JP4532806B2 - オゾンを含むフッ素化溶媒組成物 - Google Patents

オゾンを含むフッ素化溶媒組成物 Download PDF

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Publication number
JP4532806B2
JP4532806B2 JP2001572661A JP2001572661A JP4532806B2 JP 4532806 B2 JP4532806 B2 JP 4532806B2 JP 2001572661 A JP2001572661 A JP 2001572661A JP 2001572661 A JP2001572661 A JP 2001572661A JP 4532806 B2 JP4532806 B2 JP 4532806B2
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JP
Japan
Prior art keywords
ozone
fluorinated solvent
fluorinated
cleaning
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001572661A
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English (en)
Japanese (ja)
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JP2003529925A (ja
JP2003529925A5 (https=
Inventor
ローレンス・エイ・ザゼラ
フレデリック・イー・ベーア
マイケル・ジェイ・ペアレント
ポール・イー・ラージタール
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of JP2003529925A5 publication Critical patent/JP2003529925A5/ja
Application granted granted Critical
Publication of JP4532806B2 publication Critical patent/JP4532806B2/ja
Anticipated expiration legal-status Critical
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3947—Liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5018—Halogenated solvents
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/50—Cleaning of wafers, substrates or parts of devices characterised by the part to be cleaned
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/263—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/264—Aldehydes; Ketones; Acetals or ketals
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/266—Esters or carbonates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3263—Amides or imides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2001572661A 2000-03-31 2000-08-08 オゾンを含むフッ素化溶媒組成物 Expired - Fee Related JP4532806B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/540,590 US6372700B1 (en) 2000-03-31 2000-03-31 Fluorinated solvent compositions containing ozone
US09/540,590 2000-03-31
PCT/US2000/021598 WO2001074985A1 (en) 2000-03-31 2000-08-08 Fluorinated solvent compositions containing ozone

Publications (3)

Publication Number Publication Date
JP2003529925A JP2003529925A (ja) 2003-10-07
JP2003529925A5 JP2003529925A5 (https=) 2007-09-27
JP4532806B2 true JP4532806B2 (ja) 2010-08-25

Family

ID=24156103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001572661A Expired - Fee Related JP4532806B2 (ja) 2000-03-31 2000-08-08 オゾンを含むフッ素化溶媒組成物

Country Status (9)

Country Link
US (2) US6372700B1 (https=)
EP (1) EP1268734B1 (https=)
JP (1) JP4532806B2 (https=)
KR (1) KR100728845B1 (https=)
AT (1) ATE280214T1 (https=)
AU (1) AU2000268956A1 (https=)
DE (1) DE60015190T2 (https=)
TW (1) TWI254075B (https=)
WO (1) WO2001074985A1 (https=)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6552090B1 (en) * 1997-09-15 2003-04-22 3M Innovative Properties Company Perfluoroalkyl haloalkyl ethers and compositions and applications thereof
US6372700B1 (en) * 2000-03-31 2002-04-16 3M Innovative Properties Company Fluorinated solvent compositions containing ozone
TWI250206B (en) * 2000-06-01 2006-03-01 Asahi Kasei Corp Cleaning agent, cleaning method and cleaning apparatus
US6678082B2 (en) 2001-09-12 2004-01-13 Harris Corporation Electro-optical component including a fluorinated poly(phenylene ether ketone) protective coating and related methods
JP3914842B2 (ja) * 2001-10-23 2007-05-16 有限会社ユーエムエス 有機被膜の除去方法および除去装置
DE10229041A1 (de) * 2002-06-28 2004-01-22 Solvay Fluor Und Derivate Gmbh Herstellung homogener Gasgemische
US7833957B2 (en) 2002-08-22 2010-11-16 Daikin Industries, Ltd. Removing solution
US7087805B2 (en) * 2002-10-22 2006-08-08 Steris Inc. Use of an ozone containing fluid to neutralize chemical and/or biological warfare agents
AU2003301858A1 (en) * 2002-11-06 2004-06-07 Nomura Plating Co., Ltd. Surface treatment method for vacuum member
US20040117918A1 (en) * 2002-12-11 2004-06-24 The Procter & Gamble Company Fluorine-containing solvents and compositions and methods employing same
US6858124B2 (en) 2002-12-16 2005-02-22 3M Innovative Properties Company Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor
US7147767B2 (en) 2002-12-16 2006-12-12 3M Innovative Properties Company Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor
US6884338B2 (en) 2002-12-16 2005-04-26 3M Innovative Properties Company Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor
ATE392466T1 (de) 2003-06-27 2008-05-15 Asahi Glass Co Ltd Reinigungs- bzw. spülverfahren
US20050106774A1 (en) * 2003-11-13 2005-05-19 Dmitri Simonian Surface processes in fabrications of microstructures
US7071154B2 (en) * 2003-12-18 2006-07-04 3M Innovative Properties Company Azeotrope-like compositions and their use
JP2005217262A (ja) * 2004-01-30 2005-08-11 Matsushita Electric Ind Co Ltd 化合物半導体装置の製造方法
KR100627139B1 (ko) * 2004-06-18 2006-09-25 한국전자통신연구원 미세기전 구조물 그 제조방법
JP4559250B2 (ja) * 2005-02-16 2010-10-06 シチズンファインテックミヨタ株式会社 アクチュエータ、及びその製造方法
JP2006278966A (ja) * 2005-03-30 2006-10-12 Toshiba Corp 半導体製造装置
US20070129273A1 (en) * 2005-12-07 2007-06-07 Clark Philip G In situ fluoride ion-generating compositions and uses thereof
JP4803821B2 (ja) * 2007-03-23 2011-10-26 大日本スクリーン製造株式会社 基板処理装置
JP2010529670A (ja) * 2007-06-07 2010-08-26 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード 半導体適用のための非可燃性溶媒
US8071816B2 (en) * 2008-06-30 2011-12-06 3M Innovative Properties Company Hydrofluoroacetal compounds and processes for their preparation and use
TWI558876B (zh) * 2010-07-05 2016-11-21 大陽日酸股份有限公司 表面氧化處理方法及表面氧化處理裝置
US20120039796A1 (en) * 2010-08-15 2012-02-16 Demetrios Markou Novel method for creating, suspending and stabilizing electronically modified oxygen derivatives, along with creating, suspending and stabilizing electronically modified reaction intermediates, in a bio compatible fluorocarbon suspension, for the purpose of inducing a cascading immune response in mammalian patients
JP5862353B2 (ja) * 2011-08-05 2016-02-16 東京エレクトロン株式会社 半導体装置の製造方法
JP5630679B1 (ja) * 2013-09-08 2014-11-26 株式会社Ｅ・テック 揮発性消毒剤、揮発性消毒剤の製造方法
US9321635B2 (en) * 2013-11-28 2016-04-26 Solid State System Co., Ltd. Method to release diaphragm in MEMS device
JP2016164977A (ja) * 2015-02-27 2016-09-08 キヤノン株式会社 ナノインプリント用液体材料、ナノインプリント用液体材料の製造方法、硬化物パターンの製造方法、光学部品の製造方法、回路基板の製造方法、および電子部品の製造方法
SG11201808059UA (en) 2016-03-24 2018-10-30 Avantor Performance Materials Llc Non-aqueous tungsten compatible metal nitride selective etchants and cleaners

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3235335A (en) * 1958-01-30 1966-02-15 Olin Mathieson Stabilized liquid ozone
DE1298514B (de) 1965-12-02 1969-07-03 Hoechst Ag Verfahren zur Herstellung von Perfluoralkyl-alkyl-aethern
FR2287432A1 (fr) 1974-10-10 1976-05-07 Poudres & Explosifs Ste Nale Nouveaux ethers fluores et leur procede de preparation
US4182663A (en) 1978-03-13 1980-01-08 Vaseen Vesper A Converting oxygen to ozone by U.V. radiation of a halogen saturated hydrocarbon liquid containing dissolved or absorbed oxygen
JP3016301B2 (ja) * 1992-04-15 2000-03-06 三菱電機株式会社 洗浄方法
JP2589930B2 (ja) 1993-03-05 1997-03-12 工業技術院長 メチル １，１，２，２，３，３−ヘキサフルオロプロピル エーテル及びその製造方法並びにこれを含有する洗浄剤
JP2551522B2 (ja) * 1993-06-29 1996-11-06 株式会社白洋舎 漂白・脱臭・殺菌方法
US5658962A (en) 1994-05-20 1997-08-19 Minnesota Mining And Manufacturing Company Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application
US5603750A (en) 1995-08-14 1997-02-18 Minnesota Mining And Manufacturing Company Fluorocarbon fluids as gas carriers to aid in precious and base metal heap leaching operations
AU5797296A (en) * 1995-12-15 1997-07-14 Minnesota Mining And Manufacturing Company Cleaning process and composition
US5750797A (en) 1996-04-15 1998-05-12 Minnesota Mining And Manufacturing Company Process for the production of hydrofluoroethers
DE19701971C1 (de) 1997-01-22 1998-11-26 Invent Gmbh Entwicklung Neuer Technologien Verfahren und Vorrichtung zur Reinigung von Substratoberflächen
US5882425A (en) 1997-01-23 1999-03-16 Semitool, Inc. Composition and method for passivation of a metallization layer of a semiconductor circuit after metallization etching
US6552090B1 (en) 1997-09-15 2003-04-22 3M Innovative Properties Company Perfluoroalkyl haloalkyl ethers and compositions and applications thereof
JP4299966B2 (ja) 1997-09-23 2009-07-22 エスイーゼツト・アクチエンゲゼルシヤフト 改善された化学的乾燥及び清浄化システム
US6046368A (en) 1998-03-17 2000-04-04 3M Innovative Properties Company Catalytic process for making hydrofluoroethers
US5914003A (en) 1998-06-09 1999-06-22 Mach I, Inc. Cellulose oxidation
JP4107720B2 (ja) * 1998-07-07 2008-06-25 スリーエム カンパニー 半導体製造装置における汚染物の洗浄方法
US6297308B1 (en) * 1999-10-07 2001-10-02 3M Innovative Properties Company Chemical compositions
US6310018B1 (en) * 2000-03-31 2001-10-30 3M Innovative Properties Company Fluorinated solvent compositions containing hydrogen fluoride
US6372700B1 (en) * 2000-03-31 2002-04-16 3M Innovative Properties Company Fluorinated solvent compositions containing ozone

Also Published As

Publication number Publication date
DE60015190T2 (de) 2006-03-09
AU2000268956A1 (en) 2001-10-15
KR20020081595A (ko) 2002-10-28
US20020107160A1 (en) 2002-08-08
US6372700B1 (en) 2002-04-16
KR100728845B1 (ko) 2007-06-14
EP1268734B1 (en) 2004-10-20
ATE280214T1 (de) 2004-11-15
JP2003529925A (ja) 2003-10-07
TWI254075B (en) 2006-05-01
US6537380B2 (en) 2003-03-25
DE60015190D1 (de) 2004-11-25
WO2001074985A1 (en) 2001-10-11
EP1268734A1 (en) 2003-01-02

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