JP4640292B2 - 石英ガラス体製造方法 - Google Patents
石英ガラス体製造方法 Download PDFInfo
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- JP4640292B2 JP4640292B2 JP2006227978A JP2006227978A JP4640292B2 JP 4640292 B2 JP4640292 B2 JP 4640292B2 JP 2006227978 A JP2006227978 A JP 2006227978A JP 2006227978 A JP2006227978 A JP 2006227978A JP 4640292 B2 JP4640292 B2 JP 4640292B2
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- Prior art keywords
- glass
- quartz glass
- fine particle
- gas
- deposit
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
Description
Claims (2)
- 加熱炉内に配置されたガラス微粒子堆積体を加熱処理し透明ガラス化して石英ガラス体を製造する方法であって、
前記加熱炉内を実質的にCO非含有の減圧雰囲気として前記ガラス微粒子堆積体を加熱処理し、前記ガラス微粒子堆積体の表面または内部に存在するH2O分子を除去するH2O除去工程と、
COガスと不活性ガスを予め混合してCO濃度を12%以下とした混合ガスを前記加熱炉内に供給し、前記加熱炉内をCOの分圧を1000Pa以上としたCO含有雰囲気として前記ガラス微粒子堆積体を加熱処理し、前記ガラス微粒子堆積体の表面又は内部に存在するOH基を除去するOH除去工程と、
前記加熱炉内を不活性ガス雰囲気または減圧雰囲気として、透明ガラス化しない温度で前記ガラス微粒子堆積体を加熱処理し、前記ガラス微粒子堆積体の表面または内部に存在するCO分子を除去するCO除去工程と、
前記ガラス微粒子堆積体を加熱処理し透明ガラス化する透明化工程と、
を備えることを特徴とする石英ガラス体製造方法。 - 少なくとも前記OH除去工程において、前記加熱炉における給気および排気を継続する、ことを特徴とする請求項1記載の石英ガラス体製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006227978A JP4640292B2 (ja) | 2006-08-24 | 2006-08-24 | 石英ガラス体製造方法 |
Applications Claiming Priority (1)
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JP2006227978A JP4640292B2 (ja) | 2006-08-24 | 2006-08-24 | 石英ガラス体製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP2008050202A JP2008050202A (ja) | 2008-03-06 |
JP4640292B2 true JP4640292B2 (ja) | 2011-03-02 |
Family
ID=39234589
Family Applications (1)
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JP2006227978A Expired - Fee Related JP4640292B2 (ja) | 2006-08-24 | 2006-08-24 | 石英ガラス体製造方法 |
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JP (1) | JP4640292B2 (ja) |
Families Citing this family (1)
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JPWO2022065486A1 (ja) | 2020-09-28 | 2022-03-31 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003112944A (ja) * | 2001-10-04 | 2003-04-18 | Tosoh Corp | 真空紫外光用高均質合成石英ガラス、その製造方法及びこれを用いた真空紫外光用マスク基板 |
WO2004050570A1 (ja) * | 2002-11-29 | 2004-06-17 | Shin-Etsu Quartz Products Co., Ltd. | 合成石英ガラスの製造方法及び合成石英ガラス体 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3931351B2 (ja) * | 1994-12-27 | 2007-06-13 | 東ソー株式会社 | 高純度、高耐熱性シリカガラスの製造方法 |
EP0747327B2 (en) * | 1995-06-07 | 2003-08-27 | Corning Incorporated | Method of thermally treating and consolidating silica preforms for reducing laser-induced optical damage in silica |
-
2006
- 2006-08-24 JP JP2006227978A patent/JP4640292B2/ja not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003112944A (ja) * | 2001-10-04 | 2003-04-18 | Tosoh Corp | 真空紫外光用高均質合成石英ガラス、その製造方法及びこれを用いた真空紫外光用マスク基板 |
WO2004050570A1 (ja) * | 2002-11-29 | 2004-06-17 | Shin-Etsu Quartz Products Co., Ltd. | 合成石英ガラスの製造方法及び合成石英ガラス体 |
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JP2008050202A (ja) | 2008-03-06 |
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