DE10218864C1 - Verfahren zur Herstellung eines zylinderförmigen Quarzglaskörpers mit geringem OH-Gehalt - Google Patents
Verfahren zur Herstellung eines zylinderförmigen Quarzglaskörpers mit geringem OH-GehaltInfo
- Publication number
- DE10218864C1 DE10218864C1 DE10218864A DE10218864A DE10218864C1 DE 10218864 C1 DE10218864 C1 DE 10218864C1 DE 10218864 A DE10218864 A DE 10218864A DE 10218864 A DE10218864 A DE 10218864A DE 10218864 C1 DE10218864 C1 DE 10218864C1
- Authority
- DE
- Germany
- Prior art keywords
- soot body
- soot
- glazing
- pretreatment
- quartz glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004071 soot Substances 0.000 title claims abstract description 82
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 21
- 230000018044 dehydration Effects 0.000 title claims abstract description 17
- 238000006297 dehydration reaction Methods 0.000 title claims abstract description 17
- 230000001681 protective effect Effects 0.000 title claims abstract description 4
- 238000004519 manufacturing process Methods 0.000 title abstract description 10
- 238000004017 vitrification Methods 0.000 title abstract description 4
- 238000010438 heat treatment Methods 0.000 claims abstract description 35
- 208000005156 Dehydration Diseases 0.000 claims abstract description 16
- 239000002245 particle Substances 0.000 claims abstract description 5
- 239000002210 silicon-based material Substances 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 25
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 238000000151 deposition Methods 0.000 abstract description 5
- 230000003301 hydrolyzing effect Effects 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 26
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 12
- 229910052801 chlorine Inorganic materials 0.000 description 12
- 239000000460 chlorine Substances 0.000 description 12
- 238000009826 distribution Methods 0.000 description 10
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
- C03B37/0146—Furnaces therefor, e.g. muffle tubes, furnace linings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10218864A DE10218864C1 (de) | 2002-04-26 | 2002-04-26 | Verfahren zur Herstellung eines zylinderförmigen Quarzglaskörpers mit geringem OH-Gehalt |
| JP2003587745A JP4443234B2 (ja) | 2002-04-26 | 2003-04-28 | 低ｏｈ含有率を有する円筒状石英ガラス体の製造方法 |
| US10/512,523 US20050172676A1 (en) | 2002-04-26 | 2003-04-28 | Method for the production of a cylindrical quartz glass body having a low oh content |
| AU2003236840A AU2003236840A1 (en) | 2002-04-26 | 2003-04-28 | Method for the production of a cylindrical quartz glass body having a low oh content |
| CNB038094622A CN1305791C (zh) | 2002-04-26 | 2003-04-28 | 低羟基含量圆柱形石英玻璃体的制造方法 |
| PCT/EP2003/004412 WO2003091171A2 (de) | 2002-04-26 | 2003-04-28 | Verfahren zur herstellung eines zylinderförmigen quarzglaskörpers mit geringem oh-gehalt |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10218864A DE10218864C1 (de) | 2002-04-26 | 2002-04-26 | Verfahren zur Herstellung eines zylinderförmigen Quarzglaskörpers mit geringem OH-Gehalt |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10218864C1 true DE10218864C1 (de) | 2003-10-23 |
Family
ID=28458955
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10218864A Expired - Fee Related DE10218864C1 (de) | 2002-04-26 | 2002-04-26 | Verfahren zur Herstellung eines zylinderförmigen Quarzglaskörpers mit geringem OH-Gehalt |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20050172676A1 (enExample) |
| JP (1) | JP4443234B2 (enExample) |
| CN (1) | CN1305791C (enExample) |
| AU (1) | AU2003236840A1 (enExample) |
| DE (1) | DE10218864C1 (enExample) |
| WO (1) | WO2003091171A2 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005059290A1 (de) * | 2005-12-09 | 2007-06-14 | Heraeus Tenevo Gmbh | Verfahren und Vorrichtung zur Herstellung eines Formkörpers aus Quarzglas |
| EP2977359A1 (de) | 2014-07-21 | 2016-01-27 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur Herstellung von mit Fluor dotiertem Quarzglas |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1791559B (zh) * | 2003-05-19 | 2010-05-12 | 住友电气工业株式会社 | 光纤及光纤制造方法 |
| WO2005099357A1 (en) * | 2004-04-13 | 2005-10-27 | Sebit Co., Ltd | Method for manufacturing high heat-resistant quartz glass |
| JP5066784B2 (ja) * | 2005-02-04 | 2012-11-07 | 旭硝子株式会社 | 合成石英ガラスの製造方法 |
| DE102006059779B4 (de) * | 2006-12-15 | 2010-06-24 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Hohlzylinders aus synthetischem Quarzglas, nach dem Verfahren erhaltener dickwandiger Hohlzylinder und Verfahren zur Herstellung einer Vorform für optische Fasern |
| EP1942081B1 (en) * | 2007-01-02 | 2011-11-09 | Draka Comteq B.V. | Extended baking process for quartz glass deposition tubes. |
| US8062986B2 (en) * | 2007-07-27 | 2011-11-22 | Corning Incorporated | Fused silica having low OH, OD levels and method of making |
| US20100122558A1 (en) * | 2008-11-19 | 2010-05-20 | John Michael Jewell | Apparatus and Method of Sintering an Optical Fiber Preform |
| CN114031274A (zh) * | 2021-12-09 | 2022-02-11 | 中天科技精密材料有限公司 | 连续式低羟基高均匀性石英玻璃的制备方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5032079A (en) * | 1988-12-29 | 1991-07-16 | Sumitomo Electric Industries, Ltd. | Furnace for producing high purity quartz glass preform |
| EP0170249B1 (en) * | 1984-07-30 | 1991-12-27 | Sumitomo Electric Industries Limited | Method for producing glass preform for optical fiber |
| WO1993023341A1 (en) * | 1992-05-14 | 1993-11-25 | Tsl Group Plc | Heat treatment facility for synthetic vitreous silica bodies |
| DE19649935A1 (de) * | 1996-12-02 | 1998-06-04 | Heraeus Quarzglas | Verfahren zur Herstellung von Quarzglaskörpern |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3855370T2 (de) * | 1987-02-16 | 1997-01-02 | Sumitomo Electric Industries | Ofen zum Erhitzen einer Glasvorform für optische Faser und Verfahren zum Herstellen einer Glasvorform |
| AU653411B2 (en) * | 1991-07-19 | 1994-09-29 | Sumitomo Electric Industries, Ltd. | Method for producing glass preform for optical fiber |
| JP3036993B2 (ja) * | 1992-09-07 | 2000-04-24 | 信越化学工業株式会社 | 合成石英ガラス部材の製造方法 |
| JP3277719B2 (ja) * | 1994-09-21 | 2002-04-22 | 住友金属工業株式会社 | 紫外光透過用合成石英ガラスおよびその製造方法 |
| CN1048700C (zh) * | 1995-03-17 | 2000-01-26 | 中国建筑材料科学研究院 | 紫外激光传能光纤预制棒制造方法 |
| JP3818603B2 (ja) * | 1996-05-21 | 2006-09-06 | 信越石英株式会社 | 石英ガラスの製造方法 |
| US6253580B1 (en) * | 1997-12-19 | 2001-07-03 | Fibercore, Inc. | Method of making a tubular member for optical fiber production using plasma outside vapor deposition |
| JP2862001B2 (ja) * | 1998-04-03 | 1999-02-24 | 旭硝子株式会社 | 石英ガラス光学部材の製造方法 |
| EP1101741B1 (de) * | 1999-11-15 | 2005-07-13 | Heraeus Quarzglas GmbH & Co. KG | Quarzglaskörper für ein optisches Bauteil und Verfahren zu seiner Herstellung |
| AU2001277156A1 (en) * | 2000-08-10 | 2002-02-25 | Yazaki Corporation | Process for making glass bodies having refractive index gradients |
| JP2004509829A (ja) * | 2000-09-27 | 2004-04-02 | コーニング インコーポレイテッド | 多孔質ガラスプリフォームを乾燥するためのプロセス |
| JP2003183042A (ja) * | 2001-12-14 | 2003-07-03 | Shin Etsu Chem Co Ltd | 光ファイバ用母材の製造方法及びその製造方法で製造した光ファイバ用母材 |
-
2002
- 2002-04-26 DE DE10218864A patent/DE10218864C1/de not_active Expired - Fee Related
-
2003
- 2003-04-28 US US10/512,523 patent/US20050172676A1/en not_active Abandoned
- 2003-04-28 CN CNB038094622A patent/CN1305791C/zh not_active Expired - Lifetime
- 2003-04-28 AU AU2003236840A patent/AU2003236840A1/en not_active Abandoned
- 2003-04-28 JP JP2003587745A patent/JP4443234B2/ja not_active Expired - Fee Related
- 2003-04-28 WO PCT/EP2003/004412 patent/WO2003091171A2/de not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0170249B1 (en) * | 1984-07-30 | 1991-12-27 | Sumitomo Electric Industries Limited | Method for producing glass preform for optical fiber |
| US5032079A (en) * | 1988-12-29 | 1991-07-16 | Sumitomo Electric Industries, Ltd. | Furnace for producing high purity quartz glass preform |
| WO1993023341A1 (en) * | 1992-05-14 | 1993-11-25 | Tsl Group Plc | Heat treatment facility for synthetic vitreous silica bodies |
| DE19649935A1 (de) * | 1996-12-02 | 1998-06-04 | Heraeus Quarzglas | Verfahren zur Herstellung von Quarzglaskörpern |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005059290A1 (de) * | 2005-12-09 | 2007-06-14 | Heraeus Tenevo Gmbh | Verfahren und Vorrichtung zur Herstellung eines Formkörpers aus Quarzglas |
| EP2977359A1 (de) | 2014-07-21 | 2016-01-27 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur Herstellung von mit Fluor dotiertem Quarzglas |
| US9878933B2 (en) | 2014-07-21 | 2018-01-30 | Heraeus Quarzglas Gmbh & Co. Kg | Method for the manufacture of doped quartz glass |
Also Published As
| Publication number | Publication date |
|---|---|
| AU2003236840A8 (en) | 2003-11-10 |
| CN1649797A (zh) | 2005-08-03 |
| WO2003091171A3 (de) | 2004-10-14 |
| CN1305791C (zh) | 2007-03-21 |
| US20050172676A1 (en) | 2005-08-11 |
| JP2005523863A (ja) | 2005-08-11 |
| WO2003091171A2 (de) | 2003-11-06 |
| JP4443234B2 (ja) | 2010-03-31 |
| AU2003236840A1 (en) | 2003-11-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8100 | Publication of patent without earlier publication of application | ||
| 8304 | Grant after examination procedure | ||
| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: HERAEUS TENEVO GMBH, 63450 HANAU, DE |
|
| 8327 | Change in the person/name/address of the patent owner |
Owner name: HERAEUS QUARZGLAS GMBH & CO. KG, 63450 HANAU, DE |
|
| R082 | Change of representative |
Representative=s name: STAUDT, ARMIN, DIPL.-ING. (UNIV.), DE |
|
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |