JP4308975B2 - 基板処理装置、基板処理方法及び半導体素子の形成方法 - Google Patents

基板処理装置、基板処理方法及び半導体素子の形成方法 Download PDF

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JP4308975B2
JP4308975B2 JP14854799A JP14854799A JP4308975B2 JP 4308975 B2 JP4308975 B2 JP 4308975B2 JP 14854799 A JP14854799 A JP 14854799A JP 14854799 A JP14854799 A JP 14854799A JP 4308975 B2 JP4308975 B2 JP 4308975B2
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cassette
inert gas
gas supply
port
atmosphere
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Japanese (ja)
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JP2000340641A (ja
JP2000340641A5 (enrdf_load_stackoverflow
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久志 吉田
昭成 林
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Kokusai Denki Electric Inc
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Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
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JP14854799A 1999-05-27 1999-05-27 基板処理装置、基板処理方法及び半導体素子の形成方法 Expired - Lifetime JP4308975B2 (ja)

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JP14854799A JP4308975B2 (ja) 1999-05-27 1999-05-27 基板処理装置、基板処理方法及び半導体素子の形成方法

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JP14854799A JP4308975B2 (ja) 1999-05-27 1999-05-27 基板処理装置、基板処理方法及び半導体素子の形成方法

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JP2000340641A JP2000340641A (ja) 2000-12-08
JP2000340641A5 JP2000340641A5 (enrdf_load_stackoverflow) 2006-07-06
JP4308975B2 true JP4308975B2 (ja) 2009-08-05

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104603032A (zh) * 2012-08-21 2015-05-06 村田机械株式会社 具备清洗功能的储料器、储料器单元以及洁净气体的供给方法
US10096504B2 (en) 2013-04-12 2018-10-09 Tokyo Electron Limited Method for managing atmosphere in storage container

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003007813A (ja) * 2001-06-20 2003-01-10 Nec Corp 半導体ウエハの保管ボックス、運搬装置、運搬方法及び保管倉庫
KR20030009763A (ko) * 2001-07-24 2003-02-05 삼성전자주식회사 웨이퍼 보관장치
JP2003197468A (ja) 2001-10-19 2003-07-11 Nec Tokin Toyama Ltd 固体電解コンデンサ及びその製造方法
KR101474572B1 (ko) * 2006-06-19 2014-12-18 엔테그리스, 아이엔씨. 레티클 스토리지 정화시스템
JP4670808B2 (ja) * 2006-12-22 2011-04-13 ムラテックオートメーション株式会社 コンテナの搬送システム及び測定用コンテナ
JP2010041015A (ja) * 2008-08-05 2010-02-18 Kondo Kogyo Kk 半導体ウエハ収納容器用保管棚
JP5381054B2 (ja) * 2008-12-02 2014-01-08 シンフォニアテクノロジー株式会社 ロードポート
KR100904999B1 (ko) 2008-12-29 2009-06-26 (주)서울산업기술 샘플링캐리어
TWI575631B (zh) 2011-06-28 2017-03-21 Dynamic Micro Systems 半導體儲存櫃系統與方法
JP5598728B2 (ja) * 2011-12-22 2014-10-01 株式会社ダイフク 不活性ガス注入装置
SG11201506166UA (en) * 2013-03-05 2015-09-29 Murata Machinery Ltd Measurement unit and purge gas flow rate measuring method
JP6403431B2 (ja) 2013-06-28 2018-10-10 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、流量監視方法及び半導体装置の製造方法並びに流量監視プログラム
US10438829B2 (en) 2014-02-07 2019-10-08 Murata Machinery, Ltd. Purge device and purge method
JP6414525B2 (ja) * 2015-09-02 2018-10-31 株式会社ダイフク 保管設備
JP6817757B2 (ja) 2016-09-16 2021-01-20 東京エレクトロン株式会社 基板処理装置及び基板移送方法
KR102206194B1 (ko) 2017-09-26 2021-01-22 가부시키가이샤 코쿠사이 엘렉트릭 기판 처리 장치 및 반도체 장치의 제조 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104603032A (zh) * 2012-08-21 2015-05-06 村田机械株式会社 具备清洗功能的储料器、储料器单元以及洁净气体的供给方法
US10096504B2 (en) 2013-04-12 2018-10-09 Tokyo Electron Limited Method for managing atmosphere in storage container

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