JP4493412B2 - Ndフィルタの製造方法 - Google Patents

Ndフィルタの製造方法 Download PDF

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Publication number
JP4493412B2
JP4493412B2 JP2004165102A JP2004165102A JP4493412B2 JP 4493412 B2 JP4493412 B2 JP 4493412B2 JP 2004165102 A JP2004165102 A JP 2004165102A JP 2004165102 A JP2004165102 A JP 2004165102A JP 4493412 B2 JP4493412 B2 JP 4493412B2
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Japan
Prior art keywords
film
filter
substrate
mask
vapor deposition
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Expired - Fee Related
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JP2004165102A
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Japanese (ja)
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JP2005345746A5 (https=
JP2005345746A (ja
Inventor
真志 内山
康典 斎藤
孝幸 若林
道男 柳
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Canon Electronics Inc
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Canon Electronics Inc
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Application filed by Canon Electronics Inc filed Critical Canon Electronics Inc
Priority to JP2004165102A priority Critical patent/JP4493412B2/ja
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Publication of JP4493412B2 publication Critical patent/JP4493412B2/ja
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  • Optical Elements Other Than Lenses (AREA)
  • Diaphragms For Cameras (AREA)
JP2004165102A 2004-06-02 2004-06-02 Ndフィルタの製造方法 Expired - Fee Related JP4493412B2 (ja)

Priority Applications (1)

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JP2004165102A JP4493412B2 (ja) 2004-06-02 2004-06-02 Ndフィルタの製造方法

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Application Number Priority Date Filing Date Title
JP2004165102A JP4493412B2 (ja) 2004-06-02 2004-06-02 Ndフィルタの製造方法

Publications (3)

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JP2005345746A JP2005345746A (ja) 2005-12-15
JP2005345746A5 JP2005345746A5 (https=) 2007-07-19
JP4493412B2 true JP4493412B2 (ja) 2010-06-30

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JP2004165102A Expired - Fee Related JP4493412B2 (ja) 2004-06-02 2004-06-02 Ndフィルタの製造方法

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JP (1) JP4493412B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113249699B (zh) * 2021-05-13 2022-11-04 沈阳仪表科学研究院有限公司 基于磁控溅射技术制备高精密波长渐变滤光片的方法及其采用的装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3839673B2 (ja) * 2001-02-20 2006-11-01 株式会社アルバック 有機蒸着装置
JP3621941B2 (ja) * 2002-09-24 2005-02-23 キヤノン電子株式会社 Ndフィルタの製造方法及びこのndフィルタを有する光量絞り装置及びカメラ

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JP2005345746A (ja) 2005-12-15

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