JP2006003540A5 - - Google Patents

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Publication number
JP2006003540A5
JP2006003540A5 JP2004178534A JP2004178534A JP2006003540A5 JP 2006003540 A5 JP2006003540 A5 JP 2006003540A5 JP 2004178534 A JP2004178534 A JP 2004178534A JP 2004178534 A JP2004178534 A JP 2004178534A JP 2006003540 A5 JP2006003540 A5 JP 2006003540A5
Authority
JP
Japan
Prior art keywords
layers
refractive index
substrate side
layer made
counted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004178534A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006003540A (ja
JP4423119B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004178534A priority Critical patent/JP4423119B2/ja
Priority claimed from JP2004178534A external-priority patent/JP4423119B2/ja
Priority to US11/148,249 priority patent/US7301695B2/en
Publication of JP2006003540A publication Critical patent/JP2006003540A/ja
Publication of JP2006003540A5 publication Critical patent/JP2006003540A5/ja
Application granted granted Critical
Publication of JP4423119B2 publication Critical patent/JP4423119B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004178534A 2004-06-16 2004-06-16 反射防止膜及びそれを用いた光学素子 Expired - Fee Related JP4423119B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004178534A JP4423119B2 (ja) 2004-06-16 2004-06-16 反射防止膜及びそれを用いた光学素子
US11/148,249 US7301695B2 (en) 2004-06-16 2005-06-09 Anti-reflective film and optical element having anti-reflective film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004178534A JP4423119B2 (ja) 2004-06-16 2004-06-16 反射防止膜及びそれを用いた光学素子

Publications (3)

Publication Number Publication Date
JP2006003540A JP2006003540A (ja) 2006-01-05
JP2006003540A5 true JP2006003540A5 (enExample) 2007-08-02
JP4423119B2 JP4423119B2 (ja) 2010-03-03

Family

ID=35480265

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004178534A Expired - Fee Related JP4423119B2 (ja) 2004-06-16 2004-06-16 反射防止膜及びそれを用いた光学素子

Country Status (2)

Country Link
US (1) US7301695B2 (enExample)
JP (1) JP4423119B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007133102A (ja) * 2005-11-09 2007-05-31 Canon Inc 反射防止膜を有する光学素子及びそれを有する露光装置
US20080062523A1 (en) * 2006-03-24 2008-03-13 Goodrich Corporation Optical diffraction grating and method of manufacture
JP4803808B2 (ja) * 2006-07-25 2011-10-26 Ｈｏｙａ株式会社 反射防止膜及び反射防止膜を有する光学部材
US20080311485A1 (en) * 2007-06-12 2008-12-18 William Stanton Photomasks Used to Fabricate Integrated Circuitry, Finished-Construction Binary Photomasks Used to Fabricate Integrated Circuitry, Methods of Forming Photomasks, and Methods of Photolithographically Patterning Substrates
WO2009070227A1 (en) * 2007-11-30 2009-06-04 Corning Incorporated Dense homogeneous fluoride films for duv elements and method of preparing same
ES2316321B2 (es) * 2008-10-20 2010-12-14 Abengoa Solar New Technologies, S.A. Recubrimiento absorbente selectivo solar y metodo de fabricacion.
DE102009037077B3 (de) * 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv
JP5603714B2 (ja) * 2010-09-02 2014-10-08 オリンパス株式会社 反射防止膜、レンズ、光学系、対物レンズ、及び光学機器
WO2012057199A1 (ja) * 2010-10-27 2012-05-03 コニカミノルタホールディングス株式会社 近赤外反射フィルム、その製造方法及び近赤外反射フィルムを設けた近赤外反射体
US8846273B2 (en) 2012-06-04 2014-09-30 Micron Technology, Inc. Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrate
FR3002767B1 (fr) * 2013-03-01 2015-02-27 Saint Gobain Dispositif de visualisation pour vitrages transparents
CN106556882B (zh) * 2015-09-22 2020-03-24 东海光学株式会社 光学制品和眼镜镜片
JP7347203B2 (ja) * 2019-12-25 2023-09-20 コニカミノルタ株式会社 反射防止膜付き光学レンズ、投影レンズ及び投影レンズ光学系
TWI777542B (zh) 2020-12-23 2022-09-11 大立光電股份有限公司 成像鏡頭與電子裝置
CN115390168A (zh) 2021-05-21 2022-11-25 大立光电股份有限公司 塑胶光学转折元件、成像镜头模块及电子装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4161387B2 (ja) * 1997-01-23 2008-10-08 株式会社ニコン 多層反射防止膜
JP3624082B2 (ja) 1997-11-13 2005-02-23 キヤノン株式会社 反射防止膜及びその製造方法
JP3720609B2 (ja) * 1999-01-11 2005-11-30 キヤノン株式会社 反射防止膜及びそれを施した光学系
DE10080898T1 (de) 1999-03-29 2001-06-28 Nikon Corp Mehrschicht-Antireflexionsfilm, optisches Element und Reduktionsprojektionsbelichtungsapparat
JP2000352604A (ja) * 1999-06-10 2000-12-19 Canon Inc 反射防止膜
JP2001074905A (ja) * 1999-09-02 2001-03-23 Canon Inc 二波長反射防止膜
EP1227344A4 (en) * 1999-11-05 2005-08-31 Asahi Glass Co Ltd ANTIREFLECTION BASE FOR ULTRAVIOLET AND EXTREME ULTRAVIOLET ZONES
WO2003009015A1 (en) * 2001-07-18 2003-01-30 Nikon Corporation Optical element having lanthanum fluoride film
JP4065530B2 (ja) * 2002-05-22 2008-03-26 キヤノン株式会社 反射防止膜、該反射防止膜を有する光学素子及び光学系
JP2007133102A (ja) * 2005-11-09 2007-05-31 Canon Inc 反射防止膜を有する光学素子及びそれを有する露光装置

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