JP4272007B2 - 非暴露領域の除去が不要な感熱性組成物 - Google Patents

非暴露領域の除去が不要な感熱性組成物 Download PDF

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Publication number
JP4272007B2
JP4272007B2 JP2003271831A JP2003271831A JP4272007B2 JP 4272007 B2 JP4272007 B2 JP 4272007B2 JP 2003271831 A JP2003271831 A JP 2003271831A JP 2003271831 A JP2003271831 A JP 2003271831A JP 4272007 B2 JP4272007 B2 JP 4272007B2
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JP
Japan
Prior art keywords
heat
composition
image
exposure
present
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Expired - Fee Related
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JP2003271831A
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English (en)
Japanese (ja)
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JP2004034709A (ja
JP2004034709A5 (enExample
Inventor
ボッリ アンジェロ
テッタマンティ アンドレア
Original Assignee
アグファ グラフィックス エヌ ヴェー
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2003271831A 2002-07-10 2003-07-08 非暴露領域の除去が不要な感熱性組成物 Expired - Fee Related JP4272007B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02425455A EP1380439B1 (en) 2002-07-10 2002-07-10 Heat-sensitive composition, negative working lithographic printin plate precursor coated with the said composition and method for forming a negative image on the said plate

Publications (3)

Publication Number Publication Date
JP2004034709A JP2004034709A (ja) 2004-02-05
JP2004034709A5 JP2004034709A5 (enExample) 2006-07-06
JP4272007B2 true JP4272007B2 (ja) 2009-06-03

Family

ID=29724613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003271831A Expired - Fee Related JP4272007B2 (ja) 2002-07-10 2003-07-08 非暴露領域の除去が不要な感熱性組成物

Country Status (10)

Country Link
US (2) US7060412B2 (enExample)
EP (1) EP1380439B1 (enExample)
JP (1) JP4272007B2 (enExample)
KR (1) KR20040026121A (enExample)
CN (1) CN100372676C (enExample)
AT (1) ATE324991T1 (enExample)
BR (1) BR0302332A (enExample)
CA (1) CA2432859A1 (enExample)
DE (1) DE60211137T2 (enExample)
ZA (1) ZA200304677B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60211137T2 (de) * 2002-07-10 2007-03-01 Lastra S.P.A. Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte
JP4404734B2 (ja) * 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
CN101269594B (zh) * 2007-03-19 2011-04-13 成都新图印刷技术有限公司 平版热敏阴图成像元件及在印刷机上显影的印刷版前体
CN101439609B (zh) * 2007-11-22 2010-11-03 乐凯集团第二胶片厂 阳图型感红外光组合物和阳图型印刷版及其使用方法
CN103587272B (zh) * 2013-11-04 2019-01-18 北京中科纳新印刷技术有限公司 一种热敏无砂目印版及其制备方法与应用

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9322705D0 (en) * 1993-11-04 1993-12-22 Minnesota Mining & Mfg Lithographic printing plates
EP0672954B1 (en) * 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates
US5466557A (en) * 1994-08-29 1995-11-14 Eastman Kodak Company Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates
US6261740B1 (en) * 1997-09-02 2001-07-17 Kodak Polychrome Graphics, Llc Processless, laser imageable lithographic printing plate
US6174646B1 (en) * 1997-10-21 2001-01-16 Konica Corporation Image forming method
EP0913253B1 (en) * 1997-10-28 2002-12-18 Mitsubishi Chemical Corporation Positive photosensitive composition, positive photosensitive lithographic printing plate and method for forming an image thereon
EP0924065B1 (en) 1997-12-19 2003-05-14 Agfa-Gevaert A heat sensitive non-ablatable wasteless imaging element for providing a lithographic printing plate
US6165679A (en) * 1997-12-19 2000-12-26 Agfa-Gevaert, N.V. Heat-sensitive non-ablatable wasteless imaging element for providing a lithographic printing plate
GB9811813D0 (en) * 1998-06-03 1998-07-29 Horsell Graphic Ind Ltd Polymeric compounds
US5985514A (en) * 1998-09-18 1999-11-16 Eastman Kodak Company Imaging member containing heat sensitive thiosulfate polymer and methods of use
US6190830B1 (en) * 1998-09-29 2001-02-20 Kodak Polychrome Graphics Llc Processless direct write printing plate having heat sensitive crosslinked vinyl polymer with organoonium group and methods of imaging and printing
JP4132547B2 (ja) * 2000-03-01 2008-08-13 富士フイルム株式会社 画像形成材料及びそれを用いた平版印刷版原版
JP2002023350A (ja) * 2000-07-07 2002-01-23 Fuji Photo Film Co Ltd ネガ型平版印刷版原版
US6672210B2 (en) * 2000-07-13 2004-01-06 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor with a graft polymerized hydrophilic layer
DE60132754T2 (de) * 2000-12-20 2009-03-05 Fujifilm Corporation Lithographischer Druckplattenvorläufer
US6610458B2 (en) * 2001-07-23 2003-08-26 Kodak Polychrome Graphics Llc Method and system for direct-to-press imaging
DE60211137T2 (de) * 2002-07-10 2007-03-01 Lastra S.P.A. Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte

Also Published As

Publication number Publication date
EP1380439B1 (en) 2006-05-03
US20050238995A1 (en) 2005-10-27
DE60211137D1 (de) 2006-06-08
ATE324991T1 (de) 2006-06-15
CA2432859A1 (en) 2004-01-10
CN1475344A (zh) 2004-02-18
EP1380439A1 (en) 2004-01-14
DE60211137T2 (de) 2007-03-01
CN100372676C (zh) 2008-03-05
US20040063028A1 (en) 2004-04-01
BR0302332A (pt) 2004-08-17
US7144681B2 (en) 2006-12-05
JP2004034709A (ja) 2004-02-05
US7060412B2 (en) 2006-06-13
ZA200304677B (en) 2003-09-18
KR20040026121A (ko) 2004-03-27

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