JP4439082B2 - 半導体記憶装置 - Google Patents

半導体記憶装置 Download PDF

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Publication number
JP4439082B2
JP4439082B2 JP2000167643A JP2000167643A JP4439082B2 JP 4439082 B2 JP4439082 B2 JP 4439082B2 JP 2000167643 A JP2000167643 A JP 2000167643A JP 2000167643 A JP2000167643 A JP 2000167643A JP 4439082 B2 JP4439082 B2 JP 4439082B2
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JP
Japan
Prior art keywords
memory cell
read
write
data line
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000167643A
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English (en)
Japanese (ja)
Other versions
JP2001344965A5 (enExample
JP2001344965A (ja
Inventor
司 大石
弘晃 谷崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Technology Corp
Mitsubishi Electric Engineering Co Ltd
Original Assignee
Renesas Technology Corp
Mitsubishi Electric Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Technology Corp, Mitsubishi Electric Engineering Co Ltd filed Critical Renesas Technology Corp
Priority to JP2000167643A priority Critical patent/JP4439082B2/ja
Priority to US09/781,238 priority patent/US6381167B2/en
Publication of JP2001344965A publication Critical patent/JP2001344965A/ja
Priority to US10/118,126 priority patent/US6549445B2/en
Publication of JP2001344965A5 publication Critical patent/JP2001344965A5/ja
Application granted granted Critical
Publication of JP4439082B2 publication Critical patent/JP4439082B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/70—Masking faults in memories by using spares or by reconfiguring
    • G11C29/78—Masking faults in memories by using spares or by reconfiguring using programmable devices
    • G11C29/84—Masking faults in memories by using spares or by reconfiguring using programmable devices with improved access time or stability
    • G11C29/848—Masking faults in memories by using spares or by reconfiguring using programmable devices with improved access time or stability by adjacent switching
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C7/00—Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/18—Bit line organisation; Bit line lay-out
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/50—Peripheral circuit region structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment
    • H10B12/09—Manufacture or treatment with simultaneous manufacture of the peripheral circuit region and memory cells

Landscapes

  • Dram (AREA)
  • For Increasing The Reliability Of Semiconductor Memories (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Memories (AREA)
JP2000167643A 2000-06-05 2000-06-05 半導体記憶装置 Expired - Fee Related JP4439082B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000167643A JP4439082B2 (ja) 2000-06-05 2000-06-05 半導体記憶装置
US09/781,238 US6381167B2 (en) 2000-06-05 2001-02-13 Semiconductor memory device including plurality of global data lines in parallel arrangement with low parasitic capacitance, and fabrication method thereof
US10/118,126 US6549445B2 (en) 2000-06-05 2002-04-09 Semiconductor memory device including plurality of global data lines in parallel arrangement with low parasitic capacitance, and fabrication method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000167643A JP4439082B2 (ja) 2000-06-05 2000-06-05 半導体記憶装置

Publications (3)

Publication Number Publication Date
JP2001344965A JP2001344965A (ja) 2001-12-14
JP2001344965A5 JP2001344965A5 (enExample) 2007-07-05
JP4439082B2 true JP4439082B2 (ja) 2010-03-24

Family

ID=18670771

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000167643A Expired - Fee Related JP4439082B2 (ja) 2000-06-05 2000-06-05 半導体記憶装置

Country Status (2)

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US (2) US6381167B2 (enExample)
JP (1) JP4439082B2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4439082B2 (ja) * 2000-06-05 2010-03-24 株式会社ルネサステクノロジ 半導体記憶装置
JP4540889B2 (ja) * 2001-07-09 2010-09-08 富士通セミコンダクター株式会社 半導体メモリ
JP2003347431A (ja) * 2002-05-29 2003-12-05 Fujitsu Ltd 半導体記憶装置
DE60205344D1 (de) * 2002-05-31 2005-09-08 St Microelectronics Srl Teststruktur zur Messung des Kontakt-Gate-Abstandes in nichtflüchtigen Speichern und zugehöriges Testverfahren
TW589753B (en) * 2003-06-03 2004-06-01 Winbond Electronics Corp Resistance random access memory and method for fabricating the same
US7110319B2 (en) * 2004-08-27 2006-09-19 Micron Technology, Inc. Memory devices having reduced coupling noise between wordlines
KR100615577B1 (ko) * 2004-09-10 2006-08-25 삼성전자주식회사 반도체 메모리 장치 및 이 장치의 신호 라인 배치 방법
JP2006179109A (ja) * 2004-12-22 2006-07-06 Matsushita Electric Ind Co Ltd メモリ回路
KR100630733B1 (ko) * 2005-01-12 2006-10-02 삼성전자주식회사 전력소모를 감소시킬 수 있는 워드라인 인에이블 신호라인 배치 구조를 갖는 반도체 메모리장치 및 이의워드라인 인에이블 신호 라인 배치방법
US20060182187A1 (en) * 2005-02-11 2006-08-17 Likovich Robert B Jr Automatic reconfiguration of an I/O bus to correct for an error bit
KR100653715B1 (ko) 2005-06-17 2006-12-05 삼성전자주식회사 적어도 하나의 개구부를 갖는 최상부 금속층을 구비하는반도체 소자들 및 그 제조방법들
JP4756581B2 (ja) 2005-07-21 2011-08-24 ルネサスエレクトロニクス株式会社 半導体記憶装置
US8378448B2 (en) * 2009-03-18 2013-02-19 International Business Machines Corporation Chip inductor with frequency dependent inductance
US7940544B2 (en) * 2009-04-30 2011-05-10 Kabushiki Kaisha Toshiba Memory system having multiple vias at junctions between traces
CN104580558B (zh) * 2013-10-17 2019-05-07 中兴通讯股份有限公司 一种终端盖体及终端
JP2020145372A (ja) * 2019-03-08 2020-09-10 キオクシア株式会社 半導体記憶装置
JP2022125651A (ja) * 2021-02-17 2022-08-29 キオクシア株式会社 半導体記憶装置
JP7392183B2 (ja) * 2021-03-24 2023-12-05 長江存儲科技有限責任公司 冗長バンクを使用した故障メインバンクの修理を伴うメモリデバイス
US20240221823A1 (en) * 2022-12-30 2024-07-04 Atomera Incorporated Dynamic Random Access Memory System Including Single-Ended Sense Amplifiers And Methods For Operating Same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0512883A (ja) 1991-07-05 1993-01-22 Nippon Steel Corp シーケンシヤルメモリ
JPH07130163A (ja) * 1993-11-01 1995-05-19 Matsushita Electron Corp 半導体メモリ
JP3253462B2 (ja) 1994-09-07 2002-02-04 富士通株式会社 半導体記憶装置
JP2817836B2 (ja) * 1995-11-30 1998-10-30 日本電気株式会社 半導体メモリ装置
JPH1027467A (ja) 1996-07-12 1998-01-27 Sony Corp 半導体装置
US6177699B1 (en) * 1998-03-19 2001-01-23 Lsi Logic Corporation DRAM cell having a verticle transistor and a capacitor formed on the sidewalls of a trench isolation
JP4439082B2 (ja) * 2000-06-05 2010-03-24 株式会社ルネサステクノロジ 半導体記憶装置

Also Published As

Publication number Publication date
US20020110016A1 (en) 2002-08-15
US6381167B2 (en) 2002-04-30
US20010052599A1 (en) 2001-12-20
US6549445B2 (en) 2003-04-15
JP2001344965A (ja) 2001-12-14

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