DE60211137T2 - Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte - Google Patents
Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte Download PDFInfo
- Publication number
- DE60211137T2 DE60211137T2 DE60211137T DE60211137T DE60211137T2 DE 60211137 T2 DE60211137 T2 DE 60211137T2 DE 60211137 T DE60211137 T DE 60211137T DE 60211137 T DE60211137 T DE 60211137T DE 60211137 T2 DE60211137 T2 DE 60211137T2
- Authority
- DE
- Germany
- Prior art keywords
- composition according
- substituents
- composition
- weight
- absorber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 77
- 238000000034 method Methods 0.000 title abstract description 12
- 229920005989 resin Polymers 0.000 claims abstract description 24
- 239000011347 resin Substances 0.000 claims abstract description 24
- 239000006096 absorbing agent Substances 0.000 claims abstract description 21
- 229920003986 novolac Polymers 0.000 claims abstract description 17
- 229920000642 polymer Polymers 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 13
- -1 triazine compound Chemical class 0.000 claims abstract description 11
- 125000001424 substituent group Chemical group 0.000 claims description 21
- 230000005855 radiation Effects 0.000 claims description 17
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 9
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 7
- 229920001577 copolymer Polymers 0.000 claims description 6
- 238000011161 development Methods 0.000 claims description 6
- 238000005903 acid hydrolysis reaction Methods 0.000 claims description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 4
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical group [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 claims description 3
- 238000009833 condensation Methods 0.000 claims description 3
- 230000005494 condensation Effects 0.000 claims description 3
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 claims description 3
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 claims description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 238000012545 processing Methods 0.000 claims description 2
- 239000002243 precursor Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 125000006606 n-butoxy group Chemical group 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 239000011230 binding agent Substances 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 5
- 229920001342 Bakelite® Polymers 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 239000004637 bakelite Substances 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 229920003264 Maprenal® Polymers 0.000 description 3
- 238000002679 ablation Methods 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000010792 warming Methods 0.000 description 3
- ILUAAIDVFMVTAU-OLQVQODUSA-N (1s,2r)-cyclohex-4-ene-1,2-dicarboxylic acid Chemical compound OC(=O)[C@H]1CC=CC[C@H]1C(O)=O ILUAAIDVFMVTAU-OLQVQODUSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- ODXNOGQHTZSYFY-UHFFFAOYSA-N 4-ethenylphthalic acid Chemical compound OC(=O)C1=CC=C(C=C)C=C1C(O)=O ODXNOGQHTZSYFY-UHFFFAOYSA-N 0.000 description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 229920003265 Resimene® Polymers 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- BDLXTDLGTWNUFM-UHFFFAOYSA-N 2-[(2-methylpropan-2-yl)oxy]ethanol Chemical compound CC(C)(C)OCCO BDLXTDLGTWNUFM-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- BFCFOKJGKFDYGS-UHFFFAOYSA-O CCN1c(cccc2)c2S/C1=C\C=C(/CC(C)(C)C1)\C(Cl)=C1/C=C/c1[n+](CCc2cc(S(O)(=O)=O)ccc2C)c2ccccc2[s]1 Chemical compound CCN1c(cccc2)c2S/C1=C\C=C(/CC(C)(C)C1)\C(Cl)=C1/C=C/c1[n+](CCc2cc(S(O)(=O)=O)ccc2C)c2ccccc2[s]1 BFCFOKJGKFDYGS-UHFFFAOYSA-O 0.000 description 1
- 208000019300 CLIPPERS Diseases 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000007171 acid catalysis Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 208000021930 chronic lymphocytic inflammation with pontine perivascular enhancement responsive to steroids Diseases 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- UPBDXRPQPOWRKR-UHFFFAOYSA-N furan-2,5-dione;methoxyethene Chemical compound COC=C.O=C1OC(=O)C=C1 UPBDXRPQPOWRKR-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000008206 lipophilic material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- QQOWHRYOXYEMTL-UHFFFAOYSA-N triazin-4-amine Chemical compound N=C1C=CN=NN1 QQOWHRYOXYEMTL-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/165—Thermal imaging composition
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP02425455A EP1380439B1 (en) | 2002-07-10 | 2002-07-10 | Heat-sensitive composition, negative working lithographic printin plate precursor coated with the said composition and method for forming a negative image on the said plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60211137D1 DE60211137D1 (de) | 2006-06-08 |
| DE60211137T2 true DE60211137T2 (de) | 2007-03-01 |
Family
ID=29724613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60211137T Expired - Fee Related DE60211137T2 (de) | 2002-07-10 | 2002-07-10 | Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US7060412B2 (enExample) |
| EP (1) | EP1380439B1 (enExample) |
| JP (1) | JP4272007B2 (enExample) |
| KR (1) | KR20040026121A (enExample) |
| CN (1) | CN100372676C (enExample) |
| AT (1) | ATE324991T1 (enExample) |
| BR (1) | BR0302332A (enExample) |
| CA (1) | CA2432859A1 (enExample) |
| DE (1) | DE60211137T2 (enExample) |
| ZA (1) | ZA200304677B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60211137T2 (de) * | 2002-07-10 | 2007-03-01 | Lastra S.P.A. | Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte |
| JP4404734B2 (ja) * | 2004-09-27 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
| CN101269594B (zh) * | 2007-03-19 | 2011-04-13 | 成都新图印刷技术有限公司 | 平版热敏阴图成像元件及在印刷机上显影的印刷版前体 |
| CN101439609B (zh) * | 2007-11-22 | 2010-11-03 | 乐凯集团第二胶片厂 | 阳图型感红外光组合物和阳图型印刷版及其使用方法 |
| CN103587272B (zh) * | 2013-11-04 | 2019-01-18 | 北京中科纳新印刷技术有限公司 | 一种热敏无砂目印版及其制备方法与应用 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9322705D0 (en) * | 1993-11-04 | 1993-12-22 | Minnesota Mining & Mfg | Lithographic printing plates |
| EP0672954B1 (en) * | 1994-03-14 | 1999-09-15 | Kodak Polychrome Graphics LLC | Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates |
| US5466557A (en) * | 1994-08-29 | 1995-11-14 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates |
| US6261740B1 (en) * | 1997-09-02 | 2001-07-17 | Kodak Polychrome Graphics, Llc | Processless, laser imageable lithographic printing plate |
| US6174646B1 (en) * | 1997-10-21 | 2001-01-16 | Konica Corporation | Image forming method |
| EP0913253B1 (en) * | 1997-10-28 | 2002-12-18 | Mitsubishi Chemical Corporation | Positive photosensitive composition, positive photosensitive lithographic printing plate and method for forming an image thereon |
| EP0924065B1 (en) | 1997-12-19 | 2003-05-14 | Agfa-Gevaert | A heat sensitive non-ablatable wasteless imaging element for providing a lithographic printing plate |
| US6165679A (en) * | 1997-12-19 | 2000-12-26 | Agfa-Gevaert, N.V. | Heat-sensitive non-ablatable wasteless imaging element for providing a lithographic printing plate |
| GB9811813D0 (en) * | 1998-06-03 | 1998-07-29 | Horsell Graphic Ind Ltd | Polymeric compounds |
| US5985514A (en) * | 1998-09-18 | 1999-11-16 | Eastman Kodak Company | Imaging member containing heat sensitive thiosulfate polymer and methods of use |
| US6190830B1 (en) * | 1998-09-29 | 2001-02-20 | Kodak Polychrome Graphics Llc | Processless direct write printing plate having heat sensitive crosslinked vinyl polymer with organoonium group and methods of imaging and printing |
| JP4132547B2 (ja) * | 2000-03-01 | 2008-08-13 | 富士フイルム株式会社 | 画像形成材料及びそれを用いた平版印刷版原版 |
| JP2002023350A (ja) * | 2000-07-07 | 2002-01-23 | Fuji Photo Film Co Ltd | ネガ型平版印刷版原版 |
| US6672210B2 (en) * | 2000-07-13 | 2004-01-06 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor with a graft polymerized hydrophilic layer |
| DE60132754T2 (de) * | 2000-12-20 | 2009-03-05 | Fujifilm Corporation | Lithographischer Druckplattenvorläufer |
| US6610458B2 (en) * | 2001-07-23 | 2003-08-26 | Kodak Polychrome Graphics Llc | Method and system for direct-to-press imaging |
| DE60211137T2 (de) * | 2002-07-10 | 2007-03-01 | Lastra S.P.A. | Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte |
-
2002
- 2002-07-10 DE DE60211137T patent/DE60211137T2/de not_active Expired - Fee Related
- 2002-07-10 AT AT02425455T patent/ATE324991T1/de not_active IP Right Cessation
- 2002-07-10 EP EP02425455A patent/EP1380439B1/en not_active Expired - Lifetime
-
2003
- 2003-06-17 ZA ZA200304677A patent/ZA200304677B/xx unknown
- 2003-06-20 CA CA002432859A patent/CA2432859A1/en not_active Abandoned
- 2003-06-27 US US10/607,578 patent/US7060412B2/en not_active Expired - Fee Related
- 2003-07-04 BR BR0302332-0A patent/BR0302332A/pt not_active Application Discontinuation
- 2003-07-08 JP JP2003271831A patent/JP4272007B2/ja not_active Expired - Fee Related
- 2003-07-09 CN CNB031475272A patent/CN100372676C/zh not_active Expired - Fee Related
- 2003-07-10 KR KR1020030046818A patent/KR20040026121A/ko not_active Withdrawn
-
2005
- 2005-06-09 US US11/148,184 patent/US7144681B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1380439B1 (en) | 2006-05-03 |
| US20050238995A1 (en) | 2005-10-27 |
| DE60211137D1 (de) | 2006-06-08 |
| ATE324991T1 (de) | 2006-06-15 |
| CA2432859A1 (en) | 2004-01-10 |
| CN1475344A (zh) | 2004-02-18 |
| EP1380439A1 (en) | 2004-01-14 |
| CN100372676C (zh) | 2008-03-05 |
| US20040063028A1 (en) | 2004-04-01 |
| BR0302332A (pt) | 2004-08-17 |
| US7144681B2 (en) | 2006-12-05 |
| JP2004034709A (ja) | 2004-02-05 |
| US7060412B2 (en) | 2006-06-13 |
| ZA200304677B (en) | 2003-09-18 |
| JP4272007B2 (ja) | 2009-06-03 |
| KR20040026121A (ko) | 2004-03-27 |
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