JP4345232B2 - 反射屈折結像光学系および該光学系を備えた投影露光装置 - Google Patents

反射屈折結像光学系および該光学系を備えた投影露光装置 Download PDF

Info

Publication number
JP4345232B2
JP4345232B2 JP2000591464A JP2000591464A JP4345232B2 JP 4345232 B2 JP4345232 B2 JP 4345232B2 JP 2000591464 A JP2000591464 A JP 2000591464A JP 2000591464 A JP2000591464 A JP 2000591464A JP 4345232 B2 JP4345232 B2 JP 4345232B2
Authority
JP
Japan
Prior art keywords
optical system
imaging optical
light
catadioptric
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000591464A
Other languages
English (en)
Japanese (ja)
Inventor
泰弘 大村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of JP4345232B2 publication Critical patent/JP4345232B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/04—Simple or compound lenses with non-spherical faces with continuous faces that are rotationally symmetrical but deviate from a true sphere, e.g. so called "aspheric" lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
JP2000591464A 1998-12-25 1999-12-22 反射屈折結像光学系および該光学系を備えた投影露光装置 Expired - Fee Related JP4345232B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP37014398 1998-12-25
JP6676999 1999-03-12
PCT/JP1999/007225 WO2000039623A1 (fr) 1998-12-25 1999-12-22 Systeme optique de formation d'image par reflexion refraction et appareil d'exposition par projection comprenant le systeme optique

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009125742A Division JP2009223330A (ja) 1998-12-25 2009-05-25 光学装置および該光学装置を備えた投影露光装置

Publications (1)

Publication Number Publication Date
JP4345232B2 true JP4345232B2 (ja) 2009-10-14

Family

ID=26407966

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2000591464A Expired - Fee Related JP4345232B2 (ja) 1998-12-25 1999-12-22 反射屈折結像光学系および該光学系を備えた投影露光装置
JP2009125742A Pending JP2009223330A (ja) 1998-12-25 2009-05-25 光学装置および該光学装置を備えた投影露光装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2009125742A Pending JP2009223330A (ja) 1998-12-25 2009-05-25 光学装置および該光学装置を備えた投影露光装置

Country Status (5)

Country Link
US (2) US6473243B1 (US06639734-20031028-M00001.png)
EP (1) EP1059550A4 (US06639734-20031028-M00001.png)
JP (2) JP4345232B2 (US06639734-20031028-M00001.png)
KR (1) KR20010041257A (US06639734-20031028-M00001.png)
WO (1) WO2000039623A1 (US06639734-20031028-M00001.png)

Families Citing this family (75)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6631036B2 (en) 1996-09-26 2003-10-07 Carl-Zeiss-Stiftung Catadioptric objective
USRE42570E1 (en) 1996-09-26 2011-07-26 Carl Zeiss Smt Gmbh Catadioptric objective
JPH10205467A (ja) * 1997-01-27 1998-08-04 Sanden Corp スクロールコンプレッサ
WO1999049366A1 (fr) 1998-03-20 1999-09-30 Nikon Corporation Photomasque et systeme d'exposition par projection
AU3729999A (en) 1998-05-15 1999-12-06 Nikon Corporation Exposure method and apparatus
DE60038028T2 (de) * 1999-07-14 2009-02-05 Nec Display Solutions, Ltd. Bildformendes optisches system
EP1248288A1 (en) 1999-12-16 2002-10-09 Nikon Corporation Exposure method and exposure apparatus
US6836093B1 (en) 1999-12-21 2004-12-28 Nikon Corporation Exposure method and apparatus
DE50012452D1 (de) * 1999-12-29 2006-05-11 Zeiss Carl Smt Ag Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
FR2807830B1 (fr) * 2000-04-14 2002-08-16 Architecture Traitement D Imag Dispositif d'acquisition d'une forme tridimensionnelle par voie optoelectronique
JP2002023055A (ja) * 2000-07-10 2002-01-23 Nikon Corp 結像光学系および該結像光学系を備えた露光装置
JP4224938B2 (ja) * 2000-10-17 2009-02-18 コニカミノルタオプト株式会社 斜め投影光学系
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP2002214047A (ja) * 2001-01-17 2002-07-31 Noritake Co Ltd 温度分布測定方法および装置
JP3639807B2 (ja) * 2001-06-27 2005-04-20 キヤノン株式会社 光学素子及び製造方法
US8675276B2 (en) 2003-02-21 2014-03-18 Kla-Tencor Corporation Catadioptric imaging system for broad band microscopy
US7672043B2 (en) * 2003-02-21 2010-03-02 Kla-Tencor Technologies Corporation Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth
US7869121B2 (en) * 2003-02-21 2011-01-11 Kla-Tencor Technologies Corporation Small ultra-high NA catadioptric objective using aspheric surfaces
US7646533B2 (en) * 2003-02-21 2010-01-12 Kla-Tencor Technologies Corporation Small ultra-high NA catadioptric objective
US7180658B2 (en) * 2003-02-21 2007-02-20 Kla-Tencor Technologies Corporation High performance catadioptric imaging system
US6989936B2 (en) * 2003-03-07 2006-01-24 Canon Kabushiki Kaisha Variable power optical system
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
EP2722703A3 (en) 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method
US6863403B2 (en) * 2003-05-27 2005-03-08 Ultratech, Inc. Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
CN102830487A (zh) 2004-01-14 2012-12-19 卡尔蔡司Smt有限责任公司 反射折射投影物镜
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
WO2005095993A1 (ja) * 2004-03-31 2005-10-13 The Tokyo Electric Power Company, Incorporated 流体計測システム、流体計測方法及びコンピュータプログラム
WO2005098504A1 (en) 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
CN100483174C (zh) 2004-05-17 2009-04-29 卡尔蔡司Smt股份公司 具有中间图像的反射折射投影物镜
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
DE102005042005A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
US20060158615A1 (en) * 2005-01-18 2006-07-20 Williamson David M Catadioptric 1x projection system and method
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070091452A1 (en) * 2005-10-25 2007-04-26 Scott Lerner Projection system and method
JP2008083229A (ja) * 2006-09-26 2008-04-10 Fujinon Corp 投写型ズームレンズおよび投写型表示装置
JP2008150276A (ja) * 2006-11-21 2008-07-03 Canon Inc 紫外光用ガラス組成物及びそれを用いた光学装置
US7633689B2 (en) 2007-07-18 2009-12-15 Asml Holding N.V. Catadioptric optical system for scatterometry
US9052494B2 (en) 2007-10-02 2015-06-09 Kla-Tencor Technologies Corporation Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths
EP2203777B1 (en) * 2007-10-02 2018-12-05 KLA-Tencor Corporation Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths
JP5634989B2 (ja) * 2008-06-17 2014-12-03 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 対物光学系および試料検査装置
DE102008049588B4 (de) 2008-09-30 2018-04-05 Carl Zeiss Smt Gmbh Optische Abbildungseinrichtung, Mikroskop und Abbildungsverfahren für die Mikroskopie
DE102008049589A1 (de) 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Optische Abbildungseinrichtung und Abbildungsverfahren für die Mikroskopie
DE102009046685A1 (de) 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
JP5479206B2 (ja) * 2010-04-28 2014-04-23 キヤノン株式会社 反射屈折光学系及びそれを有する撮像装置
DE102010029089B4 (de) * 2010-05-18 2019-08-29 Carl Zeiss Ag Optisches System zur Kalibrierung einer Lichtquelle
JP5479224B2 (ja) * 2010-05-27 2014-04-23 キヤノン株式会社 反射屈折光学系及びそれを有する撮像装置
DE102011080649A1 (de) * 2010-09-24 2012-03-29 Carl Zeiss Smt Gmbh Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage
NL2007477A (en) * 2010-10-22 2012-04-24 Asml Netherlands Bv Method of optimizing a lithographic process, device manufacturing method, lithographic apparatus, computer program product and simulation apparatus.
JP5627476B2 (ja) 2011-01-19 2014-11-19 キヤノン株式会社 反射屈折光学系及びそれを有する撮像装置
JP5656682B2 (ja) 2011-02-22 2015-01-21 キヤノン株式会社 反射屈折光学系及びそれを有する撮像装置
JP5836686B2 (ja) 2011-07-28 2015-12-24 キヤノン株式会社 反射屈折光学系及びそれを有する撮像装置
JP5868063B2 (ja) 2011-08-05 2016-02-24 キヤノン株式会社 撮像装置
DE102013112212B4 (de) * 2013-11-06 2022-03-10 Carl Zeiss Smt Gmbh Optische Zoomeinrichtung, optische Abbildungseinrichtung, optisches Zoomverfahren und Abbildungsverfahren für die Mikroskopie
US10107996B2 (en) * 2013-12-05 2018-10-23 Delta Electronics, Inc. Wide-angle projection optical system
JP6746328B2 (ja) * 2016-03-04 2020-08-26 キヤノン株式会社 光学系、それを備える撮像装置及び投影装置
JP6756498B2 (ja) * 2016-03-22 2020-09-16 株式会社トプコン 眼科撮影装置
JP6544313B2 (ja) * 2016-07-28 2019-07-17 京セラドキュメントソリューションズ株式会社 読取モジュール及びそれを備えた画像読取装置並びに画像形成装置
DE102017202244A1 (de) 2017-02-13 2018-01-11 Carl Zeiss Smt Gmbh Optische Baugruppe und optische Anordnung damit
DE102017202802A1 (de) 2017-02-21 2018-08-23 Carl Zeiss Smt Gmbh Objektiv und optisches System mit einem solchen Objektiv
CN110582224B (zh) 2017-04-28 2021-12-03 株式会社尼康 眼科装置
EP3616602A4 (en) 2017-04-28 2021-04-14 Nikon Corporation SYSTEM FOR OPHTHALMOLOGICAL IMAGING, DEVICE FOR OPHTHALMOLOGICAL IMAGING, METHOD FOR CAPTURING AN OPHTHALMOLOGICAL IMAGE AND OPHTHALMOLOGICAL IMAGE SYSTEM
CN107505692B (zh) * 2017-09-26 2020-04-10 张家港中贺自动化科技有限公司 一种折反射式物镜
US10681254B2 (en) * 2018-02-01 2020-06-09 Canon Kabushiki Kaisha Optical element, optical apparatus, and imaging apparatus
JP7230902B2 (ja) * 2018-02-23 2023-03-01 株式会社ニコン 眼科光学系、眼科装置、及び眼科システム
CN108873289B (zh) * 2018-09-04 2024-02-09 中国科学院长春光学精密机械与物理研究所 显微物镜光学系统及光学设备
KR102133859B1 (ko) * 2018-11-23 2020-07-14 한국 천문 연구원 원형의 비축-비구면 거울 결정 방법
CN112815776A (zh) * 2021-01-04 2021-05-18 北京环境特性研究所 一种激光红外复合目标模拟器光学系统
US11561476B1 (en) * 2021-07-10 2023-01-24 Kenneth Carlisle Johnson UV lithography system

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3897133A (en) * 1973-03-05 1975-07-29 David A Warner Telescopic optical system
JPS60184223A (ja) * 1984-03-01 1985-09-19 Nippon Kogaku Kk <Nikon> 反射屈折式望遠レンズ
US4779966A (en) 1984-12-21 1988-10-25 The Perkin-Elmer Corporation Single mirror projection optical system
GB2177812B (en) * 1985-07-13 1988-09-21 Pilkington Perkin Elmer Ltd A catadioptric lens
US4953960A (en) 1988-07-15 1990-09-04 Williamson David M Optical reduction system
US5004331A (en) 1989-05-03 1991-04-02 Hughes Aircraft Company Catadioptric projector, catadioptric projection system and process
US5089910A (en) * 1990-06-28 1992-02-18 Lookheed Missiles & Space Company, Inc. Infrared catadioptric zoom relay telescope with an asperic primary mirror
US5031976A (en) * 1990-09-24 1991-07-16 Kla Instruments, Corporation Catadioptric imaging system
US5734496A (en) 1991-06-03 1998-03-31 Her Majesty The Queen In Right Of New Zealand Lens system
US6020950A (en) 1992-02-24 2000-02-01 Nikon Corporation Exposure method and projection exposure apparatus
JP3214033B2 (ja) 1992-02-24 2001-10-02 株式会社ニコン 露光方法
JPH05234846A (ja) 1992-02-24 1993-09-10 Nikon Corp 投影光学系を用いた露光方法
JP3384038B2 (ja) * 1992-06-15 2003-03-10 株式会社ニコン 面位置検出光学装置
JPH06215999A (ja) 1993-01-21 1994-08-05 Nikon Corp 投影露光装置及び露光方法
JP2884947B2 (ja) 1992-10-01 1999-04-19 株式会社ニコン 投影露光装置、露光方法および半導体集積回路の製造方法
JPH06244082A (ja) 1993-02-19 1994-09-02 Nikon Corp 投影露光装置
JPH07117648A (ja) 1993-10-26 1995-05-09 Aisin Seiki Co Ltd アンチスキッド制御方法及びアンチスキッド制御装置
US5488229A (en) * 1994-10-04 1996-01-30 Excimer Laser Systems, Inc. Deep ultraviolet microlithography system
US5559338A (en) 1994-10-04 1996-09-24 Excimer Laser Systems, Inc. Deep ultraviolet optical imaging system for microlithography and/or microfabrication
JPH08219718A (ja) 1995-02-08 1996-08-30 Nikon Corp 面位置検出装置
US5650877A (en) 1995-08-14 1997-07-22 Tropel Corporation Imaging system for deep ultraviolet lithography
JPH09304016A (ja) 1996-05-15 1997-11-28 Nikon Corp 面位置検出装置及び該装置を備えた露光装置
US5717518A (en) * 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US5999310A (en) 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
JPH1082611A (ja) 1996-09-10 1998-03-31 Nikon Corp 面位置検出装置

Also Published As

Publication number Publication date
US6473243B1 (en) 2002-10-29
US20030030917A1 (en) 2003-02-13
JP2009223330A (ja) 2009-10-01
WO2000039623A1 (fr) 2000-07-06
US6639734B2 (en) 2003-10-28
KR20010041257A (ko) 2001-05-15
EP1059550A1 (en) 2000-12-13
EP1059550A4 (en) 2003-03-19

Similar Documents

Publication Publication Date Title
JP4345232B2 (ja) 反射屈折結像光学系および該光学系を備えた投影露光装置
US6621557B2 (en) Projection exposure apparatus and exposure methods
KR101647934B1 (ko) 투영 광학계, 노광 장치 및 노광 방법
JP4717974B2 (ja) 反射屈折光学系及び該光学系を備える投影露光装置
US6707616B1 (en) Projection exposure apparatus, projection exposure method and catadioptric optical system
JP4245286B2 (ja) 反射屈折光学系および該光学系を備えた露光装置
JPH103039A (ja) 反射屈折光学系
KR20010086059A (ko) 투영 노광 방법 및 장치와 투영 광학계
JP2002118058A (ja) 投影露光装置及び方法
JP2002208551A (ja) 反射屈折光学系及び投影露光装置
JP2002082285A (ja) 反射屈折光学系および該光学系を備えた露光装置
JP2000195772A (ja) 投影露光装置
JP6358242B2 (ja) 露光装置、露光方法、デバイス製造方法およびパターン形成方法
JP2000284178A (ja) 投影光学系及び該投影光学系を備える投影露光装置
JP2000208396A (ja) 視野絞り投影光学系及び投影露光装置
JP2014194552A (ja) 反射屈折型の投影光学系、露光装置、および露光方法
JP5664697B2 (ja) 反射屈折型の投影光学系、露光装置、および露光方法
JP5877965B2 (ja) 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP2000221405A (ja) 投影光学系、投影露光装置、及び投影露光方法
JP2018077519A (ja) 露光装置、露光方法およびデバイス製造方法
JP2010026526A (ja) 反射屈折型の投影光学系、露光装置、および露光方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060425

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080125

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090324

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090520

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090623

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090706

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120724

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150724

Year of fee payment: 6

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150724

Year of fee payment: 6

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150724

Year of fee payment: 6

LAPS Cancellation because of no payment of annual fees