JP2005523863A - 低oh含有率を有する円筒状石英ガラス体の製造方法 - Google Patents
低oh含有率を有する円筒状石英ガラス体の製造方法 Download PDFInfo
- Publication number
- JP2005523863A JP2005523863A JP2003587745A JP2003587745A JP2005523863A JP 2005523863 A JP2005523863 A JP 2005523863A JP 2003587745 A JP2003587745 A JP 2003587745A JP 2003587745 A JP2003587745 A JP 2003587745A JP 2005523863 A JP2005523863 A JP 2005523863A
- Authority
- JP
- Japan
- Prior art keywords
- pretreatment
- vitrification
- enclosure
- heating zone
- quartz glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
- C03B37/0146—Furnaces therefor, e.g. muffle tubes, furnace linings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Abstract
Description
SiO2の煤粒子を、堆積バーナのバーナ炎中でのSiCl4の火炎加水分解によって形成させ、かつ前記粒子をその軸線の周りを回転している支持棒上に層状に堆積させ、SiO2の多孔質の煤体を形成させる。堆積法の完了後に、支持棒を取り去る。以下の例として説明する方法により、石英ガラス密度の約25%の密度を有する透明石英ガラス管をこの方法で得られた煤管から製造する:
煤管を、製造プロセスのため導入された水酸基を除去するために脱水処理する。この目的のために、煤管を垂直配向で脱水炉に導入し、かつ最初に900℃付近の温度で塩素含有雰囲気内で処理する。該処理を約8時間続ける。煤管内の水酸基濃度は、こうして100質量ppbよりも低くなる。
石英ガラス密度の約25%の密度を有する煤管を、実施例1を参照して上記したように外部堆積によって製造し、かつそこから透明石英ガラス管を以下に説明する方法により製造する:
煤管に、製造プロセスのため導入された水酸基を除去するため実施例1に関して説明したのと同じ脱水処理を行う。こうして煤管における水酸基濃度は、100質量ppb未満になる。
Claims (9)
- まず細長い多孔質の煤体を、ケイ素含有化合物の火炎加水分解及び回転する担体上でのSiO2粒子の層状の堆積によって製造し、前記煤体を脱水処理し、かつ次いでガラス化炉内でガラス化させる、低OH含有率を有する円筒状石英ガラス体の製造方法において、脱水処理後及びガラス化前に煤体を保護ガス中及び/又は真空中でガラス化炉内で、加熱帯域において100〜1350℃の範囲に及ぶ温度まで加熱して前処理することを特徴とする方法。
- 煤体をその一端部から始めて加熱帯域に供給し、かつそこで帯域的に加熱することを特徴とする請求項1に記載の方法。
- 煤体を前処理の間に、加熱帯域において800〜1180℃の範囲に及ぶ温度まで加熱することを特徴とする請求項1又は2に記載の方法。
- 前処理の間に、100ミリバール未満の内圧を維持させることを特徴とする請求項1から3までの何れか一項に記載の方法。
- 前処理の間に、1ミリバール未満の内圧を維持させることを特徴とする請求項3に記載の方法。
- 煤体を前処理の間に、加熱帯域に20mm/分以下の速度で供給することを特徴とする請求項2から5までの何れか一項に記載の方法。
- 煤体を前処理直後に少なくとも1200℃の温度でガラス化させ、その際、前処理の終結時に存在する内圧を維持させるか又は減少させることを特徴とする請求項1から6までの何れか一項に記載の方法。
- 煤体をガラス化の間にその上端部から始めて加熱帯域に供給し、かつそこで帯域的にガラス化させ、前処理の間と反対の方向で、煤体を加熱帯域に供給することを特徴とする請求項2から7までの何れか一項に記載の方法。
- 該円筒状石英ガラス体が、光ファイバ用プリフォームを製造するために使用されることを特徴とする請求項1から8までの何れか一項に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10218864A DE10218864C1 (de) | 2002-04-26 | 2002-04-26 | Verfahren zur Herstellung eines zylinderförmigen Quarzglaskörpers mit geringem OH-Gehalt |
PCT/EP2003/004412 WO2003091171A2 (de) | 2002-04-26 | 2003-04-28 | Verfahren zur herstellung eines zylinderförmigen quarzglaskörpers mit geringem oh-gehalt |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005523863A true JP2005523863A (ja) | 2005-08-11 |
JP2005523863A5 JP2005523863A5 (ja) | 2006-02-02 |
JP4443234B2 JP4443234B2 (ja) | 2010-03-31 |
Family
ID=28458955
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003587745A Expired - Fee Related JP4443234B2 (ja) | 2002-04-26 | 2003-04-28 | 低oh含有率を有する円筒状石英ガラス体の製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20050172676A1 (ja) |
JP (1) | JP4443234B2 (ja) |
CN (1) | CN1305791C (ja) |
AU (1) | AU2003236840A1 (ja) |
DE (1) | DE10218864C1 (ja) |
WO (1) | WO2003091171A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010534620A (ja) * | 2007-07-27 | 2010-11-11 | コーニング インコーポレイテッド | 低oh、odレベルを有する溶融シリカおよびその製造方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060007434A (ko) * | 2003-05-19 | 2006-01-24 | 스미토모 덴키 고교 가부시키가이샤 | 광파이버와 그 제조 방법 |
WO2005099357A1 (en) * | 2004-04-13 | 2005-10-27 | Sebit Co., Ltd | Method for manufacturing high heat-resistant quartz glass |
JP5066784B2 (ja) | 2005-02-04 | 2012-11-07 | 旭硝子株式会社 | 合成石英ガラスの製造方法 |
DE102005059290A1 (de) * | 2005-12-09 | 2007-06-14 | Heraeus Tenevo Gmbh | Verfahren und Vorrichtung zur Herstellung eines Formkörpers aus Quarzglas |
DE102006059779B4 (de) * | 2006-12-15 | 2010-06-24 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Hohlzylinders aus synthetischem Quarzglas, nach dem Verfahren erhaltener dickwandiger Hohlzylinder und Verfahren zur Herstellung einer Vorform für optische Fasern |
EP1942081B1 (en) * | 2007-01-02 | 2011-11-09 | Draka Comteq B.V. | Extended baking process for quartz glass deposition tubes. |
US20100122558A1 (en) * | 2008-11-19 | 2010-05-20 | John Michael Jewell | Apparatus and Method of Sintering an Optical Fiber Preform |
EP2977359B1 (de) | 2014-07-21 | 2016-10-19 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von mit fluor dotiertem quarzglas |
CN114031274A (zh) * | 2021-12-09 | 2022-02-11 | 中天科技精密材料有限公司 | 连续式低羟基高均匀性石英玻璃的制备方法 |
Family Cites Families (16)
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---|---|---|---|---|
JPS6136129A (ja) * | 1984-07-30 | 1986-02-20 | Sumitomo Electric Ind Ltd | 光フアイバ用ガラス母材の製造方法 |
KR950014101B1 (ko) * | 1987-02-16 | 1995-11-21 | 스미토모덴기고교 가부시키가이샤 | 광섬유용 유리모재의 가열로와 그 유리모재의 제조방법 |
AU626362B2 (en) * | 1988-12-29 | 1992-07-30 | Sumitomo Electric Industries, Ltd. | Furnace for producing high purity quartz glass preform |
AU653411B2 (en) * | 1991-07-19 | 1994-09-29 | Sumitomo Electric Industries, Ltd. | Method for producing glass preform for optical fiber |
GB9210327D0 (en) * | 1992-05-14 | 1992-07-01 | Tsl Group Plc | Heat treatment facility for synthetic vitreous silica bodies |
JP3036993B2 (ja) * | 1992-09-07 | 2000-04-24 | 信越化学工業株式会社 | 合成石英ガラス部材の製造方法 |
JP3277719B2 (ja) * | 1994-09-21 | 2002-04-22 | 住友金属工業株式会社 | 紫外光透過用合成石英ガラスおよびその製造方法 |
CN1048700C (zh) * | 1995-03-17 | 2000-01-26 | 中国建筑材料科学研究院 | 紫外激光传能光纤预制棒制造方法 |
JP3818603B2 (ja) * | 1996-05-21 | 2006-09-06 | 信越石英株式会社 | 石英ガラスの製造方法 |
DE19649935C2 (de) * | 1996-12-02 | 1999-09-16 | Heraeus Quarzglas | Verfahren zur Herstellung von Quarzglaskörpern |
US6253580B1 (en) * | 1997-12-19 | 2001-07-03 | Fibercore, Inc. | Method of making a tubular member for optical fiber production using plasma outside vapor deposition |
JP2862001B2 (ja) * | 1998-04-03 | 1999-02-24 | 旭硝子株式会社 | 石英ガラス光学部材の製造方法 |
EP1101741B1 (de) * | 1999-11-15 | 2005-07-13 | Heraeus Quarzglas GmbH & Co. KG | Quarzglaskörper für ein optisches Bauteil und Verfahren zu seiner Herstellung |
AU2001277156A1 (en) * | 2000-08-10 | 2002-02-25 | Yazaki Corporation | Process for making glass bodies having refractive index gradients |
KR20030040498A (ko) * | 2000-09-27 | 2003-05-22 | 코닝 인코포레이티드 | 다공성 유리 예형의 건조 방법 |
JP2003183042A (ja) * | 2001-12-14 | 2003-07-03 | Shin Etsu Chem Co Ltd | 光ファイバ用母材の製造方法及びその製造方法で製造した光ファイバ用母材 |
-
2002
- 2002-04-26 DE DE10218864A patent/DE10218864C1/de not_active Expired - Fee Related
-
2003
- 2003-04-28 US US10/512,523 patent/US20050172676A1/en not_active Abandoned
- 2003-04-28 AU AU2003236840A patent/AU2003236840A1/en not_active Abandoned
- 2003-04-28 WO PCT/EP2003/004412 patent/WO2003091171A2/de active Application Filing
- 2003-04-28 CN CNB038094622A patent/CN1305791C/zh not_active Expired - Lifetime
- 2003-04-28 JP JP2003587745A patent/JP4443234B2/ja not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010534620A (ja) * | 2007-07-27 | 2010-11-11 | コーニング インコーポレイテッド | 低oh、odレベルを有する溶融シリカおよびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2003091171A2 (de) | 2003-11-06 |
US20050172676A1 (en) | 2005-08-11 |
JP4443234B2 (ja) | 2010-03-31 |
AU2003236840A1 (en) | 2003-11-10 |
AU2003236840A8 (en) | 2003-11-10 |
CN1305791C (zh) | 2007-03-21 |
DE10218864C1 (de) | 2003-10-23 |
CN1649797A (zh) | 2005-08-03 |
WO2003091171A3 (de) | 2004-10-14 |
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