JP4566791B2 - 軟ｘ線多層膜反射鏡 - Google Patents

軟ｘ線多層膜反射鏡 Download PDF

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Publication number
JP4566791B2
JP4566791B2 JP2005069167A JP2005069167A JP4566791B2 JP 4566791 B2 JP4566791 B2 JP 4566791B2 JP 2005069167 A JP2005069167 A JP 2005069167A JP 2005069167 A JP2005069167 A JP 2005069167A JP 4566791 B2 JP4566791 B2 JP 4566791B2
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Japan
Prior art keywords
refractive index
layer
index layer
low refractive
high refractive
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Expired - Fee Related
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JP2005069167A
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English (en)
Japanese (ja)
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JP2005308722A5 (enExample
JP2005308722A (ja
Inventor
香子 今井
謙二 安藤
秀宏 金沢
康治 寺西
隆幸 三浦
和枝 高田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005069167A priority Critical patent/JP4566791B2/ja
Priority to US11/087,679 priority patent/US7342715B2/en
Publication of JP2005308722A publication Critical patent/JP2005308722A/ja
Publication of JP2005308722A5 publication Critical patent/JP2005308722A5/ja
Application granted granted Critical
Publication of JP4566791B2 publication Critical patent/JP4566791B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005069167A 2004-03-26 2005-03-11 軟ｘ線多層膜反射鏡 Expired - Fee Related JP4566791B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005069167A JP4566791B2 (ja) 2004-03-26 2005-03-11 軟ｘ線多層膜反射鏡
US11/087,679 US7342715B2 (en) 2004-03-26 2005-03-24 Multilayer film reflector for soft X-rays and manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004091091 2004-03-26
JP2005069167A JP4566791B2 (ja) 2004-03-26 2005-03-11 軟ｘ線多層膜反射鏡

Publications (3)

Publication Number Publication Date
JP2005308722A JP2005308722A (ja) 2005-11-04
JP2005308722A5 JP2005308722A5 (enExample) 2008-04-24
JP4566791B2 true JP4566791B2 (ja) 2010-10-20

Family

ID=34989494

Family Applications (1)

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JP2005069167A Expired - Fee Related JP4566791B2 (ja) 2004-03-26 2005-03-11 軟ｘ線多層膜反射鏡

Country Status (2)

Country Link
US (1) US7342715B2 (enExample)
JP (1) JP4566791B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4566791B2 (ja) 2004-03-26 2010-10-20 キヤノン株式会社 軟ｘ線多層膜反射鏡
TWI427334B (zh) * 2007-02-05 2014-02-21 Zeiss Carl Smt Gmbh Ｅｕｖ蝕刻裝置反射光學元件
DE102007054731A1 (de) 2007-11-14 2009-05-20 Carl Zeiss Smt Ag Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit
US20090252977A1 (en) * 2008-04-07 2009-10-08 Canon Kabushiki Kaisha Multilayer film reflector
DE102008040265A1 (de) * 2008-07-09 2010-01-14 Carl Zeiss Smt Ag Reflektives optisches Element und Verfahren zu seiner Herstellung
US20100271693A1 (en) * 2009-04-24 2010-10-28 Manuela Vidal Dasilva Narrowband filters for the extreme ultraviolet
US8744048B2 (en) 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device
CN102682867B (zh) * 2011-03-07 2015-04-08 同济大学 一种基于铂分离层的多层膜反射镜及其制造方法
DE102013212780B4 (de) * 2013-07-01 2018-12-27 Carl Zeiss Smt Gmbh Spiegel für eine mikrolithographische Projektionslichtungsanlage sowie Verfahren zur Bearbeitung eines Spiegels
JP6487424B2 (ja) * 2013-06-27 2019-03-20 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光システムのミラー及びミラーを加工する方法
US9611999B2 (en) * 2014-07-21 2017-04-04 GE Lighting Solutions, LLC Reflecting apparatus including enhanced aluminum optical coatings

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4693933A (en) * 1983-06-06 1987-09-15 Ovonic Synthetic Materials Company, Inc. X-ray dispersive and reflective structures and method of making the structures
JP2692881B2 (ja) * 1988-08-17 1997-12-17 キヤノン株式会社 軟ｘ線又は真空紫外線用多層膜の製造方法ならびに光学素子
JP2723955B2 (ja) * 1989-03-16 1998-03-09 キヤノン株式会社 軟ｘ線・真空紫外線用多層膜反射鏡
FR2653234A1 (fr) * 1989-10-13 1991-04-19 Philips Electronique Lab Dispositif du type miroir dans le domaine des rayons x-uv.
JPH03274001A (ja) * 1990-03-24 1991-12-05 Seiko Epson Corp Ｘ線反射膜
US5265143A (en) * 1993-01-05 1993-11-23 At&T Bell Laboratories X-ray optical element including a multilayer coating
US5356662A (en) * 1993-01-05 1994-10-18 At&T Bell Laboratories Method for repairing an optical element which includes a multilayer coating
JPH06230194A (ja) 1993-02-02 1994-08-19 Nippon Telegr & Teleph Corp <Ntt> Ｘ線反射鏡
JPH08262198A (ja) 1995-03-27 1996-10-11 Toyota Gakuen Ｘ線多層膜反射鏡
JPH09230098A (ja) * 1996-02-21 1997-09-05 Nippon Telegr & Teleph Corp <Ntt> 多層膜ｘ線反射鏡
US5726805A (en) * 1996-06-25 1998-03-10 Sandia Corporation Optical filter including a sub-wavelength periodic structure and method of making
JP3602717B2 (ja) 1998-03-11 2004-12-15 エヌ・ティ・ティ・アドバンステクノロジ株式会社 多層膜ｘ線反射鏡
TW561279B (en) * 1999-07-02 2003-11-11 Asml Netherlands Bv Reflector for reflecting radiation in a desired wavelength range, lithographic projection apparatus containing the same and method for their preparation
JP2001183499A (ja) * 1999-12-22 2001-07-06 Rigaku Industrial Co Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
US6396900B1 (en) * 2001-05-01 2002-05-28 The Regents Of The University Of California Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application
DE10150874A1 (de) * 2001-10-04 2003-04-30 Zeiss Carl Optisches Element und Verfahren zu dessen Herstellung sowie ein Lithographiegerät und ein Verfahren zur Herstellung eines Halbleiterbauelements
JP2005156201A (ja) * 2003-11-21 2005-06-16 Canon Inc Ｘ線全反射ミラーおよびｘ線露光装置
US7169514B2 (en) * 2003-12-31 2007-01-30 Intel Corporation Extreme ultraviolet mask with molybdenum phase shifter
JP4566791B2 (ja) 2004-03-26 2010-10-20 キヤノン株式会社 軟ｘ線多層膜反射鏡

Also Published As

Publication number Publication date
US7342715B2 (en) 2008-03-11
JP2005308722A (ja) 2005-11-04
US20050213199A1 (en) 2005-09-29

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