JP4440031B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4440031B2
JP4440031B2 JP2004221495A JP2004221495A JP4440031B2 JP 4440031 B2 JP4440031 B2 JP 4440031B2 JP 2004221495 A JP2004221495 A JP 2004221495A JP 2004221495 A JP2004221495 A JP 2004221495A JP 4440031 B2 JP4440031 B2 JP 4440031B2
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JP
Japan
Prior art keywords
stage
exposure
exposure apparatus
projection system
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004221495A
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English (en)
Japanese (ja)
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JP2006041338A5 (https=
JP2006041338A (ja
Inventor
浩通 原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004221495A priority Critical patent/JP4440031B2/ja
Priority to US11/190,898 priority patent/US7227617B2/en
Publication of JP2006041338A publication Critical patent/JP2006041338A/ja
Priority to US11/688,370 priority patent/US7821617B2/en
Publication of JP2006041338A5 publication Critical patent/JP2006041338A5/ja
Application granted granted Critical
Publication of JP4440031B2 publication Critical patent/JP4440031B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004221495A 2004-07-29 2004-07-29 露光装置及びデバイス製造方法 Expired - Fee Related JP4440031B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004221495A JP4440031B2 (ja) 2004-07-29 2004-07-29 露光装置及びデバイス製造方法
US11/190,898 US7227617B2 (en) 2004-07-29 2005-07-28 Exposure apparatus and device manufacturing method
US11/688,370 US7821617B2 (en) 2004-07-29 2007-03-20 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004221495A JP4440031B2 (ja) 2004-07-29 2004-07-29 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006041338A JP2006041338A (ja) 2006-02-09
JP2006041338A5 JP2006041338A5 (https=) 2007-09-13
JP4440031B2 true JP4440031B2 (ja) 2010-03-24

Family

ID=35731744

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004221495A Expired - Fee Related JP4440031B2 (ja) 2004-07-29 2004-07-29 露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (2) US7227617B2 (https=)
JP (1) JP4440031B2 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4440031B2 (ja) * 2004-07-29 2010-03-24 キヤノン株式会社 露光装置及びデバイス製造方法
JP2006261212A (ja) * 2005-03-15 2006-09-28 Nikon Corp 露光装置
JP2006261605A (ja) * 2005-03-18 2006-09-28 Canon Inc 露光装置及び露光方法
DE102008014832A1 (de) * 2007-04-19 2008-10-23 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie
NL1036957A1 (nl) * 2008-06-13 2009-12-15 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JPWO2010044268A1 (ja) * 2008-10-15 2012-03-15 株式会社ニコン 露光装置及びその組立て方法、並びにデバイス製造方法
CN103809384B (zh) * 2012-11-12 2016-03-09 上海微电子装备有限公司 工件台与掩模台公用的平衡质量系统及光刻机
JP6278427B1 (ja) * 2017-01-05 2018-02-14 レーザーテック株式会社 光学装置、及び除振方法
DE102019102215B3 (de) 2019-01-29 2020-06-25 Nanoscribe Gmbh System zum Aufbau einer Laserlithografievorrichtung und Modulträger hierfür
US11156926B2 (en) 2019-08-12 2021-10-26 Kla Corporation Vacuum actuator containment for molecular contaminant and particle mitigation

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3337906B2 (ja) * 1996-04-02 2002-10-28 キヤノン株式会社 空圧式振動絶縁除去装置、投影露光装置及びこれを用いたデバイス製造方法
JP3231241B2 (ja) * 1996-05-01 2001-11-19 キヤノン株式会社 Ｘ線縮小露光装置、及び該装置を用いた半導体製造方法
JP3554186B2 (ja) * 1998-04-08 2004-08-18 キヤノン株式会社 露光装置、デバイス製造方法および反力受け方法
US6333775B1 (en) * 1999-01-13 2001-12-25 Euv Llc Extreme-UV lithography vacuum chamber zone seal
US6538720B2 (en) * 2001-02-28 2003-03-25 Silicon Valley Group, Inc. Lithographic tool with dual isolation system and method for configuring the same
JP3977214B2 (ja) * 2002-09-17 2007-09-19 キヤノン株式会社 露光装置
JP3984898B2 (ja) * 2002-09-18 2007-10-03 キヤノン株式会社 露光装置
JP4458322B2 (ja) * 2003-01-14 2010-04-28 キヤノン株式会社 露光装置およびデバイス製造方法
US7184123B2 (en) * 2004-03-24 2007-02-27 Asml Netherlands B.V. Lithographic optical system
US7126664B2 (en) * 2004-07-12 2006-10-24 Asml Netherlands B.V. Lithographic apparatus and a device manufacturing method
JP4440031B2 (ja) * 2004-07-29 2010-03-24 キヤノン株式会社 露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
US20070160356A1 (en) 2007-07-12
US7227617B2 (en) 2007-06-05
JP2006041338A (ja) 2006-02-09
US20060023180A1 (en) 2006-02-02
US7821617B2 (en) 2010-10-26

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