JP4423119B2 - 反射防止膜及びそれを用いた光学素子 - Google Patents

反射防止膜及びそれを用いた光学素子 Download PDF

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Publication number
JP4423119B2
JP4423119B2 JP2004178534A JP2004178534A JP4423119B2 JP 4423119 B2 JP4423119 B2 JP 4423119B2 JP 2004178534 A JP2004178534 A JP 2004178534A JP 2004178534 A JP2004178534 A JP 2004178534A JP 4423119 B2 JP4423119 B2 JP 4423119B2
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JP
Japan
Prior art keywords
refractive index
layers
antireflection film
film
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2004178534A
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English (en)
Japanese (ja)
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JP2006003540A5 (enExample
JP2006003540A (ja
Inventor
実 大谷
竜二 枇榔
浩孝 福島
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004178534A priority Critical patent/JP4423119B2/ja
Priority to US11/148,249 priority patent/US7301695B2/en
Publication of JP2006003540A publication Critical patent/JP2006003540A/ja
Publication of JP2006003540A5 publication Critical patent/JP2006003540A5/ja
Application granted granted Critical
Publication of JP4423119B2 publication Critical patent/JP4423119B2/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2004178534A 2004-06-16 2004-06-16 反射防止膜及びそれを用いた光学素子 Expired - Fee Related JP4423119B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004178534A JP4423119B2 (ja) 2004-06-16 2004-06-16 反射防止膜及びそれを用いた光学素子
US11/148,249 US7301695B2 (en) 2004-06-16 2005-06-09 Anti-reflective film and optical element having anti-reflective film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004178534A JP4423119B2 (ja) 2004-06-16 2004-06-16 反射防止膜及びそれを用いた光学素子

Publications (3)

Publication Number Publication Date
JP2006003540A JP2006003540A (ja) 2006-01-05
JP2006003540A5 JP2006003540A5 (enExample) 2007-08-02
JP4423119B2 true JP4423119B2 (ja) 2010-03-03

Family

ID=35480265

Family Applications (1)

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JP2004178534A Expired - Fee Related JP4423119B2 (ja) 2004-06-16 2004-06-16 反射防止膜及びそれを用いた光学素子

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US (1) US7301695B2 (enExample)
JP (1) JP4423119B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007133102A (ja) * 2005-11-09 2007-05-31 Canon Inc 反射防止膜を有する光学素子及びそれを有する露光装置
US20080062523A1 (en) * 2006-03-24 2008-03-13 Goodrich Corporation Optical diffraction grating and method of manufacture
JP4803808B2 (ja) * 2006-07-25 2011-10-26 Ｈｏｙａ株式会社 反射防止膜及び反射防止膜を有する光学部材
US20080311485A1 (en) * 2007-06-12 2008-12-18 William Stanton Photomasks Used to Fabricate Integrated Circuitry, Finished-Construction Binary Photomasks Used to Fabricate Integrated Circuitry, Methods of Forming Photomasks, and Methods of Photolithographically Patterning Substrates
EP2215502B1 (en) * 2007-11-30 2017-10-25 Corning Incorporated Dense homogeneous fluoride films for duv elements and method of preparing same
ES2316321B2 (es) 2008-10-20 2010-12-14 Abengoa Solar New Technologies, S.A. Recubrimiento absorbente selectivo solar y metodo de fabricacion.
DE102009037077B3 (de) 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv
JP5603714B2 (ja) * 2010-09-02 2014-10-08 オリンパス株式会社 反射防止膜、レンズ、光学系、対物レンズ、及び光学機器
CN103180764B (zh) * 2010-10-27 2015-07-01 柯尼卡美能达株式会社 近红外反射膜、其制造方法及设有近红外反射膜的近红外反射体
US8846273B2 (en) 2012-06-04 2014-09-30 Micron Technology, Inc. Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrate
FR3002767B1 (fr) * 2013-03-01 2015-02-27 Saint Gobain Dispositif de visualisation pour vitrages transparents
CN106556882B (zh) * 2015-09-22 2020-03-24 东海光学株式会社 光学制品和眼镜镜片
JP7347203B2 (ja) * 2019-12-25 2023-09-20 コニカミノルタ株式会社 反射防止膜付き光学レンズ、投影レンズ及び投影レンズ光学系
TWI777542B (zh) 2020-12-23 2022-09-11 大立光電股份有限公司 成像鏡頭與電子裝置
CN115390168A (zh) 2021-05-21 2022-11-25 大立光电股份有限公司 塑胶光学转折元件、成像镜头模块及电子装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4161387B2 (ja) * 1997-01-23 2008-10-08 株式会社ニコン 多層反射防止膜
JP3624082B2 (ja) * 1997-11-13 2005-02-23 キヤノン株式会社 反射防止膜及びその製造方法
JP3720609B2 (ja) * 1999-01-11 2005-11-30 キヤノン株式会社 反射防止膜及びそれを施した光学系
DE10080898T1 (de) 1999-03-29 2001-06-28 Nikon Corp Mehrschicht-Antireflexionsfilm, optisches Element und Reduktionsprojektionsbelichtungsapparat
JP2000352604A (ja) * 1999-06-10 2000-12-19 Canon Inc 反射防止膜
JP2001074905A (ja) * 1999-09-02 2001-03-23 Canon Inc 二波長反射防止膜
WO2001035125A1 (en) * 1999-11-05 2001-05-17 Asahi Glass Company, Limited Antireflection base for ultraviolet and vacuum ultraviolet regions
EP1411375A4 (en) * 2001-07-18 2007-03-21 Nikon Corp OPTICAL ELEMENT COMPRISING A LANTHANE FLUORIDE FILM
JP4065530B2 (ja) * 2002-05-22 2008-03-26 キヤノン株式会社 反射防止膜、該反射防止膜を有する光学素子及び光学系
JP2007133102A (ja) * 2005-11-09 2007-05-31 Canon Inc 反射防止膜を有する光学素子及びそれを有する露光装置

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Publication number Publication date
JP2006003540A (ja) 2006-01-05
US20050280890A1 (en) 2005-12-22
US7301695B2 (en) 2007-11-27

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