JP4457325B2 - 固体撮像装置 - Google Patents
固体撮像装置 Download PDFInfo
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- JP4457325B2 JP4457325B2 JP2009245346A JP2009245346A JP4457325B2 JP 4457325 B2 JP4457325 B2 JP 4457325B2 JP 2009245346 A JP2009245346 A JP 2009245346A JP 2009245346 A JP2009245346 A JP 2009245346A JP 4457325 B2 JP4457325 B2 JP 4457325B2
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- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14621—Colour filter arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14641—Electronic components shared by two or more pixel-elements, e.g. one amplifier shared by two pixel elements
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/10—Circuitry of solid-state image sensors [SSIS]; Control thereof for transforming different wavelengths into image signals
- H04N25/11—Arrangement of colour filter arrays [CFA]; Filter mosaics
- H04N25/13—Arrangement of colour filter arrays [CFA]; Filter mosaics characterised by the spectral characteristics of the filter elements
- H04N25/134—Arrangement of colour filter arrays [CFA]; Filter mosaics characterised by the spectral characteristics of the filter elements based on three different wavelength filter elements
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/10—Circuitry of solid-state image sensors [SSIS]; Control thereof for transforming different wavelengths into image signals
- H04N25/11—Arrangement of colour filter arrays [CFA]; Filter mosaics
- H04N25/13—Arrangement of colour filter arrays [CFA]; Filter mosaics characterised by the spectral characteristics of the filter elements
- H04N25/135—Arrangement of colour filter arrays [CFA]; Filter mosaics characterised by the spectral characteristics of the filter elements based on four or more different wavelength filter elements
- H04N25/136—Arrangement of colour filter arrays [CFA]; Filter mosaics characterised by the spectral characteristics of the filter elements based on four or more different wavelength filter elements using complementary colours
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
- H04N25/778—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising amplifiers shared between a plurality of pixels, i.e. at least one part of the amplifier must be on the sensor array itself
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
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- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Solid State Image Pick-Up Elements (AREA)
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- Color Television Image Signal Generators (AREA)
Description
<実施例1>
次に、第2の実施例について説明する。
2,102 フォトダイオード部
3,103 電荷転送ゲート
4,4a,4b,104 フローティングディフュージョン部
5,105 増幅用トランジスタ
6,106 垂直選択用トランジスタ
7,107 リセットトランジスタ
8,108 電源線
9,109 読み出し信号線
10,20,30,100 単位画素
11 垂直シフトレジスタ
12 水平シフトレジスタ
13 垂直選択線
14 垂直リセット線
15 垂直信号線
16 水平選択用トランジスタ
17 水平選択線
18 水平信号線
24,124 絶縁層
25,125 パッシベーション膜
26 画素色フィルタ層
27 オンチップレンズ
28 FD部を共有し合う単位画素間の境界位置
29 FD部を共有しない単位画素間の境界位置
31 j行Grとj+1行Bのフォトダイオード重心距離
32 j行Rとj+1行Gbのフォトダイオード重心距離
33 j行Grとj+1行Gbのフォトダイオード重心距離
34 j+1行Gbとj+2行Grのフォトダイオード重心距離
35 j+1行Bとj+2行Grのフォトダイオード重心距離
36 j+1行Gbとj+2行Rのフォトダイオード重心距離
37 j行Rとj+1行Bのフォトダイオード重心距離
38 j+1行Bとj+2行Rのフォトダイオード重心距離
41 i列Grとi+1列Rのフォトダイオード重心距離
42 i列Bとi+1列Gbのフォトダイオード重心距離
43 i列Grとi+1列Gbのフォトダイオード重心距離
44 i+1列Gbとi+2列Grのフォトダイオード重心距離
45 i+1列Rとi+2列Grのフォトダイオード重心距離
46 j+1列Gbとj+2列Rのフォトダイオード重心距離
51 共有画素
61 画素ピッチA
62 画素ピッチB
121 1層目の配線
122 2層目の配線
123 3層目の配線
126 画素色フィルタ層
127 オンチップレンズ
Claims (2)
- 半導体基板上に、光を信号電荷に変換して蓄積するフォトダイオードが行列状(i,j)に複数配置され、前記フォトダイオードに蓄積された前記信号電荷を読み出すための電荷転送ゲートと、前記電荷転送ゲートを介して読み出した前記フォトダイオードで光電変換された前記信号電荷を電位に変換するフローティングディフュージョンとが設けられ、前記信号電荷をリセットするリセットトランジスタ及び読出した信号電荷を増幅する増幅用トランジスタを複数の前記フォトダイオードで共有する固体撮像装置において、
前記リセットトランジスタと前記増幅用トランジスタとを共有する共有領域内の第1フォトダイオード(i,j)と第2フォトダイオード(i,j+1)の間に配置された前記リセットトランジスタ又は前記増幅用トランジスタの一方を備え、
前記第1フォトダイオード(i,j)と第2フォトダイオード(i,j+1)の間に配置されていない他方の前記リセットトランジスタ又は前記増幅用トランジスタが、第3フォトダイオード(i+1,j+n)と第4フォトダイオード(i+1,j+n+1)の間に配置され、かつ
前記nが−1又は+1であることを特徴とする固体撮像装置。 - 半導体基板上に、光を信号電荷に変換して蓄積するフォトダイオードが行列状(i,j)に複数配置され、前記フォトダイオードに蓄積された前記信号電荷を読み出すための電荷転送ゲートと、前記電荷転送ゲートを介して読み出した前記フォトダイオードで光電変換された前記信号電荷を電位に変換するフローティングディフュージョンとが設けられ、前記信号電荷をリセットするリセットトランジスタ及び読出した信号電荷を増幅する増幅用トランジスタを複数のフォトダイオードで共有する固体撮像装置において、
前記リセットトランジスタ、前記増幅用トランジスタを共有する共有領域内の第1フォトダイオード(i,j)と第2フォトダイオード(i+1,j)の間に配置された前記リセットトランジスタ又は前記増幅用トランジスタの一方を備え、
前記第1フォトダイオード(i,j)と第2フォトダイオード(i+1,j)の間に配置されていない他方の前記リセットトランジスタ又は前記増幅用トランジスタが、第3フォトダイオード(i+n,j+1)と第4フォトダイオード(i+n+1,j+1)の間に配置され、かつ
前記nが−1又は+1であることを特徴とする固体撮像装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009245346A JP4457325B2 (ja) | 2007-04-18 | 2009-10-26 | 固体撮像装置 |
Applications Claiming Priority (2)
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JP2007108869 | 2007-04-18 | ||
JP2009245346A JP4457325B2 (ja) | 2007-04-18 | 2009-10-26 | 固体撮像装置 |
Related Parent Applications (1)
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JP2009511829A Division JP4457326B2 (ja) | 2007-04-18 | 2008-04-16 | 固体撮像装置 |
Publications (2)
Publication Number | Publication Date |
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JP2010063120A JP2010063120A (ja) | 2010-03-18 |
JP4457325B2 true JP4457325B2 (ja) | 2010-04-28 |
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Application Number | Title | Priority Date | Filing Date |
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JP2009511829A Expired - Fee Related JP4457326B2 (ja) | 2007-04-18 | 2008-04-16 | 固体撮像装置 |
JP2009245346A Expired - Fee Related JP4457325B2 (ja) | 2007-04-18 | 2009-10-26 | 固体撮像装置 |
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JP2009511829A Expired - Fee Related JP4457326B2 (ja) | 2007-04-18 | 2008-04-16 | 固体撮像装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8208054B2 (ja) |
JP (2) | JP4457326B2 (ja) |
KR (1) | KR101068698B1 (ja) |
WO (1) | WO2008133146A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8860100B2 (en) | 2010-12-10 | 2014-10-14 | Seiko Epson Corporation | Solid-state imaging device |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5584982B2 (ja) | 2009-02-09 | 2014-09-10 | ソニー株式会社 | 固体撮像素子およびカメラシステム |
US8059222B2 (en) * | 2007-07-19 | 2011-11-15 | Sharp Kabushiki Kaisha | Display device and method for manufacturing the same |
GB2466213B (en) * | 2008-12-12 | 2013-03-06 | Cmosis Nv | Pixel array with shared readout circuitry |
JP5109962B2 (ja) * | 2008-12-22 | 2012-12-26 | ソニー株式会社 | 固体撮像装置および電子機器 |
US8576312B2 (en) | 2009-02-04 | 2013-11-05 | Rosnes Corporation | Solid-state image pickup device with particular pixel arrangement |
WO2010090133A1 (ja) * | 2009-02-04 | 2010-08-12 | 株式会社 Rosnes | 固体撮像装置 |
US8547458B2 (en) | 2009-02-04 | 2013-10-01 | Rosnes Corporation | Solid-state image pickup device |
JP4881987B2 (ja) * | 2009-10-06 | 2012-02-22 | キヤノン株式会社 | 固体撮像装置および撮像装置 |
JP5537172B2 (ja) | 2010-01-28 | 2014-07-02 | ソニー株式会社 | 固体撮像装置及び電子機器 |
JP5526928B2 (ja) * | 2010-03-30 | 2014-06-18 | ソニー株式会社 | 固体撮像装置および撮像装置 |
JP5672776B2 (ja) * | 2010-06-02 | 2015-02-18 | ソニー株式会社 | 画像処理装置、および画像処理方法、並びにプログラム |
JP5697371B2 (ja) | 2010-07-07 | 2015-04-08 | キヤノン株式会社 | 固体撮像装置および撮像システム |
JP5885401B2 (ja) | 2010-07-07 | 2016-03-15 | キヤノン株式会社 | 固体撮像装置および撮像システム |
JP5751766B2 (ja) * | 2010-07-07 | 2015-07-22 | キヤノン株式会社 | 固体撮像装置および撮像システム |
JP5656484B2 (ja) | 2010-07-07 | 2015-01-21 | キヤノン株式会社 | 固体撮像装置および撮像システム |
JP5643555B2 (ja) | 2010-07-07 | 2014-12-17 | キヤノン株式会社 | 固体撮像装置及び撮像システム |
JP5646421B2 (ja) * | 2011-09-22 | 2014-12-24 | 株式会社東芝 | 固体撮像装置および固体撮像システム |
JP2014090088A (ja) * | 2012-10-30 | 2014-05-15 | Renesas Electronics Corp | 半導体装置およびその製造方法 |
US9502457B2 (en) * | 2015-01-29 | 2016-11-22 | Semiconductor Components Industries, Llc | Global shutter image sensor pixels having centralized charge storage regions |
JP2017042708A (ja) * | 2015-08-26 | 2017-03-02 | セイコーエプソン株式会社 | 液滴吐出方法、プログラム、有機el装置の製造方法、カラーフィルターの形成方法 |
JP2020113573A (ja) * | 2019-01-08 | 2020-07-27 | キヤノン株式会社 | 光電変換装置 |
JP2020115516A (ja) * | 2019-01-17 | 2020-07-30 | ソニーセミコンダクタソリューションズ株式会社 | 撮像装置 |
US20230290791A1 (en) * | 2020-08-07 | 2023-09-14 | Rosnes Corporation | Imaging device |
US20230308780A1 (en) * | 2020-08-21 | 2023-09-28 | Rosnes Corporation | Imaging device, and electronic instrument comprising imaging device |
WO2022067455A1 (en) * | 2020-09-29 | 2022-04-07 | Huawei Technologies Co., Ltd. | Solid state imaging device |
CN117880653A (zh) * | 2021-12-22 | 2024-04-12 | 荣耀终端有限公司 | 多光谱传感器以及电子设备 |
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2008
- 2008-04-16 US US12/595,229 patent/US8208054B2/en active Active
- 2008-04-16 KR KR1020097020084A patent/KR101068698B1/ko not_active IP Right Cessation
- 2008-04-16 JP JP2009511829A patent/JP4457326B2/ja not_active Expired - Fee Related
- 2008-04-16 WO PCT/JP2008/057439 patent/WO2008133146A1/ja active Application Filing
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JP2004215048A (ja) * | 2003-01-07 | 2004-07-29 | Matsushita Electric Ind Co Ltd | 固体撮像装置 |
JP2005183527A (ja) * | 2003-12-17 | 2005-07-07 | Iwate Toshiba Electronics Co Ltd | Cmosイメージセンサ |
JP2006080937A (ja) * | 2004-09-10 | 2006-03-23 | Sony Corp | 物理情報取得方法および物理情報取得装置、並びに物理量分布検知の半導体装置、プログラム、および撮像モジュール |
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Publication number | Priority date | Publication date | Assignee | Title |
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US8860100B2 (en) | 2010-12-10 | 2014-10-14 | Seiko Epson Corporation | Solid-state imaging device |
Also Published As
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JPWO2008133146A1 (ja) | 2010-07-22 |
KR101068698B1 (ko) | 2011-09-28 |
JP4457326B2 (ja) | 2010-04-28 |
WO2008133146A1 (ja) | 2008-11-06 |
US8208054B2 (en) | 2012-06-26 |
US20100066877A1 (en) | 2010-03-18 |
KR20090125143A (ko) | 2009-12-03 |
JP2010063120A (ja) | 2010-03-18 |
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