JP4628385B2 - 防汚コーティング組成物 - Google Patents
防汚コーティング組成物 Download PDFInfo
- Publication number
- JP4628385B2 JP4628385B2 JP2007061671A JP2007061671A JP4628385B2 JP 4628385 B2 JP4628385 B2 JP 4628385B2 JP 2007061671 A JP2007061671 A JP 2007061671A JP 2007061671 A JP2007061671 A JP 2007061671A JP 4628385 B2 JP4628385 B2 JP 4628385B2
- Authority
- JP
- Japan
- Prior art keywords
- meth
- acryloyloxy
- tetrasiloxane
- pentasiloxane
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003373 anti-fouling effect Effects 0.000 title claims description 23
- 239000008199 coating composition Substances 0.000 title claims description 13
- 229920000642 polymer Polymers 0.000 claims abstract description 46
- 239000000178 monomer Substances 0.000 claims abstract description 38
- 150000007942 carboxylates Chemical class 0.000 claims abstract description 33
- 229920001577 copolymer Polymers 0.000 claims abstract description 20
- -1 acrylic ester Chemical class 0.000 claims description 58
- MYEXCHICORPLLN-UHFFFAOYSA-N silyloxysilyloxysilyloxysilyloxysilyl prop-2-enoate Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH2]O[SiH2]OC(=O)C=C MYEXCHICORPLLN-UHFFFAOYSA-N 0.000 claims description 26
- SVFSMZHXBVWOJV-UHFFFAOYSA-N silyloxysilyloxysilyloxysilyl prop-2-enoate Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH2]OC(=O)C=C SVFSMZHXBVWOJV-UHFFFAOYSA-N 0.000 claims description 25
- AVFGQUFKRNPQHS-UHFFFAOYSA-N silyloxysilyloxysilyloxysilyloxysilyloxysilyl prop-2-enoate Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH2]O[SiH2]O[SiH2]OC(=O)C=C AVFGQUFKRNPQHS-UHFFFAOYSA-N 0.000 claims description 23
- 125000000217 alkyl group Chemical group 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 18
- 125000003118 aryl group Chemical group 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 10
- 125000004122 cyclic group Chemical group 0.000 claims description 10
- 150000002431 hydrogen Chemical class 0.000 claims description 10
- 125000003342 alkenyl group Chemical group 0.000 claims description 7
- 125000000304 alkynyl group Chemical group 0.000 claims description 7
- 150000002430 hydrocarbons Chemical class 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 6
- 239000011230 binding agent Substances 0.000 claims description 6
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 5
- 229920002554 vinyl polymer Polymers 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 3
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims description 3
- 125000004103 aminoalkyl group Chemical group 0.000 claims description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 3
- 125000002619 bicyclic group Chemical group 0.000 claims description 3
- 125000002950 monocyclic group Chemical group 0.000 claims description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 3
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 claims description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 229930195734 saturated hydrocarbon Natural products 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- 229920001567 vinyl ester resin Polymers 0.000 claims description 3
- 238000007334 copolymerization reaction Methods 0.000 claims description 2
- 239000004215 Carbon black (E152) Substances 0.000 claims 4
- 229930195733 hydrocarbon Natural products 0.000 claims 4
- 150000002148 esters Chemical class 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 claims 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 37
- 239000003054 catalyst Substances 0.000 abstract description 19
- 230000008569 process Effects 0.000 abstract description 16
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 35
- 238000006243 chemical reaction Methods 0.000 description 22
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 17
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 11
- 230000008901 benefit Effects 0.000 description 9
- 238000001914 filtration Methods 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 229920001429 chelating resin Polymers 0.000 description 8
- 239000003973 paint Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 7
- PGQNYIRJCLTTOJ-UHFFFAOYSA-N trimethylsilyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[Si](C)(C)C PGQNYIRJCLTTOJ-UHFFFAOYSA-N 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- UUEVFMOUBSLVJW-UHFFFAOYSA-N oxo-[[1-[2-[2-[2-[4-(oxoazaniumylmethylidene)pyridin-1-yl]ethoxy]ethoxy]ethyl]pyridin-4-ylidene]methyl]azanium;dibromide Chemical compound [Br-].[Br-].C1=CC(=C[NH+]=O)C=CN1CCOCCOCCN1C=CC(=C[NH+]=O)C=C1 UUEVFMOUBSLVJW-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- DMLZBRXPVYNNCH-UHFFFAOYSA-N [[[dimethyl(trimethylsilyloxy)silyl]oxy-dimethylsilyl]oxy-dimethylsilyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C DMLZBRXPVYNNCH-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- 229920000557 Nafion® Polymers 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 3
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000007142 ring opening reaction Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 3
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- 239000011968 lewis acid catalyst Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- WIJVUKXVPNVPAQ-UHFFFAOYSA-N silyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[SiH3] WIJVUKXVPNVPAQ-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- VSIKJPJINIDELZ-UHFFFAOYSA-N 2,2,4,4,6,6,8,8-octakis-phenyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound O1[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)O[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)O[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)O[Si]1(C=1C=CC=CC=1)C1=CC=CC=C1 VSIKJPJINIDELZ-UHFFFAOYSA-N 0.000 description 1
- FOHNTMRACRPKES-UHFFFAOYSA-N 2,2,4,4,6,6,8-heptamethyl-1,3,5,7,9,2,4,6,8,10-pentaoxapentasilecane Chemical compound C[SiH]1O[SiH2]O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 FOHNTMRACRPKES-UHFFFAOYSA-N 0.000 description 1
- KMPBCFZCRNKXSA-UHFFFAOYSA-N 2,2,4,4,6,6-hexaethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound CC[Si]1(CC)O[Si](CC)(CC)O[Si](CC)(CC)O1 KMPBCFZCRNKXSA-UHFFFAOYSA-N 0.000 description 1
- ANZPUCVQARFCDW-UHFFFAOYSA-N 2,2,4,4,6,6-hexamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C[Si]1(C)O[SiH2]O[Si](C)(C)O[Si](C)(C)O1 ANZPUCVQARFCDW-UHFFFAOYSA-N 0.000 description 1
- VGWXDPBVNZWQKG-UHFFFAOYSA-N 2,2,4,4,6,6-hexamethyl-1,3,5,7,9,2,4,6,8,10-pentaoxapentasilecane Chemical compound C[Si]1(C)O[SiH2]O[SiH2]O[Si](C)(C)O[Si](C)(C)O1 VGWXDPBVNZWQKG-UHFFFAOYSA-N 0.000 description 1
- SKYKARIMXZGKOD-UHFFFAOYSA-N 2,2,4,4,6-pentamethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound C[SiH]1O[Si](C)(C)O[Si](C)(C)O1 SKYKARIMXZGKOD-UHFFFAOYSA-N 0.000 description 1
- ZAKUVHZFBNPFNP-UHFFFAOYSA-N 2,2,4,4,6-pentamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C[SiH]1O[SiH2]O[Si](C)(C)O[Si](C)(C)O1 ZAKUVHZFBNPFNP-UHFFFAOYSA-N 0.000 description 1
- FXIGKFDLDUQCFQ-UHFFFAOYSA-N 2,2,4,4,6-pentamethyl-1,3,5,7,9,11-hexaoxa-2,4,6,8,10,12-hexasilacyclododecane Chemical compound C[SiH]1O[SiH2]O[SiH2]O[SiH2]O[Si](C)(C)O[Si](C)(C)O1 FXIGKFDLDUQCFQ-UHFFFAOYSA-N 0.000 description 1
- VFHGXMGRSHULBH-UHFFFAOYSA-N 2,2,4,4-tetramethyl-1,3,5,7,9,11-hexaoxa-2,4,6,8,10,12-hexasilacyclododecane Chemical compound C[Si]1(C)O[SiH2]O[SiH2]O[SiH2]O[SiH2]O[Si](C)(C)O1 VFHGXMGRSHULBH-UHFFFAOYSA-N 0.000 description 1
- WMLKWSDCQRRCAA-UHFFFAOYSA-N 2,2,4,4-tetramethyl-1,3,5,7,9,2,4,6,8,10-pentaoxapentasilecane Chemical compound C[Si]1(C)O[SiH2]O[SiH2]O[SiH2]O[Si](C)(C)O1 WMLKWSDCQRRCAA-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
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Description
本発明は、一般式(I)で表されるポリオルガノシリル化カルボキシレート単量体またはこれの重合体に関し、これは式(R4R5SiO)nで表されるシクロシロキサンと式(II)で表される不飽和オルガノシリル化カルボキシレートまたはこれの共重合体もしくは重合体を適切な触媒の存在下で反応させることにより得られる。
本発明は、一般式(I)で表されるポリオルガノシリル化カルボキシレート単量体またはこれの重合体に関し、本方法では、式(R4R5SiO)nで表されるシクロシロキサンと式(II)で表される不飽和オルガノシリル化カルボキシレートまたはこれの共重合体もしくは重合体を適切な触媒の存在下で反応させ、
チルトリヒドロ−シクロトリシロキサン、ペンタメチル−シクロトリシロキサン、1,3,5−トリメチル−1,3,5−トリス(3’,3’,3’−トリフルオロプロピル)−シクロトリシロキサン(F3)、1,1,3,3,5,5,7,7−オクタメチル−シクロテトラシロキサン(D4)、1,1,3,3,5,5,7,7−オクタフェニル−シクロテトラシロキサン、1,1,3,3,5,5,7,7−オクタビニル−シクロテトラシロキサン、1,3,5,7−テトラメチル−1,3,5,7−テトラヒドロ−シクロテトラシロキサン、1,3,5,7−テトラメチル−1,3,5,7−テトラ(1−オクチル)−シクロテトラシロキサン、1,3,5,7−テトラビニル−1,3,5,7−テトラメチル−シクロテトラシロキサン、1,3,5,7−テトラビニル−1,3,5,7−テトラエチル−シクロテトラシロキサン、1,3,5,7−テトラアリル−1,3,5,7−テトラフェニル−シクロテトラシロキサン、1,3,5,7−テトラ(1−ヘキサデシル)−1,3,5,7−テトラメチル−シクロテトラシロキサン、1,3,5,7−テトラオクチルテトラヒドロ−シクロテトラシロキサン、1,3,5,7−テトラビニルテトラヒドロ−シクロテトラシロキサン、1,3,5,7−テトラエチルテトラヒドロ−シクロテトラシロキサン、1,3,5,7−テトラプロペニルテトラヒドロ−シクロテトラシロキサン、1,3,5,7−テトラペンテニルテトラペンチル−シクロテトラシロキサン、1,3,5,7−テトラフェニルテトラヒドロ−シクロテトラシロキサン、ペンタメチル−シクロテトラシロキサン、ヘキサメチル−シクロテトラシロキサン、1,3,5,7−テトラメチル−1,3,5,7−テトラキス(3’,3’,3’−トリフルオロプロピル)−シクロテトラシロキサン(F4)、1,1,3,3,5,5,7,7,9,9−デカメチル−シクロペンタシロキサン(D5)、1,3,5,7,9−ペンタビニル−1,3,5,7,9−ペンタメチル−シクロペンタシロキサン、1,3,5,7,9−ペンタデセニル−1,3,5,7,9−ペンタプロピル−シクロペンタシロキサン、1,3,5,7,9−ペンタメチルペンタヒドロ−シクロペンタシロキサン、1,3,5,7,9−ペンタビニルペンタヒドロ−シクロペンタシロキサン、テトラメチル−シクロペンタシロキサン、ヘキサメチル−シクロペンタシロキサン、ヘプタメチル−シクロペンタシロキサン、1,1,3,3,5,5,7,7,9,9,11,11−ドデカメチル−シクロヘキサシロキサン(D6)、1,3,5,7,9,11−ヘキサビニルヘキサメチル−シクロヘキサシロキサン、1,3,5,7,9,11−ヘキサメチルヘキサヒドロ−シクロヘキサシロキサン、テトラメチル−シクロヘキサシロキサン、ペンタメチル−シクロヘキサシロキサン、1,3,5,7,9,11,13,15,17,19−デカビニルデカヒドロ−シクロデカシロキサン、1,3,5,7,9,11,13,15,17,19,21,23,25,27,29−ペンタデカビニルペンタデカヒドロ−シクロペンタデカシロキサンなどが含まれる。
シルシリル、(メタ)アクリル酸トリ−n−ヘキシルシリル、(メタ)アクリル酸トリ−n−オクチルシリル、(メタ)アクリル酸トリ−n−プロピルシリル、(メタ)アクリル酸トリフェニルシリル、(メタ)アクリル酸トリ−p−メチルフェニルシリル、(メタ)アクリル酸ジブチルシクロヘキシルシリル、(メタ)アクリル酸ジブチルフェニルシリル、(メタ)アクリル酸ジシクロヘキシルフェニルシリル、(メタ)アクリル酸ジイソプロピル−n−ブチルシリル、(メタ)アクリル酸ジイソプロピルステアリルシリル、(メタ)アクリル酸ジメチルブチルシリル、(メタ)アクリル酸ジメチルシクロヘキシルシリル、(メタ)アクリル酸ジメチルヘキシルシリル、(メタ)アクリル酸ジメチルオクチルシリル、(メタ)アクリル酸ジメチルフェニルシリル、(メタ)アクリル酸エチルジブチルシリル、(メタ)アクリル酸エチルジメチルシリル、(メタ)アクリル酸ラウリルジフェニルシリル、(メタ)アクリル酸メチルジブチルシリル、(メタ)アクリル酸n−オクチルジ−n−ブチルシリル、(メタ)アクリル酸t−ブチルジメチルシリル、(メタ)アクリル酸t−ブチルジフェニルシリル、イタコン酸ビス(トリメチルシリル)、フマル酸t−ブチルジフェニルシリル メチル、マレイン酸t−ブチルジフェニルシリル メチル、フマル酸t−ブチルジフェニルシリル n−ブチル、マレイン酸t−ブチルジフェニルシリル n−ブチル、フマル酸トリイソプロピルシリル アミル、マレイン酸トリイソプロピルシリル アミル、フマル酸トリイソプロピルシリル メチル、マレイン酸トリイソプロピルシリル メチル、フマル酸トリ−n−ブチルシリル n−ブチル、マレイン酸トリ−n−ブチルシリル n−ブチルなどおよびこれらの重合体または共重合体が含まれる[ここで、メタアクリレートまたはアクリレートを本明細書では集合的に「(メタ)アクリレート」と呼ぶ]。
エン、アミド、例えばN−メチルピロリドンおよびN,N−ジメチルホルムアミドなど、エーテル、例えばジオキサン、THFおよびジエチルエーテルなど、酢酸ブチル、n−ブタノール、2−エトキシエタノール、シクロヘキサノン、メチル−イソアミルケトン、2−メトキシエタノール、2−ブトキシエタノール、酢酸2−エトキシエチルおよびこれらの混合物など中で実施する。重合を好適には70−140℃の範囲の温度で実施するが、より高い温度も溶媒および触媒がそれに適合することを条件として使用可能である。この範囲内ならば使用する温度が高ければ高いほど生じる重合体の分子量が低くなる。重合は重合体材料の全部を溶媒中で加熱するか或は好適には加熱しておいた溶媒に単量体および触媒を徐々に添加することで実施可能である。後者の手順を用いて生じさせた重合体が示す分子量の方が低い。
ASP I/9(DELOXANはDegussの商標である)、DIAION SK1B(DIAIONはMitsubushiの商標である)、LEWATIT VP OC 1812、LEWATIT S 100 MB、LEWATIT S 100 G1(LEWATITはBayerの商標である)、NAFION SAC13、NAFION NR50(NAFIONはDuPontの商標である)およびCT275(Purliteから入手可能な孔直径中間値が600から750の範囲の巨視孔性樹脂)で知られる樹脂である。別の態様における適切なルイス酸触媒には、これらに限定するものでないが、ZnCl2、BeCl2、TiCl4、SnCl4、FeCl3、FeCl2、SbCl5、AlCl3および他の金属ハロゲン化物が含まれる。本発明に従う方法では、また、共触媒、例えば酢酸などを用いることも可能である。
ドロキノンもしくはフェノチアジンのモノメチルエーテルなどであり、これをシクロシロキサンと不飽和オルガノシリル化カルボキシレート(II)の総重量を基準にして0.001から2重量%、好適には0.002から0.7重量%の範囲の濃度で用いる。
)アクリロイルオキシ−ペンタシロキサン、ウンデカ−オクチル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、トリデカメチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカエチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−t−ブチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカベンジル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−イソプロピル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−n−プロピル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−イソブチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−アミル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−n−ブチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−ドデシル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−ヘキシル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−フェニル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−オクチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサンおよびこれらの重合体が含まれる。
[実施例]
以下の実施例ではNMRデータをCDCl3中で測定してTMSに対比させたデルタとして表す。特に明記しない限り、あらゆる反応体をAldrichから購入してさらなる精製なしに用いた。
リメチルシリルを35.6g、塩化亜鉛を2.5gおよび4−メトキシフェノールを0.4g溶解させた。100℃で11時間後、混合物を室温になるまで冷却し、トリエチルアミンを40ml添加した後、塩を濾過で除去した。溶媒を蒸発させた後、蒸留を減圧(0.3ミリバール、80℃)下で行うことで、高純度のノナメチル−1−メタアクリロイルオキシ−テトラシロキサンを得た。
13C NMR:167.0、137.7、126.4、18.5、2.0、1.3、1.1、0.0;
29Si NMR:7.3、−8.6、−20.1、−21.0;
IR(膜):2963、1707、1638、1335、1310、1261、1179、1082、1044、842、804cm−1。
メタアクリル酸メチルを148.5g、
アクリル酸ブチルを346.5g、
メタアクリル酸トリメチルシリルを49.5g、
パーオキシ−2−エチルヘキサン酸t−ブチル(=Akzo−Nobelが名称Trig
onox 21Sの下で販売しているTBPEH)を9.9g(=単量体総量を基準にして2%)。
Claims (9)
- 一般式(I):
R1、R2、R3、R4、R5は、各々独立して、水素、アルキル、アルケニル、アルキニル
、アリール、アラルキルまたはハロゲン基を表すが、これらは場合によりアルキル、アラルキル、アリール、ヒドロキシ、ハロゲン、アミノまたはアミノアルキル基から成る群から独立して選択される1個以上の置換基で置換されていてもよく、
R7は、水素、アルキル基または−COOR9(ここで、R9はアルキル基を表す)を表し
、
R8は、水素、アルキル基または−CH2−CO2−(SiR4R5O)n−SiR1R2R3を表し、
こゝでアルキルは直鎖、分枝もしくは環状部分又はそれらの組合わせを有し、炭素原子を1から20個含有する飽和炭化水素として定義され、アルケニルは1個または数個の二重結合を有し、直鎖、分枝もしくは環状部分またはそれらの組合わせを有し、炭素原子を2から18個含有する炭化水素として定義され、アルキニルは1個または数個の三重結合を有し、直鎖、分枝もしくは環状部分またはそれらの組合わせを有し、炭素原子を2から18個含有する炭化水素として定義され、アリールは芳香族炭化水素から水素が1個取り除かれることで生じた有機基を意味し、これには各環中の員数が7以下の単環状もしくは二環状炭素環のいずれも含まれるが、少くとも1個の環は芳香環であり、アラルキルは式アルキル−アリール(式中アルキルおよびアリールはこの上で定義したと同じ意味を有する)の群を意味し、そしてnは3から12を表す、]
で表される単量体の重合体もしくは共重合体を含んでなる防汚コーティング組成物。 - 式Iで表される単量体を、共重合用単量体単位として含んでなる請求項1記載の防汚コーティング組成物用の結合剤。
- R1、R2、R3、R4、R5およびR9を各々独立してメチル、エチル、プロピル、イソプロピル、イソブチル、n−ブチル、s−ブチル、t−ブチルから成る群から選択する請求項1記載の防汚コーティング組成物。
- R1、R2、R3、R4、R5およびR9がメチルである請求項3記載の防汚コーティング組成物。
- nが3から8を表す請求項1、3又は4のいずれかに記載の防汚コーティング組成物。
- nが3である請求項5記載の防汚コーティング組成物。
- 一般式(I):
R1、R2、R3、R4、R5は、各々独立して、水素、アルキル、アルケニル、アルキニル
、アリール、アラルキルまたはハロゲン基を表すが、これらは場合によりアルキル、アラルキル、アリール、ヒドロキシ、ハロゲン、アミノまたはアミノアルキル基から成る群から独立して選択される1個以上の置換基で置換されていてもよく、
R7は、水素、アルキル基または−COOR9(ここで、R9はアルキル基を表す)を表し
、
R8は、水素、アルキル基または−CH2−CO2−(SiR4R5O)n−SiR1R2R3を表し、
こゝでアルキルは直鎖、分枝もしくは環状部分又はそれらの組合わせを有し、炭素原子を1から20個含有する飽和炭化水素として定義され、アルケニルは1個または数個の二重結合を有し、直鎖、分枝もしくは環状部分またはそれらの組合わせを有し、炭素原子を2から18個含有する炭化水素として定義され、アルキニルは1個または数個の三重結合を有し、直鎖、分枝もしくは環状部分またはそれらの組合わせを有し、炭素原子を2から18個含有する炭化水素として定義され、アリールは芳香族炭化水素から水素が1個取り除かれることで生じた有機基を意味し、これには各環中の員数が7以下の単環状もしくは二環状炭素環のいずれも含まれるが、少くとも1個の環は芳香環であり、アラルキルは式アルキル−アリール(式中アルキルおよびアリールはこの上で定義したと同じ意味を有する)の群を意味し、そしてnは3から12を表す、]
で表されるポリオルガノシリル化カルボキシレート単量体またはその重合体もしくは共重合体を防汚コーティング組成物で使用する方法。 - 該ポリオルガノシリル化カルボキシレート単量体が、ノナメチル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナメチル−1−(メタ)アクリロイルオキシ−テト
ラシロキサン、ノナ−t−ブチル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナベンジル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナ−イソプロピル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナ−n−プロピル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナ−イソブチル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナ−アミル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナ−n−ブチル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナ−ドデシル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナ−ヘキシル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナ−フェニル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ノナ−オクチル−1−(メタ)アクリロイルオキシ−テトラシロキサン、ウンデカメチル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカエチル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカ−t−ブチル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカベンジル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカ−イソプロピル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカ−n−プロピル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカ−イソブチル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカ−アミル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカ−n−ブチル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカ−ドデシル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカ−ヘキシル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカ−フェニル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、ウンデカ−オクチル−1−(メタ)アクリロイルオキシ−ペンタシロキサン、トリデカメチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカエチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−t−ブチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカベンジル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−イソプロピル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−n−プロピル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−イソブチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−アミル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−n−ブチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−ドデシル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−ヘキシル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−フェニル−1−(メタ)アクリロイルオキシ−ヘキサシロキサン、トリデカ−オクチル−1−(メタ)アクリロイルオキシ−ヘキサシロキサンおよびその重合体、から成る群から選択される請求項1又は3〜6のいずれかに記載の防汚コーティング組成物。 - 式(I)で表される単量体が、アクリル酸エステル、メタアクリル酸エステル、スチレン、ビニルエステル、ビニルトルエン、アルファ−メチルスチレン、クロトン酸エステルおよびイタコン酸エステルから成るビニル単量体の群から選択される他の単量体と一緒に重合される請求項1、3〜6又8のいずれかに記載の防汚コーティング組成物。
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KR100772653B1 (ko) * | 2005-10-14 | 2007-11-02 | 주식회사 휘닉스피디이 | 플라즈마 디스플레이 패널용 감광성 무연 격벽 유리 조성물및 이를 포함하는 격벽을 포함하는 플라즈마 디스플레이패널 |
DE102008041601A1 (de) | 2008-08-27 | 2010-03-04 | Evonik Goldschmidt Gmbh | Verfahren zur Herstellung verzweigter SiH-funtioneller Polysiloxane und deren Verwendung zur Herstellung flüssiger, SiC- oder SiOC-verknüpfter, verzweigter organomodifizierter Polysiloxane |
JP5282526B2 (ja) | 2008-10-29 | 2013-09-04 | 信越化学工業株式会社 | 嵩高い置換基を有するシロキシ基含有シリル(メタ)アクリレート化合物及びその製造方法 |
JP5278040B2 (ja) * | 2009-02-27 | 2013-09-04 | 信越化学工業株式会社 | 嵩高い置換基を有するシロキシ基含有シリル(メタ)アクリレート化合物及びその製造方法 |
CN101838393B (zh) * | 2010-04-29 | 2012-04-04 | 山东大学 | 一种高分子量乙基聚硅氧烷的合成方法 |
JP4769331B1 (ja) * | 2010-08-25 | 2011-09-07 | 日東化成株式会社 | 防汚塗料組成物、防汚塗料組成物用共重合体、該組成物を用いて形成される防汚塗膜を表面に有する塗装物 |
WO2015012148A1 (ja) * | 2013-07-24 | 2015-01-29 | 日東化成株式会社 | 防汚塗料組成物、防汚塗料組成物用共重合体、該組成物を用いて形成される防汚塗膜、該塗膜を表面に有する塗装物、及び該塗膜を形成する防汚処理方法 |
US20180273793A1 (en) * | 2015-12-21 | 2018-09-27 | Nippon Soda Co., Ltd. | Coating agent |
US11679412B2 (en) | 2016-06-13 | 2023-06-20 | Gvd Corporation | Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles |
WO2017218561A1 (en) | 2016-06-13 | 2017-12-21 | Gvd Coproraton | Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles |
JP6638958B2 (ja) * | 2016-11-09 | 2020-02-05 | 中国塗料株式会社 | 防汚塗料組成物、防汚塗膜、防汚塗膜付き基材及びその製造方法、並びに防汚方法 |
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CN116574427B (zh) * | 2023-03-09 | 2024-03-19 | 浙江飞鲸新材料科技股份有限公司 | 海洋钢结构长效防护多层环氧重防腐涂层及制备方法 |
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AU2003250918A1 (en) | 2004-02-02 |
US7736634B2 (en) | 2010-06-15 |
US7595370B2 (en) | 2009-09-29 |
ES2339165T3 (es) | 2010-05-17 |
KR101159833B1 (ko) | 2012-06-26 |
KR20070047851A (ko) | 2007-05-07 |
ATE453676T1 (de) | 2010-01-15 |
KR20050044889A (ko) | 2005-05-13 |
DE60330815D1 (de) | 2010-02-11 |
JP4411277B2 (ja) | 2010-02-10 |
EP1795551B1 (en) | 2009-12-30 |
JP2005537335A (ja) | 2005-12-08 |
JP2007262063A (ja) | 2007-10-11 |
KR101035342B1 (ko) | 2011-05-20 |
DK1795551T3 (da) | 2010-03-08 |
US20060142516A1 (en) | 2006-06-29 |
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EP1795551A1 (en) | 2007-06-13 |
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