of JP2005242083A5 publication Critical patent/JP2005242083A5/ja
Application granted granted Critical
Publication of JP4444693B2 publication Critical patent/JP4444693B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Polarising Elements (AREA)
JP2004053252A 2004-02-27 2004-02-27 光学波長板の製造方法 Expired - Fee Related JP4444693B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004053252A JP4444693B2 (ja) 2004-02-27 2004-02-27 光学波長板の製造方法
US11/064,602 US7428101B2 (en) 2004-02-27 2005-02-24 Optical retardation plate and method of manufacturing the same
DE602005007782T DE602005007782D1 (de) 2004-02-27 2005-02-25 Optische Verzögerungsplatte und Verfahren zu ihrer Herstellung
EP05251146A EP1569014B1 (en) 2004-02-27 2005-02-25 Optical retardation plate and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004053252A JP4444693B2 (ja) 2004-02-27 2004-02-27 光学波長板の製造方法

Publications (3)

Publication Number Publication Date
JP2005242083A JP2005242083A (ja) 2005-09-08
JP2005242083A5 JP2005242083A5 (enExample) 2007-04-12
JP4444693B2 true JP4444693B2 (ja) 2010-03-31

Family

ID=34747536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004053252A Expired - Fee Related JP4444693B2 (ja) 2004-02-27 2004-02-27 光学波長板の製造方法

Country Status (4)

Country Link
US (1) US7428101B2 (enExample)
EP (1) EP1569014B1 (enExample)
JP (1) JP4444693B2 (enExample)
DE (1) DE602005007782D1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4814002B2 (ja) * 2005-09-30 2011-11-09 株式会社リコー 位相板の製造方法・光学素子および画像投射装置
JP4597848B2 (ja) * 2005-11-30 2010-12-15 京セラキンセキ株式会社 偏光変換素子
JP2008008990A (ja) * 2006-06-27 2008-01-17 Ricoh Co Ltd 波長板、画像投射装置、及び光ピックアップ装置
JP2008164680A (ja) * 2006-12-27 2008-07-17 Canon Inc 光学波長板及び該波長板の製造方法
US7635634B2 (en) * 2007-04-16 2009-12-22 Infineon Technologies Ag Dielectric apparatus and associated methods
US8512916B2 (en) * 2008-03-31 2013-08-20 Hoya Corporation Photomask blank, photomask, and method for manufacturing photomask blank
CN103033862A (zh) * 2012-12-17 2013-04-10 武汉电信器件有限公司 一种用于制备dfb激光器相移光栅的反射镜装置及其制备方法
KR102501643B1 (ko) * 2015-09-24 2023-02-20 삼성전자주식회사 고굴절률 광학 기능층을 포함하는 광학 장치 및 상기 광학 장치의 제조 방법
US11740399B2 (en) * 2018-02-06 2023-08-29 Raytheon Company Low cost dispersive optical elements

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2909363B2 (ja) 1993-09-28 1999-06-23 日立金属株式会社 静磁波マイクロ波装置
DE19502727A1 (de) * 1995-01-28 1996-08-01 Heidenhain Gmbh Dr Johannes Phasengitter
JP2002182003A (ja) * 2000-12-14 2002-06-26 Canon Inc 反射防止機能素子、光学素子、光学系および光学機器
US6947215B2 (en) * 2001-12-27 2005-09-20 Canon Kabushiki Kaisha Optical element, optical functional device, polarization conversion device, image display apparatus, and image display system
US6930326B2 (en) * 2002-03-26 2005-08-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor circuit and method of fabricating the same

Also Published As

Publication number Publication date
US20050191467A1 (en) 2005-09-01
JP2005242083A (ja) 2005-09-08
EP1569014A1 (en) 2005-08-31
EP1569014B1 (en) 2008-07-02
US7428101B2 (en) 2008-09-23
DE602005007782D1 (de) 2008-08-14

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