JP2005537335A - ポリオルガノシリル化カルボキシレート単量体またはこれの重合体の製造方法 - Google Patents
ポリオルガノシリル化カルボキシレート単量体またはこれの重合体の製造方法 Download PDFInfo
- Publication number
- JP2005537335A JP2005537335A JP2005505062A JP2005505062A JP2005537335A JP 2005537335 A JP2005537335 A JP 2005537335A JP 2005505062 A JP2005505062 A JP 2005505062A JP 2005505062 A JP2005505062 A JP 2005505062A JP 2005537335 A JP2005537335 A JP 2005537335A
- Authority
- JP
- Japan
- Prior art keywords
- meth
- acrylate
- cyclotetrasiloxane
- tri
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 title claims abstract description 57
- 150000007942 carboxylates Chemical class 0.000 title claims abstract description 47
- 239000000178 monomer Substances 0.000 title claims abstract description 42
- 238000000034 method Methods 0.000 title claims description 73
- 230000008569 process Effects 0.000 title claims description 27
- 239000003054 catalyst Substances 0.000 claims abstract description 27
- 229920001577 copolymer Polymers 0.000 claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 claims abstract description 6
- -1 tri-t-butylsilyl Chemical group 0.000 claims description 87
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 65
- 238000006243 chemical reaction Methods 0.000 claims description 25
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 20
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical group CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 230000003373 anti-fouling effect Effects 0.000 claims description 15
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
- 229920001429 chelating resin Polymers 0.000 claims description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 11
- 239000002904 solvent Substances 0.000 claims description 11
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
- 230000002378 acidificating effect Effects 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 8
- PGQNYIRJCLTTOJ-UHFFFAOYSA-N trimethylsilyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[Si](C)(C)C PGQNYIRJCLTTOJ-UHFFFAOYSA-N 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- UUEVFMOUBSLVJW-UHFFFAOYSA-N oxo-[[1-[2-[2-[2-[4-(oxoazaniumylmethylidene)pyridin-1-yl]ethoxy]ethoxy]ethyl]pyridin-4-ylidene]methyl]azanium;dibromide Chemical compound [Br-].[Br-].C1=CC(=C[NH+]=O)C=CN1CCOCCOCCN1C=CC(=C[NH+]=O)C=C1 UUEVFMOUBSLVJW-UHFFFAOYSA-N 0.000 claims description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 6
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 claims description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 6
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 6
- 239000011230 binding agent Substances 0.000 claims description 6
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 6
- 239000008096 xylene Substances 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 239000008199 coating composition Substances 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 5
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 5
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 5
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims description 5
- 229920001467 poly(styrenesulfonates) Polymers 0.000 claims description 5
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 5
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 claims description 5
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 claims description 4
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 claims description 4
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 claims description 4
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 4
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 claims description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 4
- 229920000557 Nafion® Polymers 0.000 claims description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 4
- 125000003342 alkenyl group Chemical group 0.000 claims description 4
- 125000000304 alkynyl group Chemical group 0.000 claims description 4
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 claims description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 4
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 claims description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 4
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 4
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- 229910001507 metal halide Inorganic materials 0.000 claims description 3
- 150000005309 metal halides Chemical class 0.000 claims description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 3
- VSIKJPJINIDELZ-UHFFFAOYSA-N 2,2,4,4,6,6,8,8-octakis-phenyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound O1[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)O[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)O[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)O[Si]1(C=1C=CC=CC=1)C1=CC=CC=C1 VSIKJPJINIDELZ-UHFFFAOYSA-N 0.000 claims description 2
- FOHNTMRACRPKES-UHFFFAOYSA-N 2,2,4,4,6,6,8-heptamethyl-1,3,5,7,9,2,4,6,8,10-pentaoxapentasilecane Chemical compound C[SiH]1O[SiH2]O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 FOHNTMRACRPKES-UHFFFAOYSA-N 0.000 claims description 2
- KMPBCFZCRNKXSA-UHFFFAOYSA-N 2,2,4,4,6,6-hexaethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound CC[Si]1(CC)O[Si](CC)(CC)O[Si](CC)(CC)O1 KMPBCFZCRNKXSA-UHFFFAOYSA-N 0.000 claims description 2
- ANZPUCVQARFCDW-UHFFFAOYSA-N 2,2,4,4,6,6-hexamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C[Si]1(C)O[SiH2]O[Si](C)(C)O[Si](C)(C)O1 ANZPUCVQARFCDW-UHFFFAOYSA-N 0.000 claims description 2
- SKYKARIMXZGKOD-UHFFFAOYSA-N 2,2,4,4,6-pentamethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound C[SiH]1O[Si](C)(C)O[Si](C)(C)O1 SKYKARIMXZGKOD-UHFFFAOYSA-N 0.000 claims description 2
- ZAKUVHZFBNPFNP-UHFFFAOYSA-N 2,2,4,4,6-pentamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C[SiH]1O[SiH2]O[Si](C)(C)O[Si](C)(C)O1 ZAKUVHZFBNPFNP-UHFFFAOYSA-N 0.000 claims description 2
- FXIGKFDLDUQCFQ-UHFFFAOYSA-N 2,2,4,4,6-pentamethyl-1,3,5,7,9,11-hexaoxa-2,4,6,8,10,12-hexasilacyclododecane Chemical compound C[SiH]1O[SiH2]O[SiH2]O[SiH2]O[Si](C)(C)O[Si](C)(C)O1 FXIGKFDLDUQCFQ-UHFFFAOYSA-N 0.000 claims description 2
- VFHGXMGRSHULBH-UHFFFAOYSA-N 2,2,4,4-tetramethyl-1,3,5,7,9,11-hexaoxa-2,4,6,8,10,12-hexasilacyclododecane Chemical compound C[Si]1(C)O[SiH2]O[SiH2]O[SiH2]O[SiH2]O[Si](C)(C)O1 VFHGXMGRSHULBH-UHFFFAOYSA-N 0.000 claims description 2
- WMLKWSDCQRRCAA-UHFFFAOYSA-N 2,2,4,4-tetramethyl-1,3,5,7,9,2,4,6,8,10-pentaoxapentasilecane Chemical compound C[Si]1(C)O[SiH2]O[SiH2]O[SiH2]O[Si](C)(C)O1 WMLKWSDCQRRCAA-UHFFFAOYSA-N 0.000 claims description 2
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 claims description 2
- DGLJYEKNUTVPAE-UHFFFAOYSA-N 2,4,6-triethyl-2,4,6-trimethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound CC[Si]1(C)O[Si](C)(CC)O[Si](C)(CC)O1 DGLJYEKNUTVPAE-UHFFFAOYSA-N 0.000 claims description 2
- QRHXSUHCDGHLPU-UHFFFAOYSA-N 2,4,6-trimethyl-2,4,6-tripropyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound CCC[Si]1(C)O[Si](C)(CCC)O[Si](C)(CCC)O1 QRHXSUHCDGHLPU-UHFFFAOYSA-N 0.000 claims description 2
- BVTLTBONLZSBJC-UHFFFAOYSA-N 2,4,6-tris(ethenyl)-2,4,6-trimethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O1 BVTLTBONLZSBJC-UHFFFAOYSA-N 0.000 claims description 2
- HVHZEKKZMFRULH-UHFFFAOYSA-N 2,6-ditert-butyl-4-methylpyridine Chemical compound CC1=CC(C(C)(C)C)=NC(C(C)(C)C)=C1 HVHZEKKZMFRULH-UHFFFAOYSA-N 0.000 claims description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 claims description 2
- GDSFIRXLDDSTRV-UHFFFAOYSA-N 2-octyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C(CCCCCCC)[SiH]1O[SiH2]O[SiH2]O[SiH2]O1 GDSFIRXLDDSTRV-UHFFFAOYSA-N 0.000 claims description 2
- JVTOYSICJJAYOI-FOCLMDBBSA-N 4-o-[tert-butyl(diphenyl)silyl] 1-o-methyl (e)-but-2-enedioate Chemical compound C=1C=CC=CC=1[Si](C(C)(C)C)(OC(=O)/C=C/C(=O)OC)C1=CC=CC=C1 JVTOYSICJJAYOI-FOCLMDBBSA-N 0.000 claims description 2
- JVTOYSICJJAYOI-NXVVXOECSA-N 4-o-[tert-butyl(diphenyl)silyl] 1-o-methyl (z)-but-2-enedioate Chemical compound C=1C=CC=CC=1[Si](C(C)(C)C)(OC(=O)\C=C/C(=O)OC)C1=CC=CC=C1 JVTOYSICJJAYOI-NXVVXOECSA-N 0.000 claims description 2
- RGUKYNXWOWSRET-UHFFFAOYSA-N 4-pyrrolidin-1-ylpyridine Chemical compound C1CCCN1C1=CC=NC=C1 RGUKYNXWOWSRET-UHFFFAOYSA-N 0.000 claims description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 2
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 claims description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- 125000004103 aminoalkyl group Chemical group 0.000 claims description 2
- IYEWOPPVIQNFQO-UHFFFAOYSA-N bis(trimethylsilyl) 2-methylidenebutanedioate Chemical compound C[Si](C)(C)OC(=O)CC(=C)C(=O)O[Si](C)(C)C IYEWOPPVIQNFQO-UHFFFAOYSA-N 0.000 claims description 2
- HAURRGANAANPSQ-UHFFFAOYSA-N cis-2,4,6-Trimethyl-2,4,6-triphenylcyclotrisiloxane Chemical compound O1[Si](C)(C=2C=CC=CC=2)O[Si](C)(C=2C=CC=CC=2)O[Si]1(C)C1=CC=CC=C1 HAURRGANAANPSQ-UHFFFAOYSA-N 0.000 claims description 2
- 238000007334 copolymerization reaction Methods 0.000 claims description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 239000012442 inert solvent Substances 0.000 claims description 2
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 claims description 2
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- 230000003472 neutralizing effect Effects 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 claims description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 claims description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 4
- IHRMXHHFNOEOEA-UHFFFAOYSA-N 2-phenyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C1(=CC=CC=C1)[SiH]1O[SiH2]O[SiH2]O[SiH2]O1 IHRMXHHFNOEOEA-UHFFFAOYSA-N 0.000 claims 1
- JJRDHFIVAPVZJN-UHFFFAOYSA-N cyclotrisiloxane Chemical compound O1[SiH2]O[SiH2]O[SiH2]1 JJRDHFIVAPVZJN-UHFFFAOYSA-N 0.000 claims 1
- 229960004419 dimethyl fumarate Drugs 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 239000012454 non-polar solvent Substances 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- SVFSMZHXBVWOJV-UHFFFAOYSA-N silyloxysilyloxysilyloxysilyl prop-2-enoate Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH2]OC(=O)C=C SVFSMZHXBVWOJV-UHFFFAOYSA-N 0.000 description 13
- MYEXCHICORPLLN-UHFFFAOYSA-N silyloxysilyloxysilyloxysilyloxysilyl prop-2-enoate Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH2]O[SiH2]OC(=O)C=C MYEXCHICORPLLN-UHFFFAOYSA-N 0.000 description 13
- 125000004432 carbon atom Chemical group C* 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 11
- AVFGQUFKRNPQHS-UHFFFAOYSA-N silyloxysilyloxysilyloxysilyloxysilyloxysilyl prop-2-enoate Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH2]O[SiH2]O[SiH2]OC(=O)C=C AVFGQUFKRNPQHS-UHFFFAOYSA-N 0.000 description 11
- 230000008901 benefit Effects 0.000 description 9
- 238000001914 filtration Methods 0.000 description 9
- 239000003973 paint Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- DMLZBRXPVYNNCH-UHFFFAOYSA-N [[[dimethyl(trimethylsilyloxy)silyl]oxy-dimethylsilyl]oxy-dimethylsilyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C DMLZBRXPVYNNCH-UHFFFAOYSA-N 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000007142 ring opening reaction Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 2
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- 239000011968 lewis acid catalyst Substances 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- WIJVUKXVPNVPAQ-UHFFFAOYSA-N silyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[SiH3] WIJVUKXVPNVPAQ-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 description 2
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- VGWXDPBVNZWQKG-UHFFFAOYSA-N 2,2,4,4,6,6-hexamethyl-1,3,5,7,9,2,4,6,8,10-pentaoxapentasilecane Chemical compound C[Si]1(C)O[SiH2]O[SiH2]O[Si](C)(C)O[Si](C)(C)O1 VGWXDPBVNZWQKG-UHFFFAOYSA-N 0.000 description 1
- JZODKRWQWUWGCD-UHFFFAOYSA-N 2,5-di-tert-butylbenzene-1,4-diol Chemical compound CC(C)(C)C1=CC(O)=C(C(C)(C)C)C=C1O JZODKRWQWUWGCD-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- QTRQFVAKGZFBRT-UHFFFAOYSA-N 2-(3,3,3-trifluoropropyl)-1,3,5,2,4,6-trioxatrisilinane Chemical compound FC(F)(F)CC[SiH]1O[SiH2]O[SiH2]O1 QTRQFVAKGZFBRT-UHFFFAOYSA-N 0.000 description 1
- IETMDFAMGCXQKZ-UHFFFAOYSA-N 2-(3,3,3-trifluoropropyl)-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound FC(F)(F)CC[SiH]1O[SiH2]O[SiH2]O[SiH2]O1 IETMDFAMGCXQKZ-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 125000006029 2-methyl-2-butenyl group Chemical group 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical group NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 1
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 241001474374 Blennius Species 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 101000923234 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) L-asparaginase 1 Proteins 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- QJMLLVXBMLOCRI-UHFFFAOYSA-N [dibutyl(octyl)silyl] prop-2-enoate Chemical compound CCCCCCCC[Si](CCCC)(CCCC)OC(=O)C=C QJMLLVXBMLOCRI-UHFFFAOYSA-N 0.000 description 1
- 125000002015 acyclic group Chemical group 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 125000001047 cyclobutenyl group Chemical group C1(=CCC1)* 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 125000000298 cyclopropenyl group Chemical group [H]C1=C([H])C1([H])* 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 238000002451 electron ionisation mass spectrometry Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 125000004030 farnesyl group Chemical group [H]C([*])([H])C([H])=C(C([H])([H])[H])C([H])([H])C([H])([H])C([H])=C(C([H])([H])[H])C([H])([H])C([H])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000011953 free-radical catalyst Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 125000002350 geranyl group Chemical group [H]C([*])([H])/C([H])=C(C([H])([H])[H])/C([H])([H])C([H])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002686 geranylgeranyl group Chemical group [H]C([*])([H])/C([H])=C(C([H])([H])[H])/C([H])([H])C([H])([H])/C([H])=C(C([H])([H])[H])/C([H])([H])C([H])([H])/C([H])=C(C([H])([H])[H])/C([H])([H])C([H])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000002638 heterogeneous catalyst Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005980 hexynyl group Chemical group 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 210000003739 neck Anatomy 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000006384 oligomerization reaction Methods 0.000 description 1
- 238000010915 one-step procedure Methods 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000005981 pentynyl group Chemical group 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- DOIRQSBPFJWKBE-UHFFFAOYSA-N phthalic acid di-n-butyl ester Natural products CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006294 polydialkylsiloxane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 235000015170 shellfish Nutrition 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- DJXAJTDFRRFQDI-UHFFFAOYSA-N silyloxy(silyloxysilyloxysilyloxysilyloxy)silane Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH2]O[SiH2]O[SiH3] DJXAJTDFRRFQDI-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000003797 telogen phase Effects 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 125000001712 tetrahydronaphthyl group Chemical group C1(CCCC2=CC=CC=C12)* 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 125000002306 tributylsilyl group Chemical group C(CCC)[Si](CCCC)(CCCC)* 0.000 description 1
- PIILXFBHQILWPS-UHFFFAOYSA-N tributyltin Chemical compound CCCC[Sn](CCCC)CCCC PIILXFBHQILWPS-UHFFFAOYSA-N 0.000 description 1
- PWVJTRQTFFVDEU-UHFFFAOYSA-N triethylsilyl 2-methylprop-2-enoate Chemical compound CC[Si](CC)(CC)OC(=O)C(C)=C PWVJTRQTFFVDEU-UHFFFAOYSA-N 0.000 description 1
- UGKLJUIMKCCNGS-UHFFFAOYSA-N triethylsilyl prop-2-enoate Chemical compound CC[Si](CC)(CC)OC(=O)C=C UGKLJUIMKCCNGS-UHFFFAOYSA-N 0.000 description 1
- ZYPHHWVSWUHVGF-UHFFFAOYSA-N tripropylsilyl prop-2-enoate Chemical compound CCC[Si](CCC)(CCC)OC(=O)C=C ZYPHHWVSWUHVGF-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
- C07F7/0872—Preparation and treatment thereof
- C07F7/0874—Reactions involving a bond of the Si-O-Si linkage
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F30/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F30/04—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F30/08—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Silicon Polymers (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Abstract
Description
本発明は、一般式(I)で表されるポリオルガノシリル化カルボキシレート単量体またはこれの重合体を製造する方法に関し、この方法は、式(R4R5SiO)nで表されるシクロシロキサンと式(II)で表される不飽和オルガノシリル化カルボキシレートまたはこれの共重合体もしくは重合体を適切な触媒の存在下で反応させる段階を含んで成り、
(発明の詳細な説明)
本発明は、一般式(I)で表されるポリオルガノシリル化カルボキシレート単量体またはこれの重合体を合成する新規な方法に関し、本方法では、式(R4R5SiO)nで表されるシクロシロキサンと式(II)で表される不飽和オルガノシリル化カルボキシレートまたはこれの共重合体もしくは重合体を適切な触媒の存在下で反応させ、
[実施例]
以下の実施例ではNMRデータをCDCl3中で測定してTMSに対比させたデルタとして表す。特に明記しない限り、あらゆる反応体をAldrichから購入してさらなる精製なしに用いた。
13C NMR:167.0、137.7、126.4、18.5、2.0、1.3、1.1、0.0;
29Si NMR:7.3、−8.6、−20.1、−21.0;
IR(膜):2963、1707、1638、1335、1310、1261、1179、1082、1044、842、804cm−1。
メタアクリル酸メチルを148.5g、
アクリル酸ブチルを346.5g、
メタアクリル酸トリメチルシリルを49.5g、
パーオキシ−2−エチルヘキサン酸t−ブチル(=Akzo−Nobelが名称Trigonox 21Sの下で販売しているTBPEH)を9.9g(=単量体総量を基準にして2%)。
Claims (31)
- 一般式(I):
R1、R2、R3、R4、R5は、各々独立して、水素、アルキル、アルケニル、アルキニル、アルキルオキシ、アリール、アラルキルまたはハロゲン基を表すが、これらは場合によりアルキル、アラルキル、アリール、ヒドロキシ、ハロゲン、アミノまたはアミノアルキル基を包含する群から独立して選択される1個以上の置換基で置換されていてもよく、
R6は、水素、アルキル基または−CH2−CO2−SiR1R2R3を表し、
R7は、水素、アルキル基または−COOR9(ここで、R9はアルキル基を表す)を表し、
R8は、水素、アルキル基または−CH2−CO2−(SiR4R5O)n−SiR1R2R3を表し、そして
nは、ジヒドロカルビルシロキサン単位の数3から20を表す]
で表されるポリオルガノシリル化カルボキシレート単量体またはこれの重合体を製造する方法であって、式(R4R5SiO)nで表されるシクロシロキサンと式(II)
- R1、R2、R3、R4、R5、R6およびR9を各々独立してメチル、エチル、プロピル、イソプロピル、イソブチル、n−ブチル、s−ブチル、t−ブチルを包含する群から選択する請求項1記載の方法。
- R1、R2、R3、R4、R5、R6およびR9がメチルである請求項2記載の方法。
- nがジヒドロカルビルシロキサン単位の数3から12、好適には3から8、より好適には3から6を表す請求項1から3のいずれか記載の方法。
- nが3である請求項4記載の方法。
- 前記式(II)で表される不飽和オルガノシリル化カルボキシレートを(メタ)アクリル酸トリメチルシリル、(メタ)アクリル酸トリ−t−ブチルシリル、(メタ)アクリル酸トリベンジルシリル、(メタ)アクリル酸トリエチルシリル、(メタ)アクリル酸トリ−イソプロピルシリル、(メタ)アクリル酸トリ−イソブチルシリル、(メタ)アクリル酸トリ−n−アミルシリル、(メタ)アクリル酸トリ−n−ブチルシリル、(メタ)アクリル酸トリ−n−ドデシルシリル、(メタ)アクリル酸トリ−n−ヘキシルシリル、(メタ)アクリル酸トリ−n−オクチルシリル、(メタ)アクリル酸トリ−n−プロピルシリル、(メタ)アクリル酸トリフェニルシリル、(メタ)アクリル酸トリ−p−メチルフェニルシリル、(メタ)アクリル酸ジブチルシクロヘキシルシリル、(メタ)アクリル酸ジブチルフェニルシリル、(メタ)アクリル酸ジシクロヘキシルフェニルシリル、(メタ)アクリル酸ジイソプロピル−n−ブチルシリル、(メタ)アクリル酸ジイソプロピルステアリルシリル、(メタ)アクリル酸ジメチルブチルシリル、(メタ)アクリル酸ジメチルシクロヘキシルシリル、(メタ)アクリル酸ジメチルヘキシルシリル、(メタ)アクリル酸ジメチルオクチルシリル、(メタ)アクリル酸ジメチルフェニルシリル、(メタ)アクリル酸エチルジブチルシリル、(メタ)アクリル酸エチルジメチルシリル、(メタ)アクリル酸ラウリルジフェニルシリル、(メタ)アクリル酸メチルジブチルシリル、(メタ)アクリル酸n−オクチルジ−n−ブチルシリル、(メタ)アクリル酸t−ブチルジメチルシリル、(メタ)アクリル酸t−ブチルジフェニルシリル、イタコン酸ビス(トリメチルシリル)、フマル酸t−ブチルジフェニルシリル メチル、マレイン酸t−ブチルジフェニルシリル メチル、フマル酸t−ブチルジフェニルシリル n−ブチル、マレイン酸t−ブチルジフェニルシリル n−ブチル、フマル酸トリイソプロピルシリル アミル、マレイン酸トリイソプロピルシリル アミル、フマル酸トリイソプロピルシリル メチル、マレイン酸トリイソプロピルシリル メチル、フマル酸トリ−n−ブチルシリル n−ブチル、マレイン酸トリ−n−ブチルシリル n−ブチルおよびこれらの重合体または共重合体などを包含する群から選択する請求項1から5のいずれか記載の方法。
- 前記式(II)で表される不飽和オルガノシリル化カルボキシレートを(メタ)アクリル酸トリメチルシリル、(メタ)アクリル酸トリ−t−ブチルシリル、(メタ)アクリル酸トリベンジルシリル、(メタ)アクリル酸トリエチルシリル、(メタ)アクリル酸トリ−イソプロピルシリル、(メタ)アクリル酸トリ−イソブチルシリル、(メタ)アクリル酸トリ−n−アミルシリル、(メタ)アクリル酸トリ−n−ブチルシリル、(メタ)アクリル酸トリ−n−ドデシルシリル、(メタ)アクリル酸トリ−n−ヘキシルシリル、(メタ)アクリル酸トリ−n−オクチルシリル、(メタ)アクリル酸トリ−n−プロピルシリルおよび(メタ)アクリル酸トリフェニルシリルおよびこれらの重合体または共重合体を包含する群から選択する請求項6記載の方法。
- 前記式(II)で表される不飽和オルガノシリル化カルボキシレートがメタアクリル酸トリメチルシリルまたはこれの共重合体もしくは重合体である請求項7記載の方法。
- 前記式(R4R5SiO)nで表されるシクロシロキサンを1,1,3,3,5,5−ヘキサメチル−シクロトリシロキサン(D3)、1,1,3,3,5,5−ヘキサエチル−シクロトリシロキサン、1,1,3,3,5,5−ヘキサフェニル−シクロトリシロキサン、1,1,3,3,5,5−ヘキサビニル−シクロトリシロキサン、1,3,5−トリメチル−1,3,5−トリビニル−シクロトリシロキサン、1,3,5−トリメチル−1,3,5−トリフェニル−シクロトリシロキサン、1,3,5−トリメチル−1,3,5−トリプロピル−シクロトリシロキサン、1,3,5−トリエチル−1,3,5−トリメチル−シクロトリシロキサン、1,3,5−トリメチル−1,3,5−トリフェネチル−シクロトリシロキサン、1,3,5−トリビニルトリヒドロ−シクロトリシロキサン、1,3,5−トリメチルトリヒドロ−シクロトリシロキサン、ペンタメチル−シクロトリシロキサン、1,1,3,3,5,5,7,7−オクタメチル−シクロテトラシロキサン(D4)、1,1,3,3,5,5,7,7−オクタフェニル−シクロテトラシロキサン、1,1,3,3,5,5,7,7−オクタビニル−シクロテトラシロキサン、1,1,3,3,5,5,7,7−オクタヒドロ−シクロテトラシロキサン、1,3,5,7−テトラメチル−1,3,5,7−テトラヒドロ−シクロテトラシロキサン、1,3,5,7−テトラメチル−1,3,5,7−テトラ(1−オクチル)−シクロテトラシロキサン、1,3,5,7−テトラビニル−1,3,5,7−テトラメチル−シクロテトラシロキサン、1,3,5,7−テトラビニル−1,3,5,7−テトラエチル−シクロテトラシロキサン、1,3,5,7−テトラアリル−1,3,5,7−テトラフェニル−シクロテトラシロキサン、1,3,5,7−テトラ(1−ヘキサデシル)−1,3,5,7−テトラメチル−シクロテトラシロキサン、1,3,5,7−テトラオクチルテトラヒドロ−シクロテトラシロキサン、1,3,5,7−テトラビニルテトラヒドロ−シクロテトラシロキサン、1,3,5,7−テトラエチルテトラヒドロ−シクロテトラシロキサン、1,3,5,7−テトラプロペニルテトラヒドロ−シクロテトラシロキサン、1,3,5,7−テトラペンテニルテトラペンチル−シクロテトラシロキサン、1,3,5,7−テトラフェニルテトラヒドロ−シクロテトラシロキサン、ペンタメチル−シクロテトラシロキサン、ヘキサメチル−シクロテトラシロキサン、1,1,3,3,5,5,7,7,9,9−デカメチル−シクロペンタシロキサン(D5)、1,1,3,3,5,5,7,7,9,9−デカヒドロ−シクロペンタシロキサン、1,3,5,7,9−ペンタビニル−1,3,5,7,9−ペンタメチル−シクロペンタシロキサン、1,3,5,7,9−ペンタデセニル−1,3,5,7,9−ペンタプロピル−シクロペンタシロキサン、1,3,5,7,9−ペンタメチルペンタヒドロ−シクロペンタシロキサン、1,3,5,7,9−ペンタビニルペンタヒドロ−シクロペンタシロキサン、テトラメチル−シクロペンタシロキサン、ヘキサメチル−シクロペンタシロキサン、ヘプタメチル−シクロペンタシロキサン、1,1,3,3,5,5,7,7,9,9,11,11−ドデカメチル−シクロヘキサシロキサン(D6)、1,1,3,3,5,5,7,7,9,9,11,11−ドデカヒドロ−シクロヘキサシロキサン、1,3,5,7,9,11−ヘキサビニルヘキサメチル−シクロヘキサシロキサン、1,3,5,7,9,11−ヘキサメチルヘキサヒドロ−シクロヘキサシロキサン、テトラメチル−シクロヘキサシロキサン、ペンタメチル−シクロヘキサシロキサン、1,3,5,7,9,11,13,15,17,19−デカビニルデカヒドロ−シクロデカシロキサン、1,3,5,7,9,11,13,15,17,19,21,23,25,27,29−ペンタデカビニルペンタデカヒドロ−シクロペンタデカシロキサンなどを包含する群から選択する請求項1から8のいずれか記載の方法。
- 前記式(R4R5SiO)nで表されるシクロシロキサンを1,1,3,3,5,5−ヘキサメチル−シクロトリシロキサン(D3)、1,1,3,3,5,5,7,7−オクタメチル−シクロテトラシロキサン(D4)、1,1,3,3,5,5,7,7,9,9−デカメチル−シクロペンタシロキサン(D5)、1,1,3,3,5,5,7,7,9,9,11,11−ドデカメチル−シクロヘキサシロキサン(D6)を包含する群から選択する請求項9記載の方法。
- 前記式(R4R5SiO)nで表されるシクロシロキサンが1,1,3,3,5,5−ヘキサメチル−シクロトリシロキサン(D3)である請求項10記載の方法。
- 反応用の前記適切な触媒が酸性触媒である請求項1から11のいずれか記載の方法。
- 前記触媒を塩酸、酢酸、硝酸、硫酸、トリフルオロメタンスルホン酸、トリフルオロ酢酸、酢酸、AMBERLYST A15、AMBERLYST 38 W、AMBERLYST 36、AMBERJET 1500H、AMBERJET 1200H、DOWEX MSC−1、DOWEX 50W、DELOXAN ASP I/9、DIAION SK1B、LEWATIT VP OC 1812、LEWATIT S 100 MB、LEWATIT S 100 G1、NAFION SAC13、NAFION NR50、CT275、ZnCl2、BeCl2、TiCl4、SnCl4、FeCl3、FeCl2、SbCl5、AlCl3および他の金属ハロゲン化物を包含する群から選択する請求項12記載の方法。
- 前記触媒がZnCl2である請求項13記載の方法。
- 前記触媒がトリフルオロメタンスルホン酸である請求項13記載の方法。
- 前記触媒がAMBERLYST A15である請求項13記載の方法。
- 更に前記酸性触媒を塩基で中和する段階も含んで成る請求項12から16のいずれか記載の方法。
- 前記塩基をトリエチルアミン、ジエチルアミン、トリブチルアミン、ヘキサメチルジシラザン、N−メチルモルホリン、ジイソプロピルエチルアミン、ジシクロヘキシルアミン、N−メチルピペリジン、ピリジン、4−ピロリジノピリジン、ピコリン、4−(N,N−ジメチルアミノ)ピリジン、2,6−ジ(t−ブチル)−4−メチルピリジン、キノリン、N,N−ジメチルアニリンおよびN,N−ジエチルアニリンなどを包含する群から選択する請求項17記載の方法。
- 前記塩基がトリエチルアミンである請求項18記載の方法。
- 前記式(R4R5SiO)nで表されるシクロシロキサンと前記式(II)で表される不飽和オルガノシリル化カルボキシレートまたはこれの共重合体もしくは重合体を反応させる段階を場合により適切な溶媒の存在下で実施する請求項1から19のいずれか記載の方法。
- 前記溶媒がベンゼン、トルエン、キシレン、メシチレン、エチルベンゼン、ペンタン、ヘキサン、シクロヘキサン、ヘプタン、オクタン、デカン、デカヒドロナフタレン、ジエチルエーテル、ジイソプロピルエーテル、ジイソプロピルエーテル、ジイソブチルエーテルまたはこれらの混合物を包含する群から選択した非極性で不活性な溶媒である請求項20記載の方法。
- 前記反応を20から150℃、好適には50から120℃、より好適には90から110℃の範囲に選択した温度で実施する請求項1から21のいずれか記載の方法。
- 前記反応を室温で実施する請求項1から22のいずれか記載の方法。
- 請求項1から23のいずれか記載の方法で入手した式(I)で表されるポリオルガノシリル化カルボキシレート単量体もしくはこれの重合体。
- 請求項1から23のいずれか記載の方法で入手可能な式(I)で表されるポリオルガノシリル化カルボキシレート単量体もしくはこれの重合体。
- R1、R2、R3、R4、R5、R6およびR9が各々独立してメチル、エチル、プロピル、イソプロピル、イソブチル、n−ブチル、s−ブチル、t−ブチルを包含する群から選択される請求項24または25のいずれか記載のポリオルガノシリル化カルボキシレート単量体もしくはこれの重合体。
- R1、R2、R3、R4、R5、R6およびR9がメチルである請求項26記載のポリオルガノシリル化カルボキシレート単量体もしくはこれの重合体。
- nがジヒドロカルビルシロキサン単位の数3から12、好適には3から8、より好適には3から6を表す請求項24から27のいずれか記載のポリオルガノシリル化カルボキシレート単量体もしくはこれの重合体。
- nが3である請求項28記載のポリオルガノシリル化カルボキシレート単量体もしくはこれの重合体。
- 請求項24から29のいずれか記載のポリオルガノシリル化カルボキシレート単量体もしくはこれの重合体をコーティング組成物で用いる使用。
- 請求項24から30のいずれか記載のポリオルガノシリル化カルボキシレート単量体を防汚コーティング組成物の結合剤の中の共重合用単量体単位として用いる使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02254861A EP1380611A1 (en) | 2002-07-10 | 2002-07-10 | Process for the preparation of polyorganosilylated carboxylate monomers or polymers thereof |
EP02255549 | 2002-08-08 | ||
PCT/EP2003/007360 WO2004007591A1 (en) | 2002-07-10 | 2003-07-09 | Process for the preparation of polyorganosilylated carboxylate monomers or polymers thereof |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007061671A Division JP4628385B2 (ja) | 2002-07-10 | 2007-03-12 | 防汚コーティング組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005537335A true JP2005537335A (ja) | 2005-12-08 |
JP2005537335A5 JP2005537335A5 (ja) | 2007-05-10 |
JP4411277B2 JP4411277B2 (ja) | 2010-02-10 |
Family
ID=30116922
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005505062A Expired - Fee Related JP4411277B2 (ja) | 2002-07-10 | 2003-07-09 | ポリオルガノシリル化カルボキシレート単量体またはこれの重合体の製造方法 |
JP2007061671A Expired - Fee Related JP4628385B2 (ja) | 2002-07-10 | 2007-03-12 | 防汚コーティング組成物 |
JP2010111145A Pending JP2010196070A (ja) | 2002-07-10 | 2010-05-13 | 防汚塗料組成物 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007061671A Expired - Fee Related JP4628385B2 (ja) | 2002-07-10 | 2007-03-12 | 防汚コーティング組成物 |
JP2010111145A Pending JP2010196070A (ja) | 2002-07-10 | 2010-05-13 | 防汚塗料組成物 |
Country Status (10)
Country | Link |
---|---|
US (2) | US7595370B2 (ja) |
EP (2) | EP1795551B1 (ja) |
JP (3) | JP4411277B2 (ja) |
KR (2) | KR101159833B1 (ja) |
AT (1) | ATE453676T1 (ja) |
AU (1) | AU2003250918A1 (ja) |
DE (1) | DE60330815D1 (ja) |
DK (1) | DK1795551T3 (ja) |
ES (1) | ES2339165T3 (ja) |
WO (1) | WO2004007591A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010105941A (ja) * | 2008-10-29 | 2010-05-13 | Shin-Etsu Chemical Co Ltd | 嵩高い置換基を有するシロキシ基含有シリル(メタ)アクリレート化合物及びその製造方法 |
JP2010195751A (ja) * | 2009-02-27 | 2010-09-09 | Shin-Etsu Chemical Co Ltd | 嵩高い置換基を有するシロキシ基含有シリル(メタ)アクリレート化合物及びその製造方法 |
JP5720020B1 (ja) * | 2013-07-24 | 2015-05-20 | 日東化成株式会社 | 防汚塗料組成物、防汚塗料組成物用共重合体、該組成物を用いて形成される防汚塗膜、該塗膜を表面に有する塗装物、及び該塗膜を形成する防汚処理方法 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4411277B2 (ja) * | 2002-07-10 | 2010-02-10 | シグマカロン・サービシズ・ベー・ブイ | ポリオルガノシリル化カルボキシレート単量体またはこれの重合体の製造方法 |
US7781575B2 (en) | 2002-11-14 | 2010-08-24 | Dharmacon, Inc. | siRNA targeting tumor protein 53 (p53) |
EP1614722A1 (en) * | 2004-07-07 | 2006-01-11 | SigmaKalon B.V. | Hydrolysable binders and compositions |
KR100772653B1 (ko) * | 2005-10-14 | 2007-11-02 | 주식회사 휘닉스피디이 | 플라즈마 디스플레이 패널용 감광성 무연 격벽 유리 조성물및 이를 포함하는 격벽을 포함하는 플라즈마 디스플레이패널 |
DE102008041601A1 (de) | 2008-08-27 | 2010-03-04 | Evonik Goldschmidt Gmbh | Verfahren zur Herstellung verzweigter SiH-funtioneller Polysiloxane und deren Verwendung zur Herstellung flüssiger, SiC- oder SiOC-verknüpfter, verzweigter organomodifizierter Polysiloxane |
CN101838393B (zh) * | 2010-04-29 | 2012-04-04 | 山东大学 | 一种高分子量乙基聚硅氧烷的合成方法 |
JP4769331B1 (ja) * | 2010-08-25 | 2011-09-07 | 日東化成株式会社 | 防汚塗料組成物、防汚塗料組成物用共重合体、該組成物を用いて形成される防汚塗膜を表面に有する塗装物 |
CN108291108B (zh) * | 2015-12-21 | 2020-12-18 | 日本曹达株式会社 | 涂层剂 |
US11679412B2 (en) | 2016-06-13 | 2023-06-20 | Gvd Corporation | Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles |
US20170358445A1 (en) | 2016-06-13 | 2017-12-14 | Gvd Corporation | Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles |
KR102276521B1 (ko) * | 2016-11-09 | 2021-07-12 | 주고꾸 도료 가부시키가이샤 | 방오 도료 조성물, 방오 도막, 방오 도막 부착 기재 및 그의 제조 방법, 및 방오 방법 |
US12043638B2 (en) * | 2017-09-22 | 2024-07-23 | 3M Innovative Properties Company | Cyclic siloxanes, compositions, methods, and articles |
CN116574427B (zh) * | 2023-03-09 | 2024-03-19 | 浙江飞鲸新材料科技股份有限公司 | 海洋钢结构长效防护多层环氧重防腐涂层及制备方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL128599C (ja) * | 1963-08-07 | 1970-04-15 | ||
US4593055A (en) * | 1983-01-17 | 1986-06-03 | M&T Chemicals Inc. | Erodible ship-bottom paints for control of marine fouling |
US5481122A (en) * | 1994-07-25 | 1996-01-02 | Industrial Technology Research Institute | Surface light emitting diode with electrically conductive window layer |
MY115462A (en) * | 1995-06-01 | 2003-06-30 | Chugoku Marine Paints | Antifouling coating composition, coating film formed from said antifouling coating composition, antifouling method using said antifouling coating composition and hull or underwater structure coated with said coating film |
JP4025385B2 (ja) * | 1996-12-06 | 2007-12-19 | 東レ・ダウコーニング株式会社 | オルガノペンタシロキサンの製造方法 |
JPH10168089A (ja) | 1996-12-04 | 1998-06-23 | Toray Dow Corning Silicone Co Ltd | 1−アシルオキシ−オルガノテトラシロキサンおよびその製造方法 |
US6031019A (en) * | 1997-02-07 | 2000-02-29 | Kao Corporation | Aqueous ink for ink-jet printing |
JPH10245451A (ja) * | 1997-03-05 | 1998-09-14 | Nok Corp | アクリルゴムまたはそれのブレンドゴムの組成物 |
US6057562A (en) * | 1997-04-18 | 2000-05-02 | Epistar Corp. | High efficiency light emitting diode with distributed Bragg reflector |
JP3862399B2 (ja) * | 1998-01-29 | 2006-12-27 | キヤノン株式会社 | 電子写真感光体の製造方法、電子写真感光体、プロセスカートリッジ及び電子写真装置 |
JP3763667B2 (ja) * | 1998-04-23 | 2006-04-05 | 株式会社東芝 | 半導体発光素子 |
JP2001223384A (ja) * | 2000-02-08 | 2001-08-17 | Toshiba Corp | 半導体発光素子 |
JP4411277B2 (ja) * | 2002-07-10 | 2010-02-10 | シグマカロン・サービシズ・ベー・ブイ | ポリオルガノシリル化カルボキシレート単量体またはこれの重合体の製造方法 |
-
2003
- 2003-07-09 JP JP2005505062A patent/JP4411277B2/ja not_active Expired - Fee Related
- 2003-07-09 DK DK07004596.8T patent/DK1795551T3/da active
- 2003-07-09 KR KR1020077008062A patent/KR101159833B1/ko not_active IP Right Cessation
- 2003-07-09 AT AT07004596T patent/ATE453676T1/de not_active IP Right Cessation
- 2003-07-09 AU AU2003250918A patent/AU2003250918A1/en not_active Abandoned
- 2003-07-09 KR KR1020057000421A patent/KR101035342B1/ko not_active IP Right Cessation
- 2003-07-09 EP EP07004596A patent/EP1795551B1/en not_active Expired - Lifetime
- 2003-07-09 EP EP03763756A patent/EP1539861A1/en not_active Withdrawn
- 2003-07-09 US US10/520,636 patent/US7595370B2/en not_active Expired - Fee Related
- 2003-07-09 ES ES07004596T patent/ES2339165T3/es not_active Expired - Lifetime
- 2003-07-09 WO PCT/EP2003/007360 patent/WO2004007591A1/en active Application Filing
- 2003-07-09 DE DE60330815T patent/DE60330815D1/de not_active Expired - Lifetime
-
2007
- 2007-03-12 JP JP2007061671A patent/JP4628385B2/ja not_active Expired - Fee Related
- 2007-03-21 US US11/726,130 patent/US7736634B2/en not_active Expired - Fee Related
-
2010
- 2010-05-13 JP JP2010111145A patent/JP2010196070A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010105941A (ja) * | 2008-10-29 | 2010-05-13 | Shin-Etsu Chemical Co Ltd | 嵩高い置換基を有するシロキシ基含有シリル(メタ)アクリレート化合物及びその製造方法 |
JP2010195751A (ja) * | 2009-02-27 | 2010-09-09 | Shin-Etsu Chemical Co Ltd | 嵩高い置換基を有するシロキシ基含有シリル(メタ)アクリレート化合物及びその製造方法 |
JP5720020B1 (ja) * | 2013-07-24 | 2015-05-20 | 日東化成株式会社 | 防汚塗料組成物、防汚塗料組成物用共重合体、該組成物を用いて形成される防汚塗膜、該塗膜を表面に有する塗装物、及び該塗膜を形成する防汚処理方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1795551A1 (en) | 2007-06-13 |
KR101159833B1 (ko) | 2012-06-26 |
KR20050044889A (ko) | 2005-05-13 |
US7736634B2 (en) | 2010-06-15 |
JP2010196070A (ja) | 2010-09-09 |
JP4628385B2 (ja) | 2011-02-09 |
DK1795551T3 (da) | 2010-03-08 |
WO2004007591A1 (en) | 2004-01-22 |
EP1539861A1 (en) | 2005-06-15 |
AU2003250918A1 (en) | 2004-02-02 |
JP4411277B2 (ja) | 2010-02-10 |
KR20070047851A (ko) | 2007-05-07 |
US7595370B2 (en) | 2009-09-29 |
JP2007262063A (ja) | 2007-10-11 |
KR101035342B1 (ko) | 2011-05-20 |
ATE453676T1 (de) | 2010-01-15 |
US20070196326A1 (en) | 2007-08-23 |
DE60330815D1 (de) | 2010-02-11 |
ES2339165T3 (es) | 2010-05-17 |
US20060142516A1 (en) | 2006-06-29 |
EP1795551B1 (en) | 2009-12-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4628385B2 (ja) | 防汚コーティング組成物 | |
US9951185B2 (en) | Aminosiloxanes of high purity | |
JP2006022332A (ja) | 加水分解型バインダーおよび組成物 | |
JP4619001B2 (ja) | オルガノシリル化カルボキシレートモノマーの製法および防汚塗膜中へのそれらの使用 | |
WO2006003032A1 (en) | Silyl polymers | |
KR20040003001A (ko) | 트리알킬실릴화된 카르복실레이트 단량체의 제조 방법,이로부터 얻어진 트리알킬실릴화된 카르복실레이트 단량체및 이의 방오 코팅에서의 용도 | |
EP1380611A1 (en) | Process for the preparation of polyorganosilylated carboxylate monomers or polymers thereof | |
KR20050044761A (ko) | 실릴 카르복실레이트 단량체의 제조 방법 | |
US20050222446A1 (en) | Process for the production of hydrocarbyl silyl carboxylate compounds | |
JP2005518450A (ja) | トリヒドロカルビルシリル化カルボキシレート単量体の製造方法 | |
EP1431301A1 (en) | Process for the production of silyl carboxylate monomers | |
WO2004005302A1 (en) | Process for the preparation of acyloxysilanes | |
WO2004085518A1 (en) | A process for the protection of acid groups in polymers | |
JP2021161091A (ja) | シリコーン化合物の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060601 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060601 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070312 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20081209 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090707 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091007 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20091110 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20091116 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121120 Year of fee payment: 3 |
|
LAPS | Cancellation because of no payment of annual fees |