JP4378136B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4378136B2
JP4378136B2 JP2003312635A JP2003312635A JP4378136B2 JP 4378136 B2 JP4378136 B2 JP 4378136B2 JP 2003312635 A JP2003312635 A JP 2003312635A JP 2003312635 A JP2003312635 A JP 2003312635A JP 4378136 B2 JP4378136 B2 JP 4378136B2
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Japan
Prior art keywords
liquid
porous body
substrate
exposure apparatus
optical element
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Expired - Lifetime
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JP2003312635A
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English (en)
Japanese (ja)
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JP2005085789A (ja
JP2005085789A5 (enExample
Inventor
俊伸 時田
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003312635A priority Critical patent/JP4378136B2/ja
Priority to US10/931,572 priority patent/US7053983B2/en
Publication of JP2005085789A publication Critical patent/JP2005085789A/ja
Priority to US11/354,471 priority patent/US20060132741A1/en
Publication of JP2005085789A5 publication Critical patent/JP2005085789A5/ja
Application granted granted Critical
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Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003312635A 2003-09-04 2003-09-04 露光装置及びデバイス製造方法 Expired - Lifetime JP4378136B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003312635A JP4378136B2 (ja) 2003-09-04 2003-09-04 露光装置及びデバイス製造方法
US10/931,572 US7053983B2 (en) 2003-09-04 2004-09-01 Liquid immersion type exposure apparatus
US11/354,471 US20060132741A1 (en) 2003-09-04 2006-02-14 Liquid immersion type exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003312635A JP4378136B2 (ja) 2003-09-04 2003-09-04 露光装置及びデバイス製造方法

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JP2005085789A JP2005085789A (ja) 2005-03-31
JP2005085789A5 JP2005085789A5 (enExample) 2006-10-05
JP4378136B2 true JP4378136B2 (ja) 2009-12-02

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US (2) US7053983B2 (enExample)
JP (1) JP4378136B2 (enExample)

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US7053983B2 (en) 2006-05-30
JP2005085789A (ja) 2005-03-31
US20060132741A1 (en) 2006-06-22
US20050233081A1 (en) 2005-10-20

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