JP2005308722A5 - - Google Patents

Download PDF

Info

Publication number
JP2005308722A5
JP2005308722A5 JP2005069167A JP2005069167A JP2005308722A5 JP 2005308722 A5 JP2005308722 A5 JP 2005308722A5 JP 2005069167 A JP2005069167 A JP 2005069167A JP 2005069167 A JP2005069167 A JP 2005069167A JP 2005308722 A5 JP2005308722 A5 JP 2005308722A5
Authority
JP
Japan
Prior art keywords
refractive index
soft
index layer
high refractive
low refractive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005069167A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005308722A (ja
JP4566791B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005069167A priority Critical patent/JP4566791B2/ja
Priority claimed from JP2005069167A external-priority patent/JP4566791B2/ja
Priority to US11/087,679 priority patent/US7342715B2/en
Publication of JP2005308722A publication Critical patent/JP2005308722A/ja
Publication of JP2005308722A5 publication Critical patent/JP2005308722A5/ja
Application granted granted Critical
Publication of JP4566791B2 publication Critical patent/JP4566791B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2005069167A 2004-03-26 2005-03-11 軟ｘ線多層膜反射鏡 Expired - Fee Related JP4566791B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005069167A JP4566791B2 (ja) 2004-03-26 2005-03-11 軟ｘ線多層膜反射鏡
US11/087,679 US7342715B2 (en) 2004-03-26 2005-03-24 Multilayer film reflector for soft X-rays and manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004091091 2004-03-26
JP2005069167A JP4566791B2 (ja) 2004-03-26 2005-03-11 軟ｘ線多層膜反射鏡

Publications (3)

Publication Number Publication Date
JP2005308722A JP2005308722A (ja) 2005-11-04
JP2005308722A5 true JP2005308722A5 (enExample) 2008-04-24
JP4566791B2 JP4566791B2 (ja) 2010-10-20

Family

ID=34989494

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005069167A Expired - Fee Related JP4566791B2 (ja) 2004-03-26 2005-03-11 軟ｘ線多層膜反射鏡

Country Status (2)

Country Link
US (1) US7342715B2 (enExample)
JP (1) JP4566791B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4566791B2 (ja) 2004-03-26 2010-10-20 キヤノン株式会社 軟ｘ線多層膜反射鏡
TWI427334B (zh) * 2007-02-05 2014-02-21 Zeiss Carl Smt Gmbh Ｅｕｖ蝕刻裝置反射光學元件
DE102007054731A1 (de) 2007-11-14 2009-05-20 Carl Zeiss Smt Ag Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit
US20090252977A1 (en) * 2008-04-07 2009-10-08 Canon Kabushiki Kaisha Multilayer film reflector
DE102008040265A1 (de) * 2008-07-09 2010-01-14 Carl Zeiss Smt Ag Reflektives optisches Element und Verfahren zu seiner Herstellung
US20100271693A1 (en) * 2009-04-24 2010-10-28 Manuela Vidal Dasilva Narrowband filters for the extreme ultraviolet
US8744048B2 (en) 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device
CN102682867B (zh) * 2011-03-07 2015-04-08 同济大学 一种基于铂分离层的多层膜反射镜及其制造方法
DE102013212780B4 (de) * 2013-07-01 2018-12-27 Carl Zeiss Smt Gmbh Spiegel für eine mikrolithographische Projektionslichtungsanlage sowie Verfahren zur Bearbeitung eines Spiegels
JP6487424B2 (ja) * 2013-06-27 2019-03-20 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光システムのミラー及びミラーを加工する方法
US9611999B2 (en) * 2014-07-21 2017-04-04 GE Lighting Solutions, LLC Reflecting apparatus including enhanced aluminum optical coatings

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4693933A (en) * 1983-06-06 1987-09-15 Ovonic Synthetic Materials Company, Inc. X-ray dispersive and reflective structures and method of making the structures
JP2692881B2 (ja) * 1988-08-17 1997-12-17 キヤノン株式会社 軟ｘ線又は真空紫外線用多層膜の製造方法ならびに光学素子
JP2723955B2 (ja) * 1989-03-16 1998-03-09 キヤノン株式会社 軟ｘ線・真空紫外線用多層膜反射鏡
FR2653234A1 (fr) * 1989-10-13 1991-04-19 Philips Electronique Lab Dispositif du type miroir dans le domaine des rayons x-uv.
JPH03274001A (ja) * 1990-03-24 1991-12-05 Seiko Epson Corp Ｘ線反射膜
US5265143A (en) * 1993-01-05 1993-11-23 At&T Bell Laboratories X-ray optical element including a multilayer coating
US5356662A (en) * 1993-01-05 1994-10-18 At&T Bell Laboratories Method for repairing an optical element which includes a multilayer coating
JPH06230194A (ja) 1993-02-02 1994-08-19 Nippon Telegr & Teleph Corp <Ntt> Ｘ線反射鏡
JPH08262198A (ja) 1995-03-27 1996-10-11 Toyota Gakuen Ｘ線多層膜反射鏡
JPH09230098A (ja) * 1996-02-21 1997-09-05 Nippon Telegr & Teleph Corp <Ntt> 多層膜ｘ線反射鏡
US5726805A (en) * 1996-06-25 1998-03-10 Sandia Corporation Optical filter including a sub-wavelength periodic structure and method of making
JP3602717B2 (ja) 1998-03-11 2004-12-15 エヌ・ティ・ティ・アドバンステクノロジ株式会社 多層膜ｘ線反射鏡
TW561279B (en) * 1999-07-02 2003-11-11 Asml Netherlands Bv Reflector for reflecting radiation in a desired wavelength range, lithographic projection apparatus containing the same and method for their preparation
JP2001183499A (ja) * 1999-12-22 2001-07-06 Rigaku Industrial Co Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
US6396900B1 (en) * 2001-05-01 2002-05-28 The Regents Of The University Of California Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application
DE10150874A1 (de) * 2001-10-04 2003-04-30 Zeiss Carl Optisches Element und Verfahren zu dessen Herstellung sowie ein Lithographiegerät und ein Verfahren zur Herstellung eines Halbleiterbauelements
JP2005156201A (ja) * 2003-11-21 2005-06-16 Canon Inc Ｘ線全反射ミラーおよびｘ線露光装置
US7169514B2 (en) * 2003-12-31 2007-01-30 Intel Corporation Extreme ultraviolet mask with molybdenum phase shifter
JP4566791B2 (ja) 2004-03-26 2010-10-20 キヤノン株式会社 軟ｘ線多層膜反射鏡

Similar Documents

Publication Publication Date Title
JP2005308722A5 (enExample)
JP2006156608A5 (enExample)
JP2010513942A5 (enExample)
JP2005502788A5 (enExample)
JP2019066311A5 (enExample)
JP2010206156A5 (ja) 反射型マスクブランク、反射型マスクブランクの製造方法及び反射型マスクの製造方法
JP2012174320A5 (enExample)
JP2008244018A5 (enExample)
JP2009526908A5 (enExample)
JP2007059052A5 (enExample)
JP2009514769A5 (enExample)
JP2007007847A5 (enExample)
JP2006286971A (ja) 複合基板およびその製造方法、ならびに薄膜デバイスおよびその製造方法
JP2004526650A5 (enExample)
JP2014134564A5 (enExample)
JP2004058592A5 (enExample)
JP2006331582A5 (enExample)
CN103715171A (zh) 导电金属互联线及其制备方法
JP2012525693A5 (enExample)
JP4566791B2 (ja) 軟ｘ線多層膜反射鏡
JP2007220267A (ja) 磁気記録媒体及びスパッタターゲット
JP2020129013A5 (ja) ひずみゲージ及びその製造方法
JP2006110626A5 (enExample)
JP2005347688A5 (enExample)
JPWO2019150741A1 (ja) 光学薄膜、光学素子および光学系