JP4616938B2 - 環境走査電子顕微鏡および検出器 - Google Patents

環境走査電子顕微鏡および検出器 Download PDF

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Publication number
JP4616938B2
JP4616938B2 JP2004538207A JP2004538207A JP4616938B2 JP 4616938 B2 JP4616938 B2 JP 4616938B2 JP 2004538207 A JP2004538207 A JP 2004538207A JP 2004538207 A JP2004538207 A JP 2004538207A JP 4616938 B2 JP4616938 B2 JP 4616938B2
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electrons
sample
detector
electric field
electron microscope
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Japanese (ja)
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JP2005539359A5 (enExample
JP2005539359A (ja
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ヨハネス・ヤコブ・ショルツ
ラルフ・ウィリアム・ノウレス
ラマー・ブラッドレー・シエル
ビーン ジェラーダス・バン
マルレ・ルネ・ペーテル・スフルームヘス
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エフ・イ−・アイ・カンパニー
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • H01J2237/0045—Neutralising arrangements of objects being observed or treated using secondary electrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Physical Vapour Deposition (AREA)
  • Measurement Of Radiation (AREA)
JP2004538207A 2002-09-18 2003-09-18 環境走査電子顕微鏡および検出器 Expired - Lifetime JP4616938B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US41169902P 2002-09-18 2002-09-18
US33069102A 2002-12-27 2002-12-27
PCT/US2003/029446 WO2004027808A2 (en) 2002-09-18 2003-09-18 Particle-optical device and detection means

Publications (3)

Publication Number Publication Date
JP2005539359A JP2005539359A (ja) 2005-12-22
JP2005539359A5 JP2005539359A5 (enExample) 2009-09-03
JP4616938B2 true JP4616938B2 (ja) 2011-01-19

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Family Applications (2)

Application Number Title Priority Date Filing Date
JP2004538208A Expired - Lifetime JP4520303B2 (ja) 2002-09-18 2003-09-18 荷電粒子ビームシステム
JP2004538207A Expired - Lifetime JP4616938B2 (ja) 2002-09-18 2003-09-18 環境走査電子顕微鏡および検出器

Family Applications Before (1)

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JP2004538208A Expired - Lifetime JP4520303B2 (ja) 2002-09-18 2003-09-18 荷電粒子ビームシステム

Country Status (6)

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US (1) US6972412B2 (enExample)
EP (3) EP1540693A4 (enExample)
JP (2) JP4520303B2 (enExample)
KR (1) KR101015116B1 (enExample)
AU (2) AU2003276900A1 (enExample)
WO (2) WO2004027808A2 (enExample)

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US9123506B2 (en) 2013-06-10 2015-09-01 Fei Company Electron beam-induced etching
US9418819B2 (en) 2013-09-06 2016-08-16 Kla-Tencor Corporation Asymmetrical detector design and methodology
US9715724B2 (en) 2014-07-29 2017-07-25 Applied Materials Israel Ltd. Registration of CAD data with SEM images
US9633816B2 (en) 2015-05-18 2017-04-25 Fei Company Electron beam microscope with improved imaging gas and method of use
KR101693539B1 (ko) * 2015-11-12 2017-01-06 한국표준과학연구원 고분해능 광-전자 융합현미경
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Also Published As

Publication number Publication date
AU2003275028A8 (en) 2004-04-08
KR20050050658A (ko) 2005-05-31
KR101015116B1 (ko) 2011-02-16
JP2005539360A (ja) 2005-12-22
EP1540693A2 (en) 2005-06-15
EP1540693A4 (en) 2010-06-09
US6972412B2 (en) 2005-12-06
EP1540692A2 (en) 2005-06-15
WO2004027809A2 (en) 2004-04-01
US20040124356A1 (en) 2004-07-01
WO2004027808A2 (en) 2004-04-01
JP4520303B2 (ja) 2010-08-04
AU2003276900A8 (en) 2004-04-08
AU2003275028A1 (en) 2004-04-08
AU2003276900A1 (en) 2004-04-08
EP1540692B1 (en) 2013-11-06
WO2004027808A3 (en) 2004-07-08
WO2004027809A3 (en) 2004-07-29
EP2372743A3 (en) 2014-05-14
EP2372743A2 (en) 2011-10-05
EP2372743B1 (en) 2016-03-23
EP1540692A4 (en) 2009-04-22
JP2005539359A (ja) 2005-12-22

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