CN100372676C - 热敏组合物，涂有该热敏组合物的印版及其成像方法 - Google Patents
热敏组合物，涂有该热敏组合物的印版及其成像方法 Download PDFInfo
- Publication number
- CN100372676C CN100372676C CNB031475272A CN03147527A CN100372676C CN 100372676 C CN100372676 C CN 100372676C CN B031475272 A CNB031475272 A CN B031475272A CN 03147527 A CN03147527 A CN 03147527A CN 100372676 C CN100372676 C CN 100372676C
- Authority
- CN
- China
- Prior art keywords
- composition
- composition according
- heat
- plate
- absorbent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 87
- 238000007639 printing Methods 0.000 title claims abstract description 45
- 238000000034 method Methods 0.000 title claims abstract description 13
- 229920000642 polymer Polymers 0.000 claims abstract description 20
- 229920003986 novolac Polymers 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 230000005855 radiation Effects 0.000 claims description 20
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 18
- 230000002745 absorbent Effects 0.000 claims description 18
- 239000002250 absorbent Substances 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 125000001424 substituent group Chemical group 0.000 claims description 9
- 238000011161 development Methods 0.000 claims description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 5
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 238000009833 condensation Methods 0.000 claims description 3
- 230000005494 condensation Effects 0.000 claims description 3
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 claims description 3
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical group [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 claims description 3
- QQOWHRYOXYEMTL-UHFFFAOYSA-N triazin-4-amine Chemical compound N=C1C=CN=NN1 QQOWHRYOXYEMTL-UHFFFAOYSA-N 0.000 claims description 3
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 claims description 2
- 238000007171 acid catalysis Methods 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 claims description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 claims description 2
- 229940100630 metacresol Drugs 0.000 claims description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 claims description 2
- 230000000191 radiation effect Effects 0.000 claims description 2
- 150000003739 xylenols Chemical class 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 229920005989 resin Polymers 0.000 abstract description 5
- 239000011347 resin Substances 0.000 abstract description 5
- 239000006096 absorbing agent Substances 0.000 abstract description 2
- 239000002243 precursor Substances 0.000 abstract 1
- -1 triazine compound Chemical class 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 229920003264 Maprenal® Polymers 0.000 description 9
- 238000003384 imaging method Methods 0.000 description 9
- 238000012360 testing method Methods 0.000 description 8
- UPBDXRPQPOWRKR-UHFFFAOYSA-N furan-2,5-dione;methoxyethene Chemical compound COC=C.O=C1OC(=O)C=C1 UPBDXRPQPOWRKR-UHFFFAOYSA-N 0.000 description 7
- 239000004411 aluminium Substances 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- CTRPRMNBTVRDFH-UHFFFAOYSA-N 2-n-methyl-1,3,5-triazine-2,4,6-triamine Chemical compound CNC1=NC(N)=NC(N)=N1 CTRPRMNBTVRDFH-UHFFFAOYSA-N 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- 125000006606 n-butoxy group Chemical group 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- ODXNOGQHTZSYFY-UHFFFAOYSA-N 4-ethenylphthalic acid Chemical compound OC(=O)C1=CC=C(C=C)C=C1C(O)=O ODXNOGQHTZSYFY-UHFFFAOYSA-N 0.000 description 2
- 229920001342 Bakelite® Polymers 0.000 description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229920003265 Resimene® Polymers 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- 239000004637 bakelite Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000003651 drinking water Substances 0.000 description 2
- 235000020188 drinking water Nutrition 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001630 malic acid Substances 0.000 description 2
- 235000011090 malic acid Nutrition 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical class CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 2
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- 208000019300 CLIPPERS Diseases 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 208000021930 chronic lymphocytic inflammation with pontine perivascular enhancement responsive to steroids Diseases 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/165—Thermal imaging composition
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP02425455A EP1380439B1 (en) | 2002-07-10 | 2002-07-10 | Heat-sensitive composition, negative working lithographic printin plate precursor coated with the said composition and method for forming a negative image on the said plate |
| EP02425455.9 | 2002-07-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1475344A CN1475344A (zh) | 2004-02-18 |
| CN100372676C true CN100372676C (zh) | 2008-03-05 |
Family
ID=29724613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031475272A Expired - Fee Related CN100372676C (zh) | 2002-07-10 | 2003-07-09 | 热敏组合物，涂有该热敏组合物的印版及其成像方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US7060412B2 (enExample) |
| EP (1) | EP1380439B1 (enExample) |
| JP (1) | JP4272007B2 (enExample) |
| KR (1) | KR20040026121A (enExample) |
| CN (1) | CN100372676C (enExample) |
| AT (1) | ATE324991T1 (enExample) |
| BR (1) | BR0302332A (enExample) |
| CA (1) | CA2432859A1 (enExample) |
| DE (1) | DE60211137T2 (enExample) |
| ZA (1) | ZA200304677B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60211137T2 (de) * | 2002-07-10 | 2007-03-01 | Lastra S.P.A. | Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte |
| JP4404734B2 (ja) * | 2004-09-27 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
| CN101269594B (zh) * | 2007-03-19 | 2011-04-13 | 成都新图印刷技术有限公司 | 平版热敏阴图成像元件及在印刷机上显影的印刷版前体 |
| CN101439609B (zh) * | 2007-11-22 | 2010-11-03 | 乐凯集团第二胶片厂 | 阳图型感红外光组合物和阳图型印刷版及其使用方法 |
| CN103587272B (zh) * | 2013-11-04 | 2019-01-18 | 北京中科纳新印刷技术有限公司 | 一种热敏无砂目印版及其制备方法与应用 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1117921A (zh) * | 1993-11-04 | 1996-03-06 | 美国3M公司 | 平版印刷板 |
| US5663037A (en) * | 1994-03-14 | 1997-09-02 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin an infrared absorber and a triazine and use thereof in lithographic printing plates |
| EP0913253A1 (en) * | 1997-10-28 | 1999-05-06 | Mitsubishi Chemical Corporation | Positive photosensitive composition, positive photosensitive lithographic printing plate and method for its treatment |
| EP1029668A2 (en) * | 1999-02-04 | 2000-08-23 | Kodak Polychrome Graphics Company Ltd. | Processless, laser imageable lithographic printing plate |
| US6165679A (en) * | 1997-12-19 | 2000-12-26 | Agfa-Gevaert, N.V. | Heat-sensitive non-ablatable wasteless imaging element for providing a lithographic printing plate |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5466557A (en) * | 1994-08-29 | 1995-11-14 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates |
| US6174646B1 (en) * | 1997-10-21 | 2001-01-16 | Konica Corporation | Image forming method |
| EP0924065B1 (en) | 1997-12-19 | 2003-05-14 | Agfa-Gevaert | A heat sensitive non-ablatable wasteless imaging element for providing a lithographic printing plate |
| GB9811813D0 (en) * | 1998-06-03 | 1998-07-29 | Horsell Graphic Ind Ltd | Polymeric compounds |
| US5985514A (en) * | 1998-09-18 | 1999-11-16 | Eastman Kodak Company | Imaging member containing heat sensitive thiosulfate polymer and methods of use |
| US6190830B1 (en) * | 1998-09-29 | 2001-02-20 | Kodak Polychrome Graphics Llc | Processless direct write printing plate having heat sensitive crosslinked vinyl polymer with organoonium group and methods of imaging and printing |
| JP4132547B2 (ja) * | 2000-03-01 | 2008-08-13 | 富士フイルム株式会社 | 画像形成材料及びそれを用いた平版印刷版原版 |
| JP2002023350A (ja) * | 2000-07-07 | 2002-01-23 | Fuji Photo Film Co Ltd | ネガ型平版印刷版原版 |
| US6672210B2 (en) * | 2000-07-13 | 2004-01-06 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor with a graft polymerized hydrophilic layer |
| DE60132754T2 (de) * | 2000-12-20 | 2009-03-05 | Fujifilm Corporation | Lithographischer Druckplattenvorläufer |
| US6610458B2 (en) * | 2001-07-23 | 2003-08-26 | Kodak Polychrome Graphics Llc | Method and system for direct-to-press imaging |
| DE60211137T2 (de) * | 2002-07-10 | 2007-03-01 | Lastra S.P.A. | Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte |
-
2002
- 2002-07-10 DE DE60211137T patent/DE60211137T2/de not_active Expired - Fee Related
- 2002-07-10 AT AT02425455T patent/ATE324991T1/de not_active IP Right Cessation
- 2002-07-10 EP EP02425455A patent/EP1380439B1/en not_active Expired - Lifetime
-
2003
- 2003-06-17 ZA ZA200304677A patent/ZA200304677B/xx unknown
- 2003-06-20 CA CA002432859A patent/CA2432859A1/en not_active Abandoned
- 2003-06-27 US US10/607,578 patent/US7060412B2/en not_active Expired - Fee Related
- 2003-07-04 BR BR0302332-0A patent/BR0302332A/pt not_active Application Discontinuation
- 2003-07-08 JP JP2003271831A patent/JP4272007B2/ja not_active Expired - Fee Related
- 2003-07-09 CN CNB031475272A patent/CN100372676C/zh not_active Expired - Fee Related
- 2003-07-10 KR KR1020030046818A patent/KR20040026121A/ko not_active Withdrawn
-
2005
- 2005-06-09 US US11/148,184 patent/US7144681B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1117921A (zh) * | 1993-11-04 | 1996-03-06 | 美国3M公司 | 平版印刷板 |
| US5663037A (en) * | 1994-03-14 | 1997-09-02 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin an infrared absorber and a triazine and use thereof in lithographic printing plates |
| EP0913253A1 (en) * | 1997-10-28 | 1999-05-06 | Mitsubishi Chemical Corporation | Positive photosensitive composition, positive photosensitive lithographic printing plate and method for its treatment |
| US6165679A (en) * | 1997-12-19 | 2000-12-26 | Agfa-Gevaert, N.V. | Heat-sensitive non-ablatable wasteless imaging element for providing a lithographic printing plate |
| EP1029668A2 (en) * | 1999-02-04 | 2000-08-23 | Kodak Polychrome Graphics Company Ltd. | Processless, laser imageable lithographic printing plate |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1380439B1 (en) | 2006-05-03 |
| US20050238995A1 (en) | 2005-10-27 |
| DE60211137D1 (de) | 2006-06-08 |
| ATE324991T1 (de) | 2006-06-15 |
| CA2432859A1 (en) | 2004-01-10 |
| CN1475344A (zh) | 2004-02-18 |
| EP1380439A1 (en) | 2004-01-14 |
| DE60211137T2 (de) | 2007-03-01 |
| US20040063028A1 (en) | 2004-04-01 |
| BR0302332A (pt) | 2004-08-17 |
| US7144681B2 (en) | 2006-12-05 |
| JP2004034709A (ja) | 2004-02-05 |
| US7060412B2 (en) | 2006-06-13 |
| ZA200304677B (en) | 2003-09-18 |
| JP4272007B2 (ja) | 2009-06-03 |
| KR20040026121A (ko) | 2004-03-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6177182B1 (en) | Thermally reactive near infrared absorption polymer coatings, method of preparing and methods of use | |
| CN101203382B (zh) | 热敏成像元件 | |
| EP1299238B1 (en) | Radiation sensitive product, method for preparing a radiation sensitive product and printing or imaging process using the product | |
| CN101287601B (zh) | 具有聚乙烯醇缩醛顶层的双层热敏可成像元件 | |
| JP2006511642A (ja) | 水性ヒートセット／オフセットインキ組成物 | |
| CN100372676C (zh) | 热敏组合物，涂有该热敏组合物的印版及其成像方法 | |
| WO2001083234A1 (en) | Lithographic printing plate | |
| DE60011675T2 (de) | Wärmeempfindliches bildaufzeichnungselement zur herstellung lithographischer druckplatten | |
| CN102762381B (zh) | 正性平版印刷版前体及其制备方法、用于制备正性平版印刷版的方法和印刷方法 | |
| US6368777B1 (en) | Performance of printing plates | |
| CN101762972A (zh) | 一种红外阳图热敏成像组成物 | |
| CN101762982B (zh) | 一种红外阳图热敏平版印刷版 | |
| CN101907829B (zh) | 阳图热敏平版印刷版及其制作方法 | |
| HK1060720A (en) | Heat-sensitive composition, negative working lithographic printin plate precursor coated with the said composition and method for forming a negative image on the said plate | |
| WO2005010613A1 (ja) | 感光性平版印刷版およびその製造方法 | |
| JP2002049147A (ja) | 平版印刷用の版 | |
| KR20050025984A (ko) | 평판 인쇄판용 감광성 수지조성물 및 평판 인쇄용 원판 | |
| JP2004523009A (ja) | リソグラフ用成分に有用な含混合ジアゾ・ノボラック感熱性コーティング化合物 | |
| JP2000338654A (ja) | 感光性組成物、印刷版原版及び画像形成方法 | |
| JP4052954B2 (ja) | ダイレクトオフセット印刷用原版およびダイレクトオフセット印刷版 | |
| CN118271868A (zh) | 一种改性着色染料及其制备方法和应用 | |
| JPH11348446A (ja) | ネガ型平版印刷版原版および印刷刷版作製方法 | |
| JP2000338653A (ja) | 感光性組成物、印刷版原版及び画像形成方法 | |
| JP2004276278A (ja) | ダイレクトオフセット印刷用原版及びダイレクトオフセット印刷版 | |
| JP2007125835A (ja) | 平版印刷用原版及び平版印刷用版 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: AGFA GRAPHICS CO., LTD. Free format text: FORMER OWNER: LASTLA S.P.A. Effective date: 20080418 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20080418 Address after: Belgian texel Mo Patentee after: Agfa graphics Ltd Address before: Brescia Italy Patentee before: Lastla S.P.A. |
|
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080305 Termination date: 20100709 |