JP4443234B2 - 低oh含有率を有する円筒状石英ガラス体の製造方法 - Google Patents
低oh含有率を有する円筒状石英ガラス体の製造方法 Download PDFInfo
- Publication number
- JP4443234B2 JP4443234B2 JP2003587745A JP2003587745A JP4443234B2 JP 4443234 B2 JP4443234 B2 JP 4443234B2 JP 2003587745 A JP2003587745 A JP 2003587745A JP 2003587745 A JP2003587745 A JP 2003587745A JP 4443234 B2 JP4443234 B2 JP 4443234B2
- Authority
- JP
- Japan
- Prior art keywords
- vitrification
- pretreatment
- furnace
- quartz glass
- enclosure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000004017 vitrification Methods 0.000 claims description 45
- 238000010438 heat treatment Methods 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 34
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 31
- 239000004071 soot Substances 0.000 claims description 28
- 229910052801 chlorine Inorganic materials 0.000 claims description 13
- 239000000460 chlorine Substances 0.000 claims description 13
- 208000005156 Dehydration Diseases 0.000 claims description 12
- 230000018044 dehydration Effects 0.000 claims description 12
- 238000006297 dehydration reaction Methods 0.000 claims description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 11
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 239000013307 optical fiber Substances 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 4
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 239000002210 silicon-based material Substances 0.000 claims description 2
- 238000009826 distribution Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 238000009827 uniform distribution Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
- C03B37/0146—Furnaces therefor, e.g. muffle tubes, furnace linings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10218864A DE10218864C1 (de) | 2002-04-26 | 2002-04-26 | Verfahren zur Herstellung eines zylinderförmigen Quarzglaskörpers mit geringem OH-Gehalt |
| PCT/EP2003/004412 WO2003091171A2 (de) | 2002-04-26 | 2003-04-28 | Verfahren zur herstellung eines zylinderförmigen quarzglaskörpers mit geringem oh-gehalt |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005523863A JP2005523863A (ja) | 2005-08-11 |
| JP2005523863A5 JP2005523863A5 (enExample) | 2006-02-02 |
| JP4443234B2 true JP4443234B2 (ja) | 2010-03-31 |
Family
ID=28458955
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003587745A Expired - Fee Related JP4443234B2 (ja) | 2002-04-26 | 2003-04-28 | 低oh含有率を有する円筒状石英ガラス体の製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20050172676A1 (enExample) |
| JP (1) | JP4443234B2 (enExample) |
| CN (1) | CN1305791C (enExample) |
| AU (1) | AU2003236840A1 (enExample) |
| DE (1) | DE10218864C1 (enExample) |
| WO (1) | WO2003091171A2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1632460A4 (en) * | 2003-05-19 | 2011-12-28 | Sumitomo Electric Industries | OPTICAL FIBER AND METHOD FOR PRODUCING THE SAME |
| WO2005099357A1 (en) * | 2004-04-13 | 2005-10-27 | Sebit Co., Ltd | Method for manufacturing high heat-resistant quartz glass |
| JP5066784B2 (ja) * | 2005-02-04 | 2012-11-07 | 旭硝子株式会社 | 合成石英ガラスの製造方法 |
| DE102005059290A1 (de) * | 2005-12-09 | 2007-06-14 | Heraeus Tenevo Gmbh | Verfahren und Vorrichtung zur Herstellung eines Formkörpers aus Quarzglas |
| DE102006059779B4 (de) * | 2006-12-15 | 2010-06-24 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Hohlzylinders aus synthetischem Quarzglas, nach dem Verfahren erhaltener dickwandiger Hohlzylinder und Verfahren zur Herstellung einer Vorform für optische Fasern |
| CN101323501B (zh) * | 2007-01-02 | 2015-10-07 | 德雷卡通信技术公司 | 用于石英玻璃沉积管的连续焙烧方法 |
| US8062986B2 (en) * | 2007-07-27 | 2011-11-22 | Corning Incorporated | Fused silica having low OH, OD levels and method of making |
| US20100122558A1 (en) * | 2008-11-19 | 2010-05-20 | John Michael Jewell | Apparatus and Method of Sintering an Optical Fiber Preform |
| EP2977359B1 (de) | 2014-07-21 | 2016-10-19 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von mit fluor dotiertem quarzglas |
| CN114031274A (zh) * | 2021-12-09 | 2022-02-11 | 中天科技精密材料有限公司 | 连续式低羟基高均匀性石英玻璃的制备方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6136129A (ja) * | 1984-07-30 | 1986-02-20 | Sumitomo Electric Ind Ltd | 光フアイバ用ガラス母材の製造方法 |
| US4969941A (en) * | 1987-02-16 | 1990-11-13 | Sumitomo Electric Industries, Ltd. | Furnace for heating glass preform for optical fiber and method for producing glass preform |
| AU626362B2 (en) * | 1988-12-29 | 1992-07-30 | Sumitomo Electric Industries, Ltd. | Furnace for producing high purity quartz glass preform |
| AU653411B2 (en) * | 1991-07-19 | 1994-09-29 | Sumitomo Electric Industries, Ltd. | Method for producing glass preform for optical fiber |
| GB9210327D0 (en) * | 1992-05-14 | 1992-07-01 | Tsl Group Plc | Heat treatment facility for synthetic vitreous silica bodies |
| JP3036993B2 (ja) * | 1992-09-07 | 2000-04-24 | 信越化学工業株式会社 | 合成石英ガラス部材の製造方法 |
| JP3277719B2 (ja) * | 1994-09-21 | 2002-04-22 | 住友金属工業株式会社 | 紫外光透過用合成石英ガラスおよびその製造方法 |
| CN1048700C (zh) * | 1995-03-17 | 2000-01-26 | 中国建筑材料科学研究院 | 紫外激光传能光纤预制棒制造方法 |
| JP3818603B2 (ja) * | 1996-05-21 | 2006-09-06 | 信越石英株式会社 | 石英ガラスの製造方法 |
| DE19649935C2 (de) * | 1996-12-02 | 1999-09-16 | Heraeus Quarzglas | Verfahren zur Herstellung von Quarzglaskörpern |
| US6253580B1 (en) * | 1997-12-19 | 2001-07-03 | Fibercore, Inc. | Method of making a tubular member for optical fiber production using plasma outside vapor deposition |
| JP2862001B2 (ja) * | 1998-04-03 | 1999-02-24 | 旭硝子株式会社 | 石英ガラス光学部材の製造方法 |
| EP1101741B1 (de) * | 1999-11-15 | 2005-07-13 | Heraeus Quarzglas GmbH & Co. KG | Quarzglaskörper für ein optisches Bauteil und Verfahren zu seiner Herstellung |
| AU2001277156A1 (en) * | 2000-08-10 | 2002-02-25 | Yazaki Corporation | Process for making glass bodies having refractive index gradients |
| EP1337483A1 (en) * | 2000-09-27 | 2003-08-27 | Corning Incorporated | Process for drying porous glass preforms |
| JP2003183042A (ja) * | 2001-12-14 | 2003-07-03 | Shin Etsu Chem Co Ltd | 光ファイバ用母材の製造方法及びその製造方法で製造した光ファイバ用母材 |
-
2002
- 2002-04-26 DE DE10218864A patent/DE10218864C1/de not_active Expired - Fee Related
-
2003
- 2003-04-28 JP JP2003587745A patent/JP4443234B2/ja not_active Expired - Fee Related
- 2003-04-28 WO PCT/EP2003/004412 patent/WO2003091171A2/de not_active Ceased
- 2003-04-28 CN CNB038094622A patent/CN1305791C/zh not_active Expired - Lifetime
- 2003-04-28 AU AU2003236840A patent/AU2003236840A1/en not_active Abandoned
- 2003-04-28 US US10/512,523 patent/US20050172676A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| CN1305791C (zh) | 2007-03-21 |
| AU2003236840A8 (en) | 2003-11-10 |
| JP2005523863A (ja) | 2005-08-11 |
| CN1649797A (zh) | 2005-08-03 |
| DE10218864C1 (de) | 2003-10-23 |
| WO2003091171A3 (de) | 2004-10-14 |
| AU2003236840A1 (en) | 2003-11-10 |
| US20050172676A1 (en) | 2005-08-11 |
| WO2003091171A2 (de) | 2003-11-06 |
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