ZA200304677B - Heat-sensitive composition in which removal of the unexposed regions is unnecessary, negative lithographic plate coated with the said composition and method for forming a negative image on the said plate. - Google Patents

Heat-sensitive composition in which removal of the unexposed regions is unnecessary, negative lithographic plate coated with the said composition and method for forming a negative image on the said plate.

Info

Publication number
ZA200304677B
ZA200304677B ZA200304677A ZA200304677A ZA200304677B ZA 200304677 B ZA200304677 B ZA 200304677B ZA 200304677 A ZA200304677 A ZA 200304677A ZA 200304677 A ZA200304677 A ZA 200304677A ZA 200304677 B ZA200304677 B ZA 200304677B
Authority
ZA
South Africa
Prior art keywords
composition
heat
negative
removal
unnecessary
Prior art date
Application number
ZA200304677A
Other languages
English (en)
Inventor
Angelo Bollli
Andrea Tettamanti
Original Assignee
Lastra Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lastra Spa filed Critical Lastra Spa
Publication of ZA200304677B publication Critical patent/ZA200304677B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
ZA200304677A 2002-07-10 2003-06-17 Heat-sensitive composition in which removal of the unexposed regions is unnecessary, negative lithographic plate coated with the said composition and method for forming a negative image on the said plate. ZA200304677B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02425455A EP1380439B1 (en) 2002-07-10 2002-07-10 Heat-sensitive composition, negative working lithographic printin plate precursor coated with the said composition and method for forming a negative image on the said plate

Publications (1)

Publication Number Publication Date
ZA200304677B true ZA200304677B (en) 2003-09-18

Family

ID=29724613

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA200304677A ZA200304677B (en) 2002-07-10 2003-06-17 Heat-sensitive composition in which removal of the unexposed regions is unnecessary, negative lithographic plate coated with the said composition and method for forming a negative image on the said plate.

Country Status (10)

Country Link
US (2) US7060412B2 (enExample)
EP (1) EP1380439B1 (enExample)
JP (1) JP4272007B2 (enExample)
KR (1) KR20040026121A (enExample)
CN (1) CN100372676C (enExample)
AT (1) ATE324991T1 (enExample)
BR (1) BR0302332A (enExample)
CA (1) CA2432859A1 (enExample)
DE (1) DE60211137T2 (enExample)
ZA (1) ZA200304677B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60211137T2 (de) * 2002-07-10 2007-03-01 Lastra S.P.A. Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte
JP4404734B2 (ja) * 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
CN101269594B (zh) * 2007-03-19 2011-04-13 成都新图印刷技术有限公司 平版热敏阴图成像元件及在印刷机上显影的印刷版前体
CN101439609B (zh) * 2007-11-22 2010-11-03 乐凯集团第二胶片厂 阳图型感红外光组合物和阳图型印刷版及其使用方法
CN103587272B (zh) * 2013-11-04 2019-01-18 北京中科纳新印刷技术有限公司 一种热敏无砂目印版及其制备方法与应用

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9322705D0 (en) * 1993-11-04 1993-12-22 Minnesota Mining & Mfg Lithographic printing plates
EP0672954B1 (en) * 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates
US5466557A (en) * 1994-08-29 1995-11-14 Eastman Kodak Company Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates
US6261740B1 (en) * 1997-09-02 2001-07-17 Kodak Polychrome Graphics, Llc Processless, laser imageable lithographic printing plate
US6174646B1 (en) * 1997-10-21 2001-01-16 Konica Corporation Image forming method
EP0913253B1 (en) * 1997-10-28 2002-12-18 Mitsubishi Chemical Corporation Positive photosensitive composition, positive photosensitive lithographic printing plate and method for forming an image thereon
EP0924065B1 (en) 1997-12-19 2003-05-14 Agfa-Gevaert A heat sensitive non-ablatable wasteless imaging element for providing a lithographic printing plate
US6165679A (en) * 1997-12-19 2000-12-26 Agfa-Gevaert, N.V. Heat-sensitive non-ablatable wasteless imaging element for providing a lithographic printing plate
GB9811813D0 (en) * 1998-06-03 1998-07-29 Horsell Graphic Ind Ltd Polymeric compounds
US5985514A (en) * 1998-09-18 1999-11-16 Eastman Kodak Company Imaging member containing heat sensitive thiosulfate polymer and methods of use
US6190830B1 (en) * 1998-09-29 2001-02-20 Kodak Polychrome Graphics Llc Processless direct write printing plate having heat sensitive crosslinked vinyl polymer with organoonium group and methods of imaging and printing
JP4132547B2 (ja) * 2000-03-01 2008-08-13 富士フイルム株式会社 画像形成材料及びそれを用いた平版印刷版原版
JP2002023350A (ja) * 2000-07-07 2002-01-23 Fuji Photo Film Co Ltd ネガ型平版印刷版原版
US6672210B2 (en) * 2000-07-13 2004-01-06 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor with a graft polymerized hydrophilic layer
DE60132754T2 (de) * 2000-12-20 2009-03-05 Fujifilm Corporation Lithographischer Druckplattenvorläufer
US6610458B2 (en) * 2001-07-23 2003-08-26 Kodak Polychrome Graphics Llc Method and system for direct-to-press imaging
DE60211137T2 (de) * 2002-07-10 2007-03-01 Lastra S.P.A. Wärmeempfindliche Zusammensetzung, bei der die nichtbelichteten Bereiche nicht entfernt werden müssen, negativarbeitende lithografische Druckplatte, beschichtet mit dieser Zusammensetzung, und Verfahren zur Herstellung eines Negativbildes auf dieser Platte

Also Published As

Publication number Publication date
EP1380439B1 (en) 2006-05-03
US20050238995A1 (en) 2005-10-27
DE60211137D1 (de) 2006-06-08
ATE324991T1 (de) 2006-06-15
CA2432859A1 (en) 2004-01-10
CN1475344A (zh) 2004-02-18
EP1380439A1 (en) 2004-01-14
DE60211137T2 (de) 2007-03-01
CN100372676C (zh) 2008-03-05
US20040063028A1 (en) 2004-04-01
BR0302332A (pt) 2004-08-17
US7144681B2 (en) 2006-12-05
JP2004034709A (ja) 2004-02-05
US7060412B2 (en) 2006-06-13
JP4272007B2 (ja) 2009-06-03
KR20040026121A (ko) 2004-03-27

Similar Documents

Publication Publication Date Title
CN1839354B (zh) 处理成像材料的设备及方法
US20150376768A1 (en) Systems and methods for implementing digital vapor phase patterning using variable data digital lithographic printing techniques
EP1916101A3 (en) Method for postbaking a lithographic printing plate
EP4349602A3 (en) Original plate for on-press development type lithographic printing plate, method for fabricating lithographic printing plate, and lithographic printing method
JP2008542060A5 (enExample)
ATE426836T1 (de) Verfahren zur herstellung einer lithografiedruckform
JP2007534012A5 (enExample)
EP2660654A1 (en) Infrared sensitive and chemical treatment free photosensitive composition and lithographic plate fabricated by using same
ATE388821T1 (de) Verfahren zur herstellung einer lithographischen druckplatte
DE602005006482D1 (de) Flachdruckplattenvorläufer und Flachdruckverfahren
EP1975710A3 (en) Plate-making method of lithographic printing plate precursor
EP1457837A3 (en) Developing solution for heat-sensitive lithographic printing plate precursor and method for peparing lithographic printing plate
WO2018033115A1 (zh) 一种可成像涂层、热敏阴图平版印刷版及其制版方法
CN113942289B (zh) 一种用于光敏阴图型平版印刷版的可成像组合物及其制版方法
EP1602982A3 (en) method of producing a lithographic printing plate and planographic printing method
JPS63316851A (ja) 感光材料上に像を形成する方法
ZA200304677B (en) Heat-sensitive composition in which removal of the unexposed regions is unnecessary, negative lithographic plate coated with the said composition and method for forming a negative image on the said plate.
WO2023071054A1 (zh) 一种光敏阴图型平版印刷版前体及其利用该前体形成平版印刷版制版方法
ATE520529T1 (de) Lithographischer druckplattenvorläufer und verfahren zur herstellung einer lithographischen druckplatte
WO2005106597A3 (en) Photopolymer plate and method for imaging the surface of a photopolymer plate
JP2007114255A (ja) 感光性樹脂印刷版原版およびその製造方法
EP1470914A3 (en) Image forming method and image exposure device
ATE363400T1 (de) Flachdruckverfahren und flachdruckplattenvorläufer.
EP1346847A3 (en) Printing press, and apparatus and process for regenerating printing plate
DE602005013399D1 (de) Verfahren zur Herstellung einer lithographischen Druckplatte