JP2005308722A5 - - Google Patents
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- Publication number
- JP2005308722A5 JP2005308722A5 JP2005069167A JP2005069167A JP2005308722A5 JP 2005308722 A5 JP2005308722 A5 JP 2005308722A5 JP 2005069167 A JP2005069167 A JP 2005069167A JP 2005069167 A JP2005069167 A JP 2005069167A JP 2005308722 A5 JP2005308722 A5 JP 2005308722A5
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- soft
- index layer
- high refractive
- low refractive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000956 alloy Substances 0.000 claims 3
- 229910045601 alloy Inorganic materials 0.000 claims 3
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical class [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 3
- 229910052751 metal Inorganic materials 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229910052788 barium Inorganic materials 0.000 claims 1
- 229910052790 beryllium Inorganic materials 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052745 lead Inorganic materials 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 229910052720 vanadium Inorganic materials 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
Claims (4)
- 基板の上に、相対的に屈折率の高い高屈折率層と、相対的に屈折率の低い低屈折率層とを、交互に複数層積み重ねて形成された軟Ｘ線多層膜反射鏡において、前記高屈折率層はアモルファス構造を有する膜であり、前記低屈折率層は結晶構造を有する膜であり、前記高屈折率層と低屈折率層との界面のうち、前記高屈折率層の前記基板と逆側の界面には、結晶構造を有する中間層が配置されていることを特徴とする軟Ｘ線多層膜反射鏡。
- 前記中間層は、Ｖ，Ｎｂ，Ｚｒ，Ｂｅ，Ｍｇ，Ｔｉ，Ｚｎ，Ａｇ，Ａｌ，Ａｕ，Ｃａ，Ｃｕ，Ｎｉ，Ｐｂ，Ｐｔ，Ｂａ，Ｃｒ，Ｆｅ，Ｗから選ばれた１又は２以上を含む金属、合金又は化合物であることを特徴とする請求項１に記載の軟Ｘ線多層膜反射鏡。
- 前記高屈折率層はＭｏを含む金属、合金又は化合物からなり、前記低屈折率層は、Ｓｉを含む金属、合金又は化合物からなることを特徴とする請求項１または２に記載の軟Ｘ線多層膜反射鏡。
- 前記中間層と前記低屈折率層は、共に面心立方格子結晶構造を有している事を特徴とする請求項２に記載の軟Ｘ線多層膜反射鏡。
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005069167A JP4566791B2 (ja) | 2004-03-26 | 2005-03-11 | 軟ｘ線多層膜反射鏡 |
| US11/087,679 US7342715B2 (en) | 2004-03-26 | 2005-03-24 | Multilayer film reflector for soft X-rays and manufacturing method thereof |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004091091 | 2004-03-26 | ||
| JP2005069167A JP4566791B2 (ja) | 2004-03-26 | 2005-03-11 | 軟ｘ線多層膜反射鏡 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005308722A JP2005308722A (ja) | 2005-11-04 |
| JP2005308722A5 true JP2005308722A5 (ja) | 2008-04-24 |
| JP4566791B2 JP4566791B2 (ja) | 2010-10-20 |
Family
ID=34989494
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005069167A Expired - Fee Related JP4566791B2 (ja) | 2004-03-26 | 2005-03-11 | 軟ｘ線多層膜反射鏡 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7342715B2 (ja) |
| JP (1) | JP4566791B2 (ja) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4566791B2 (ja) | 2004-03-26 | 2010-10-20 | キヤノン株式会社 | 軟ｘ線多層膜反射鏡 |
| TWI427334B (zh) * | 2007-02-05 | 2014-02-21 | Zeiss Carl Smt Gmbh | Ｅｕｖ蝕刻裝置反射光學元件 |
| DE102007054731A1 (de) | 2007-11-14 | 2009-05-20 | Carl Zeiss Smt Ag | Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit |
| US20090252977A1 (en) * | 2008-04-07 | 2009-10-08 | Canon Kabushiki Kaisha | Multilayer film reflector |
| DE102008040265A1 (de) | 2008-07-09 | 2010-01-14 | Carl Zeiss Smt Ag | Reflektives optisches Element und Verfahren zu seiner Herstellung |
| US20100271693A1 (en) * | 2009-04-24 | 2010-10-28 | Manuela Vidal Dasilva | Narrowband filters for the extreme ultraviolet |
| US8744048B2 (en) | 2010-12-28 | 2014-06-03 | General Electric Company | Integrated X-ray source having a multilayer total internal reflection optic device |
| CN102682867B (zh) * | 2011-03-07 | 2015-04-08 | 同济大学 | 一种基于铂分离层的多层膜反射镜及其制造方法 |
| DE102013212780B4 (de) * | 2013-07-01 | 2018-12-27 | Carl Zeiss Smt Gmbh | Spiegel für eine mikrolithographische Projektionslichtungsanlage sowie Verfahren zur Bearbeitung eines Spiegels |
| JP6487424B2 (ja) * | 2013-06-27 | 2019-03-20 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光システムのミラー及びミラーを加工する方法 |
| US9611999B2 (en) * | 2014-07-21 | 2017-04-04 | GE Lighting Solutions, LLC | Reflecting apparatus including enhanced aluminum optical coatings |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4693933A (en) * | 1983-06-06 | 1987-09-15 | Ovonic Synthetic Materials Company, Inc. | X-ray dispersive and reflective structures and method of making the structures |
| JP2692881B2 (ja) * | 1988-08-17 | 1997-12-17 | キヤノン株式会社 | 軟ｘ線又は真空紫外線用多層膜の製造方法ならびに光学素子 |
| JP2723955B2 (ja) * | 1989-03-16 | 1998-03-09 | キヤノン株式会社 | 軟ｘ線・真空紫外線用多層膜反射鏡 |
| FR2653234A1 (fr) * | 1989-10-13 | 1991-04-19 | Philips Electronique Lab | Dispositif du type miroir dans le domaine des rayons x-uv. |
| JPH03274001A (ja) * | 1990-03-24 | 1991-12-05 | Seiko Epson Corp | Ｘ線反射膜 |
| US5265143A (en) * | 1993-01-05 | 1993-11-23 | At&T Bell Laboratories | X-ray optical element including a multilayer coating |
| US5356662A (en) * | 1993-01-05 | 1994-10-18 | At&T Bell Laboratories | Method for repairing an optical element which includes a multilayer coating |
| JPH06230194A (ja) | 1993-02-02 | 1994-08-19 | Nippon Telegr & Teleph Corp <Ntt> | Ｘ線反射鏡 |
| JPH08262198A (ja) | 1995-03-27 | 1996-10-11 | Toyota Gakuen | Ｘ線多層膜反射鏡 |
| JPH09230098A (ja) * | 1996-02-21 | 1997-09-05 | Nippon Telegr & Teleph Corp <Ntt> | 多層膜ｘ線反射鏡 |
| US5726805A (en) * | 1996-06-25 | 1998-03-10 | Sandia Corporation | Optical filter including a sub-wavelength periodic structure and method of making |
| JP3602717B2 (ja) | 1998-03-11 | 2004-12-15 | エヌ・ティ・ティ・アドバンステクノロジ株式会社 | 多層膜ｘ線反射鏡 |
| TW561279B (en) * | 1999-07-02 | 2003-11-11 | Asml Netherlands Bv | Reflector for reflecting radiation in a desired wavelength range, lithographic projection apparatus containing the same and method for their preparation |
| JP2001183499A (ja) * | 1999-12-22 | 2001-07-06 | Rigaku Industrial Co | Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置 |
| US6396900B1 (en) * | 2001-05-01 | 2002-05-28 | The Regents Of The University Of California | Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application |
| DE10150874A1 (de) * | 2001-10-04 | 2003-04-30 | Zeiss Carl | Optisches Element und Verfahren zu dessen Herstellung sowie ein Lithographiegerät und ein Verfahren zur Herstellung eines Halbleiterbauelements |
| JP2005156201A (ja) * | 2003-11-21 | 2005-06-16 | Canon Inc | Ｘ線全反射ミラーおよびｘ線露光装置 |
| US7169514B2 (en) * | 2003-12-31 | 2007-01-30 | Intel Corporation | Extreme ultraviolet mask with molybdenum phase shifter |
| JP4566791B2 (ja) | 2004-03-26 | 2010-10-20 | キヤノン株式会社 | 軟ｘ線多層膜反射鏡 |
-
2005
- 2005-03-11 JP JP2005069167A patent/JP4566791B2/ja not_active Expired - Fee Related
- 2005-03-24 US US11/087,679 patent/US7342715B2/en not_active Expired - Fee Related
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