JP4628651B2 - 窒化物半導体発光素子の製造方法 - Google Patents

窒化物半導体発光素子の製造方法 Download PDF

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Publication number
JP4628651B2
JP4628651B2 JP2003098976A JP2003098976A JP4628651B2 JP 4628651 B2 JP4628651 B2 JP 4628651B2 JP 2003098976 A JP2003098976 A JP 2003098976A JP 2003098976 A JP2003098976 A JP 2003098976A JP 4628651 B2 JP4628651 B2 JP 4628651B2
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layer
nitride semiconductor
type
grown
semiconductor layer
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JP2003283057A5 (enExample
JP2003283057A (ja
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慎一 長濱
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Nichia Corp
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Nichia Corp
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JP2003098976A 2003-04-02 2003-04-02 窒化物半導体発光素子の製造方法 Expired - Lifetime JP4628651B2 (ja)

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JP2003098976A JP4628651B2 (ja) 2003-04-02 2003-04-02 窒化物半導体発光素子の製造方法

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JP2003098976A JP4628651B2 (ja) 2003-04-02 2003-04-02 窒化物半導体発光素子の製造方法

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JP15764699A Division JP3446660B2 (ja) 1999-03-04 1999-06-04 窒化物半導体発光素子

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JP2003283057A JP2003283057A (ja) 2003-10-03
JP2003283057A5 JP2003283057A5 (enExample) 2006-07-13
JP4628651B2 true JP4628651B2 (ja) 2011-02-09

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005303278A (ja) * 2004-03-16 2005-10-27 Showa Denko Kk 窒化ガリウム系化合物半導体発光素子
JP2005310929A (ja) * 2004-04-20 2005-11-04 Nichia Chem Ind Ltd 窒化物半導体層のエッチング方法
US8304805B2 (en) * 2009-01-09 2012-11-06 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor diodes fabricated by aspect ratio trapping with coalesced films
JP5060656B2 (ja) 2009-12-21 2012-10-31 株式会社東芝 窒化物半導体発光素子およびその製造方法
JP5337862B2 (ja) * 2011-12-19 2013-11-06 株式会社東芝 半導体発光素子
JP5607106B2 (ja) * 2012-05-15 2014-10-15 株式会社東芝 窒化物半導体発光素子およびその製造方法
JP5811413B2 (ja) * 2013-03-21 2015-11-11 ウシオ電機株式会社 Ｌｅｄ素子

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