JP4541796B2 - 研磨スラリーの製造方法 - Google Patents
研磨スラリーの製造方法 Download PDFInfo
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- JP4541796B2 JP4541796B2 JP2004223914A JP2004223914A JP4541796B2 JP 4541796 B2 JP4541796 B2 JP 4541796B2 JP 2004223914 A JP2004223914 A JP 2004223914A JP 2004223914 A JP2004223914 A JP 2004223914A JP 4541796 B2 JP4541796 B2 JP 4541796B2
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- particles
- abrasive
- polishing slurry
- liquid
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Description
研磨材1としてヒュームドシリカ、分散媒2として水を含む研磨スラリー7を、本発明の製造方法に従って製造した。
実施例1と同様に、研磨材1としてヒュームドシリカ、分散媒2として水を含む研磨スラリー7を、図4に示す製造方法に従って製造した。
実施例1と同様に分散処理(ステップ11)を行った被処理液を用いて、遠心分級や自然沈降処理を行わずに、実施例1と同様の特性調整を行い(ステップ13)、所望の組成とした。それから、特性調整後の所望の組成の被処理液に対して、粗大粒子を除去するため、様々なメッシュサイズのフィルターを用いてろ過を行った。具体的には、比較例1では公称メッシュサイズが5μmのフィルター、比較例2では公称メッシュサイズが3μmのフィルター、比較例3では公称メッシュサイズが1μmのフィルター、比較例4では公称メッシュサイズが0.5μmのフィルターをそれぞれ用いてろ過を行って研磨スラリーを製造した。これらの研磨スラリーを用いてCMP法を実施した結果については後述する。
前記した実施例1,2および比較例1〜4の研磨スラリーを用いてCMP法を実施する研磨実験を行った。被研磨物としては、半導体基板(ウエハ)の半製品である、シリコン基板上に形成された絶縁膜をフォトリソグラフィ技術及びドライエッチング技術を用いてパターニングして、ダマシン構造の基礎となるパターンを形成した後、バリアメタル膜とCu膜を堆積したものを用いた。
2 分散媒
3 分散機
4 分散後の被処理液
5 遠心分級機
6 分級後の被処理液
7 研磨スラリー
8 薬剤
9 フィルター
10 特性調整用タンク
11 分散工程
12 遠心分級による分級工程
13 調整工程
14 フィルターによるろ過工程
15 自然沈降による分級工程
20 処理タンク
Claims (3)
- 研磨材と水とを混合した被処理液中で前記研磨材を分散させる分散工程と、
前記分散工程後の被処理液に対して、遠心加速度500G〜2500Gで遠心分級を行い、前記研磨材のうち、粒子径9.99μm以上の粒子を、1mlの被処理液中に100個以下にする分級工程と、
前記分級工程後の被処理液に薬剤を添加して、前記研磨材の濃度調整および前記被処理液のpH調整を行う調整工程と、
前記調整工程後にフィルターを用いてろ過する工程とを含む、研磨スラリーの製造方法。 - 前記分級工程は、前記被処理液中に含まれる前記研磨材のうち、粒子径0.99μmの粒子に相当する重量以上の重量を有する粒子および粒子群の数を、分級前の20%以下に減少させ、かつ、粒子径9.99μmの粒子に相当する重量以上の重量を有する粒子および粒子群の数を、分級前の1%以下に減少させるように行われる、請求項1に記載の研磨スラリーの製造方法。
- 前記分級工程は、前記被処理液中の前記研磨材のうち、重量の重い方から3wt%の粒子を除去する工程である、請求項1または2に記載の研磨スラリーの製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004223914A JP4541796B2 (ja) | 2004-07-30 | 2004-07-30 | 研磨スラリーの製造方法 |
DE602005002417T DE602005002417T2 (de) | 2004-07-30 | 2005-07-27 | Verfahren zum Herstellen einer Polieraufschlämmung zur Verwendung in einem Präzisionspolierverfahren |
EP05016312A EP1621595B1 (en) | 2004-07-30 | 2005-07-27 | Method of manufacturing polishing slurry for use in precise polishing process |
TW094125601A TWI292358B (en) | 2004-07-30 | 2005-07-28 | Method of manufacturing polishing slurry for use in precise polishing process |
US11/192,364 US20060032148A1 (en) | 2004-07-30 | 2005-07-29 | Method of manufacturing polishing slurry for use in precise polishing process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004223914A JP4541796B2 (ja) | 2004-07-30 | 2004-07-30 | 研磨スラリーの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006043781A JP2006043781A (ja) | 2006-02-16 |
JP4541796B2 true JP4541796B2 (ja) | 2010-09-08 |
Family
ID=35344677
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004223914A Active JP4541796B2 (ja) | 2004-07-30 | 2004-07-30 | 研磨スラリーの製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20060032148A1 (ja) |
EP (1) | EP1621595B1 (ja) |
JP (1) | JP4541796B2 (ja) |
DE (1) | DE602005002417T2 (ja) |
TW (1) | TWI292358B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200717635A (en) * | 2005-09-06 | 2007-05-01 | Komatsu Denshi Kinzoku Kk | Polishing method for semiconductor wafer |
CN101500754A (zh) * | 2006-08-16 | 2009-08-05 | 旭硝子株式会社 | 从研磨剂浆料废液中回收研磨剂的方法及装置 |
JP4823881B2 (ja) * | 2006-12-05 | 2011-11-24 | 野村マイクロ・サイエンス株式会社 | 半導体用研磨スラリー中の異物検査方法及び異物検査装置 |
JP5261096B2 (ja) * | 2008-09-17 | 2013-08-14 | 水ing株式会社 | シリコン回収方法、及びシリコン回収装置 |
TW201638409A (zh) * | 2015-01-16 | 2016-11-01 | Mitsubishi Rayon Co | 丙烯酸纖維束的製造方法和加壓蒸汽拉伸裝置 |
WO2018156678A1 (en) * | 2017-02-23 | 2018-08-30 | Nikon Corporation | Fluid synthesis system |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001068439A (ja) * | 1999-08-30 | 2001-03-16 | Ebara Corp | 砥液供給装置 |
JP2001246563A (ja) * | 2000-02-29 | 2001-09-11 | Ebara Corp | 砥液供給装置 |
JP2002133649A (ja) * | 2000-10-19 | 2002-05-10 | Nippon Sheet Glass Co Ltd | 情報記録媒体用基板及びその製造方法 |
JP2003205460A (ja) * | 2002-01-15 | 2003-07-22 | Speedfam Co Ltd | 酸化セリウム系研磨剤再生方法 |
JP2005109129A (ja) * | 2003-09-30 | 2005-04-21 | Dainippon Ink & Chem Inc | 研磨用砥粒、研磨用水性分散液及び研磨剤 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
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US4956015A (en) * | 1988-01-19 | 1990-09-11 | Mitsubishi Kasei Corporation | Polishing composition |
US5114437A (en) * | 1990-08-28 | 1992-05-19 | Sumitomo Chemical Co., Ltd. | Polishing composition for metallic material |
US5664990A (en) * | 1996-07-29 | 1997-09-09 | Integrated Process Equipment Corp. | Slurry recycling in CMP apparatus |
US6126853A (en) * | 1996-12-09 | 2000-10-03 | Cabot Microelectronics Corporation | Chemical mechanical polishing slurry useful for copper substrates |
US6022400A (en) * | 1997-05-22 | 2000-02-08 | Nippon Steel Corporation | Polishing abrasive grains, polishing agent and polishing method |
DE19835206A1 (de) * | 1998-08-04 | 2000-02-17 | Basf Coatings Ag | Wäßrige Pulverklarlack-Dispersion |
US6447693B1 (en) * | 1998-10-21 | 2002-09-10 | W. R. Grace & Co.-Conn. | Slurries of abrasive inorganic oxide particles and method for polishing copper containing surfaces |
CA2347632A1 (en) * | 1998-10-21 | 2000-04-27 | W.R. Grace & Co.-Conn. | Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles |
JP2001009706A (ja) | 1999-07-02 | 2001-01-16 | Toshiba Corp | ウエーハ研磨剤スラリー用フィルター装置 |
JP2001053039A (ja) * | 1999-08-05 | 2001-02-23 | Okamoto Machine Tool Works Ltd | ウエハの研磨終点検出方法および研磨終点検出装置 |
MY118582A (en) * | 2000-05-12 | 2004-12-31 | Kao Corp | Polishing composition |
JP2001326199A (ja) * | 2000-05-17 | 2001-11-22 | Hitachi Ltd | 半導体集積回路装置の製造方法 |
US6802983B2 (en) * | 2001-09-17 | 2004-10-12 | Advanced Technology Materials, Inc. | Preparation of high performance silica slurry using a centrifuge |
DE602004007718T2 (de) * | 2003-05-12 | 2008-04-30 | Jsr Corp. | Chemisch-mechanisches Poliermittel-Kit und chemisch-mechanisches Polierverfahren unter Verwendung desselben |
US7344988B2 (en) * | 2003-10-27 | 2008-03-18 | Dupont Air Products Nanomaterials Llc | Alumina abrasive for chemical mechanical polishing |
KR100588404B1 (ko) * | 2004-03-16 | 2006-06-12 | 삼성코닝 주식회사 | 반도체 박막 연마용 산화세륨 슬러리 |
US20050211952A1 (en) * | 2004-03-29 | 2005-09-29 | Timothy Mace | Compositions and methods for chemical mechanical planarization of tungsten and titanium |
US6979252B1 (en) * | 2004-08-10 | 2005-12-27 | Dupont Air Products Nanomaterials Llc | Low defectivity product slurry for CMP and associated production method |
-
2004
- 2004-07-30 JP JP2004223914A patent/JP4541796B2/ja active Active
-
2005
- 2005-07-27 EP EP05016312A patent/EP1621595B1/en active Active
- 2005-07-27 DE DE602005002417T patent/DE602005002417T2/de active Active
- 2005-07-28 TW TW094125601A patent/TWI292358B/zh active
- 2005-07-29 US US11/192,364 patent/US20060032148A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001068439A (ja) * | 1999-08-30 | 2001-03-16 | Ebara Corp | 砥液供給装置 |
JP2001246563A (ja) * | 2000-02-29 | 2001-09-11 | Ebara Corp | 砥液供給装置 |
JP2002133649A (ja) * | 2000-10-19 | 2002-05-10 | Nippon Sheet Glass Co Ltd | 情報記録媒体用基板及びその製造方法 |
JP2003205460A (ja) * | 2002-01-15 | 2003-07-22 | Speedfam Co Ltd | 酸化セリウム系研磨剤再生方法 |
JP2005109129A (ja) * | 2003-09-30 | 2005-04-21 | Dainippon Ink & Chem Inc | 研磨用砥粒、研磨用水性分散液及び研磨剤 |
Also Published As
Publication number | Publication date |
---|---|
DE602005002417T2 (de) | 2008-06-05 |
JP2006043781A (ja) | 2006-02-16 |
EP1621595A1 (en) | 2006-02-01 |
EP1621595B1 (en) | 2007-09-12 |
TW200613091A (en) | 2006-05-01 |
TWI292358B (en) | 2008-01-11 |
DE602005002417D1 (de) | 2007-10-25 |
US20060032148A1 (en) | 2006-02-16 |
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