JP4283520B2 - プラズマ成膜装置 - Google Patents

プラズマ成膜装置 Download PDF

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Publication number
JP4283520B2
JP4283520B2 JP2002294140A JP2002294140A JP4283520B2 JP 4283520 B2 JP4283520 B2 JP 4283520B2 JP 2002294140 A JP2002294140 A JP 2002294140A JP 2002294140 A JP2002294140 A JP 2002294140A JP 4283520 B2 JP4283520 B2 JP 4283520B2
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JP
Japan
Prior art keywords
electrodes
gas
electrode
film
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2002294140A
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English (en)
Japanese (ja)
Other versions
JP2004124239A (ja
Inventor
真一 川崎
純夫 中武
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2002294140A priority Critical patent/JP4283520B2/ja
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to CA002471987A priority patent/CA2471987C/en
Priority to KR1020057018940A priority patent/KR20050103251A/ko
Priority to KR1020047010440A priority patent/KR100552378B1/ko
Priority to CNB2003801002540A priority patent/CN100423194C/zh
Priority to CN 200610005949 priority patent/CN1811012A/zh
Priority to TW092127816A priority patent/TWI247353B/zh
Priority to TW094119296A priority patent/TW200534387A/zh
Priority to PCT/JP2003/012821 priority patent/WO2004032214A1/ja
Priority to EP03748739A priority patent/EP1475824A4/en
Priority to US10/500,317 priority patent/US7819081B2/en
Publication of JP2004124239A publication Critical patent/JP2004124239A/ja
Priority to US11/272,157 priority patent/US20060096539A1/en
Application granted granted Critical
Publication of JP4283520B2 publication Critical patent/JP4283520B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
JP2002294140A 2002-10-07 2002-10-07 プラズマ成膜装置 Expired - Lifetime JP4283520B2 (ja)

Priority Applications (12)

Application Number Priority Date Filing Date Title
JP2002294140A JP4283520B2 (ja) 2002-10-07 2002-10-07 プラズマ成膜装置
PCT/JP2003/012821 WO2004032214A1 (ja) 2002-10-07 2003-10-07 プラズマ成膜装置
KR1020047010440A KR100552378B1 (ko) 2002-10-07 2003-10-07 플라즈마 표면 처리 장치의 전극 구조
CNB2003801002540A CN100423194C (zh) 2002-10-07 2003-10-07 等离子体表面加工设备的电极结构
CN 200610005949 CN1811012A (zh) 2002-10-07 2003-10-07 等离子体表面加工设备
TW092127816A TWI247353B (en) 2002-10-07 2003-10-07 Plasma film forming system
CA002471987A CA2471987C (en) 2002-10-07 2003-10-07 Plasma surface processing apparatus
KR1020057018940A KR20050103251A (ko) 2002-10-07 2003-10-07 플라즈마 표면 처리 장치
EP03748739A EP1475824A4 (en) 2002-10-07 2003-10-07 PLASMA FILM FORMATION SYSTEM
US10/500,317 US7819081B2 (en) 2002-10-07 2003-10-07 Plasma film forming system
TW094119296A TW200534387A (en) 2002-10-07 2003-10-07 Plasma film forming system
US11/272,157 US20060096539A1 (en) 2002-10-07 2005-11-10 Plasma film forming system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002294140A JP4283520B2 (ja) 2002-10-07 2002-10-07 プラズマ成膜装置

Publications (2)

Publication Number Publication Date
JP2004124239A JP2004124239A (ja) 2004-04-22
JP4283520B2 true JP4283520B2 (ja) 2009-06-24

Family

ID=32284830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002294140A Expired - Lifetime JP4283520B2 (ja) 2002-10-07 2002-10-07 プラズマ成膜装置

Country Status (2)

Country Link
JP (1) JP4283520B2 (zh)
CN (2) CN1811012A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8597686B2 (en) 2004-01-30 2013-12-03 Asahi Kasei Chemicals Corporation Porous cellulose aggregate and formed product composition comprising the same

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4576190B2 (ja) * 2004-09-29 2010-11-04 三菱重工業株式会社 プラズマ処理装置
TWI354712B (en) * 2007-09-10 2011-12-21 Ind Tech Res Inst Film coating system and isolating device
JP5479867B2 (ja) * 2009-01-14 2014-04-23 東京エレクトロン株式会社 誘導結合プラズマ処理装置
KR102014877B1 (ko) 2012-05-30 2019-08-27 주성엔지니어링(주) 기판 처리 장치 및 기판 처리 방법
US11673108B2 (en) * 2017-08-07 2023-06-13 Kasuga Denki, Inc. Surface modifying device
CN108807127B (zh) * 2018-06-01 2020-03-31 北京北方华创微电子装备有限公司 上电极组件、反应腔室以及原子层沉积设备
CN110412091B (zh) * 2019-07-10 2024-04-23 宁波大学 一种可重复使用的损伤识别压电传感装置
EP3886540B1 (en) * 2019-11-27 2023-05-03 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generation device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0321982A (ja) * 1989-06-19 1991-01-30 Fujitsu Ltd カラー表示装置
JPH0729827A (ja) * 1993-07-13 1995-01-31 Kawasaki Steel Corp 半導体基板の製造方法および装置
JPH08279495A (ja) * 1995-02-07 1996-10-22 Seiko Epson Corp プラズマ処理装置及びその方法
WO1996031997A1 (fr) * 1995-04-07 1996-10-10 Seiko Epson Corporation Equipement de traitement de surface
JP3653824B2 (ja) * 1995-09-22 2005-06-02 セイコーエプソン株式会社 表面処理装置
US6137231A (en) * 1996-09-10 2000-10-24 The Regents Of The University Of California Constricted glow discharge plasma source
JP2000178744A (ja) * 1998-12-09 2000-06-27 Komatsu Ltd 成膜装置
JP2001259409A (ja) * 2000-03-16 2001-09-25 Seiko Epson Corp 放電装置
JP2002158219A (ja) * 2000-09-06 2002-05-31 Sekisui Chem Co Ltd 放電プラズマ処理装置及びそれを用いた処理方法
JP2002080970A (ja) * 2000-09-08 2002-03-22 Sekisui Chem Co Ltd 反射防止層を有する光学物品の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8597686B2 (en) 2004-01-30 2013-12-03 Asahi Kasei Chemicals Corporation Porous cellulose aggregate and formed product composition comprising the same

Also Published As

Publication number Publication date
CN1811012A (zh) 2006-08-02
CN100423194C (zh) 2008-10-01
JP2004124239A (ja) 2004-04-22
CN1735960A (zh) 2006-02-15

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