JP6368049B2 - 融除破片を減少させる新システム - Google Patents
融除破片を減少させる新システム Download PDFInfo
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- JP6368049B2 JP6368049B2 JP2017525960A JP2017525960A JP6368049B2 JP 6368049 B2 JP6368049 B2 JP 6368049B2 JP 2017525960 A JP2017525960 A JP 2017525960A JP 2017525960 A JP2017525960 A JP 2017525960A JP 6368049 B2 JP6368049 B2 JP 6368049B2
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- lithographic
- acid
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- printing plate
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- 150000003077 polyols Chemical class 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920001447 polyvinyl benzene Polymers 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000001454 recorded image Methods 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 1
- 150000003455 sulfinic acids Chemical class 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- AUHHYELHRWCWEZ-UHFFFAOYSA-N tetrachlorophthalic anhydride Chemical compound ClC1=C(Cl)C(Cl)=C2C(=O)OC(=O)C2=C1Cl AUHHYELHRWCWEZ-UHFFFAOYSA-N 0.000 description 1
- RLQWHDODQVOVKU-UHFFFAOYSA-N tetrapotassium;silicate Chemical compound [K+].[K+].[K+].[K+].[O-][Si]([O-])([O-])[O-] RLQWHDODQVOVKU-UHFFFAOYSA-N 0.000 description 1
- 230000008542 thermal sensitivity Effects 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000011071 total organic carbon measurement Methods 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3007—Imagewise removal using liquid means combined with electrical means, e.g. force fields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
赤外線レーザーのダイオードは、より短時間のピクセル滞留時間におけるエネルギー需要量をもたらす、平版表面における高い電力密度を提供することができる。しかし、いわゆる非融除性感熱平版、すなわち融除により画像を形成するようにはなっていない平版の、このような高い電力の暴露は、被膜の部分的融除をもたらすことが認められている。例えば暴露装置の電子機器および光学機器の汚染のような融除破片の発生に関連する問題を考慮すると、この現象は回避されなければならない。
境、例えば、レーザー照射装置の光学機器および電子機器、の汚染が回避される。この目的は、請求項1に規定されるシステムにより実現される。請求項1のシステムは本質的に、レーザー照射装置および、印刷版前駆体の被膜表面を静電気的に荷電させることができる装置、を含む。
本発明のシステムは、レーザー照射装置および、印刷版前駆体の被膜の表面を静電気的に荷電させることができる装置、を含む。この装置は更に、「静電発電機(electrostatic generator)」とも呼ばれる。静電発電機は一般に、当該技術分野で知られるように、本明細書でプレートセッターとも言及されるレーザー照射装置内に、容易に一体化されることができる小型の便利な装置である。静電発電機は好適には、レーザーが平版を画像化する前そして/またはそれと同時に、結像領域が荷電されるように取り付けられる。言い換えると、前駆体の被膜は好適には、最初に静電気的に荷電され、次に照射されるか、または同時に荷電されそして照射される。あるいはまた、印刷版前駆体の被膜は、前駆体がプレートセッター上に取り付けられる前に静電気的に荷電される。
/m2〜3.5g/m2間である。
層または絶縁層として働くことができ、それにより、レーザー照射装置内でその上に前駆体が取り付けられているドラムまたは平台が、静電発電機を使用して被膜の表面を、それぞれ正または負に静電気的に荷電する時に、それぞれ負または正に逆荷電されることができる。
感熱性の印刷版前駆体の結像機序は、熱に対する直接の暴露により、例えば、サーマルヘッドにより、または光、より好適には赤外光を熱に変換することができる被膜中の1種以上の化合物の光吸収により引き金を引かれることができる。これらの感熱性の平版印刷版前駆体は好適には、可視光線に感受性でない、すなわち現像剤中の被膜の溶解速度に対する実質的な効果は可視光線に対する暴露により誘発されない。最も好適には、被膜は外界の日光には感受性でない。
494号、同第770 495号、同第770 497号、同第773 112号、同第774 364号、同第849 090号、同第1 614 538号、同第1 614 539号、同第1 614 540号、同第1 777 067号、同第1 767
349号明細書、国際公開第2006/037716号、同第2006/133741号および同第2007/045515号パンフレットに記載の通りの、好適には親水性結合剤中に分散された疎水性の熱可塑性ポリマー粒子の熱誘発凝結(coalescence)に基づく前駆体である。好適な態様に従うと、熱可塑性ポリマー粒子は1:1〜5:1(スチレン:アクリロニトリル)間の重量比、例えば2:1の比率のスチレンとアクリロニトリル単位を含む。適切な親水性結合剤の例は、ビニルアルコール、アクリルアミド、メチロールアクリルアミド、メチロールメタクリルアミド、アクリル酸、メタクリル酸、ヒドロキシエチルアクリレート、ヒドロキシエチルメタクリレートのホモポリマーおよびコポリマー、並びにマレイン酸無水物/ビニルメチルエーテルコポリマーである。
ンクロリド、スチレン、α−メチルスチレン等のようなビニルモノマーとの、アリールジアゾスルホネートモノマーの単独重合(homopolymerization)または共重合により調製することができる化合物である。適切なアリールジアゾスルホネートモノマーは、欧州特許第339393号、同第507008号および同第771645号明細書に開示され、そして適切なアリールジアゾスルホネートポリマーは、欧州特許第507,008号、同第960,729号、同第960,730号および同第1,267,211号明細書に開示されている。
446号明細書に記載された修正樹脂、特に、前記フェノール樹脂のフェニル基が構造
− N=N−Q[ここで、−N=N−基はフェニル基の炭素原子に共有結合され、そしてQは芳香族基である]をもつ基で置換された樹脂、が好適である。
(i)−NR−SO2−、−SO2−NR−または−SO2−NR’R”のようなスルホンアミド基、ここでRおよびR’は独立して、水素または、場合により置換されたアルキル、アリールもしくはヘテロアリール基のような、場合により置換された炭化水素基を表わし、これらのポリマーに関する更なる詳細は欧州特許第2 159 049号明細書に認めることができ、
(ii)例えば、米国特許第6,573,022号明細書に開示された通りの、−SO2−NH−CO−または−SO2−NH−SO2−のような酸水素原子を含むスルホンアミド基、これらの化合物の適切な例は、例えばN−(p−トルエンスルホニル)メタクリルアミドおよびN−(p−トルエンスルホニル)アクリルアミドを含み、
(iii)−NH−CO−NH−のような尿素基、これらのポリマーに関する更なる詳細は国際公開第01/96119号パンフレットに認めることができ、
(iv)欧州特許第2 497 639号明細書に記載された通りの、少なくとも3つのポリマー連鎖がコアに結合された星形ポリマー、
(v)カルボン酸基、
(vi)ニトリル基、
(vii)スルホン酸基、および/または
(viii)リン酸基、
のリストから選択することができる。
−ヒドロキシプロピル)−エチレンジアミン、3−[(2−ヒドロキシエチル)フェニルアミノ]プロピオニトリルおよびヘキサヒドロ−1,3,5−トリス(2−ヒドロキシエチル)−s−トリアジンである。好適には、N,N,N’,N’−テトラキス(2−ヒドロキシプロピル)エチレンジアミンが使用される。これらの化合物の2種以上の混合物もまた有用である。塩基性窒素含有有機化合物はBASF(ドイツ)およびAldrichChemical Company(Milwaukee,WI)を含む多数の販売元から得ることができる。
的には遅れず、それにより、暴露領域と非暴露領域間に溶解の大きな差が得られる。例えば欧州特許第823 327号明細書および国際公開第97/39894号パンフレットに記載された化合物は、被膜中の、アルカリ可溶性樹脂との例えば水素架橋形成による相互反応により、溶解阻害剤として働く。このタイプの阻害剤は典型的には、少なくとも一つの芳香族基並びに、複素環式リングの一部であることができる窒素原子またはアミノ置換基、オニウム基、カルボニル、スルフィニルまたはスルホニル基のような水素結合サイト、を含む有機化合物である。このタイプの適切な溶解阻害剤は、例えば欧州特許第825 927号および同第823 327号明細書に開示されている。以下に言及される幾つかの化合物、例えばシアニンのような赤外染料(infrared dyes)および第四級化トリアリールメタン染料のような対比染料(contrast dye)もまた、溶解阻害剤として働くことができる。
ンオキシドを含むコポリマーを含む。
agents)として働く。あるいはまた、撥水性ポリマーまたはコポリマーは別の溶液中に適用されて、1枚または場合により2枚以上の層を含む被膜の上部上に塗布されることができる。その態様においては、上記別の溶液では他の層に存在する成分を溶解できない溶媒を使用して、被膜の上部に高度に濃厚な撥水性相が得られるようにするのが有利であり得る。
ば国際公開第2006/005688号パンフレットに記載の通りに、特定の添加剤と組み合わせると、被膜をごく僅かに着色するが、暴露後には強度に着色される染料もまた、着色剤として使用することができる。とりわけ、機械的損傷から、感熱性および/または感光性の印刷版前駆体の被膜表面を保護するために、場合により、更に保護層を適用することができる。保護層は一般に、ポリビニルアルコール、ポリビニルピロリドン、部分加水分解ポリビニルアセテート、ゼラチン、炭水化物またはヒドロキシエチルセルロースのような少なくとも1種の水溶性結合剤を含み、そして、必要な場合には、少量−すなわち、保護層に対する被膜の溶剤の総重量に基づいて5重量%未満−の有機溶剤を含むことができる、水溶液または分散液からのようなあらゆる知られた方法で生成されることができる。保護層の厚さは適切には、あらゆる量、好都合には5.0μmまで、好適には0.1〜3.0μm、特に好適には0.15〜1.0μmであることができる。
前記の感熱材料に加えて、更に感光性被膜を使用することができる。このような平版の典型的な例は、UV−感受性「PS」平版および、光に対する暴露時に硬化する光重合可能な組成物を含むいわゆる感光ポリマー(photopolymer)の平版である。
ルフェート、4−アミノジフェニルアミン・ジアゾニウムクロリド、4−ピペリジノアニリン・ジアゾニウムスルフェート、4−ジエチルアミノアニリン・ジアゾニウムスルフェートおよびジアゾジフェニルアミンとホルムアルデヒドとのオリゴマー縮合生成物:を含む。ジアゾ樹脂の例は、感光性物質として芳香族ジアゾニウム塩の縮合生成物を含む。このような縮合生成物は、例えば、ドイツ特許第1 214 086号明細書に記載されている。感光性または感熱性層は好適には、更に、結合剤、例えばポリビニルアルコールを含む。
現像されることができる。適切なガム状化溶液(gumming solution)は国際公開第2005/111727号パンフレットに記載されている。暴露工程後、結像前駆体はまた、印刷機上に直接取り付けられ、そしてインキおよび/または湿し水を適用することにより印刷機上で処理されることができる。このような平版の調製法は、国際公開第93/05446号パンフレット、米国特許第6,027,857号、同第6,171,735号、同第6,420,089号、同第6,071,675号、同第6,245,481号、同第6,387,595号、同第6,482,571号、同第6,576,401号、同第6,548,222号明細書、国際公開第03/087939号パンフレット、米国特許第2003/16577号および同第2004/13968号明細書に開示されている。
これらの印刷版前駆体の結像機序は、例えばサーマルヘッド(thermal head)による熱に対する直接的暴露により、または光、より好適には赤外光を熱に変換することができる被膜中の1種以上の化合物の光吸収により引き金を引かれることができる。印刷版前駆体は例えば、LEDまたはレーザーにより、赤外光に暴露されることができる。最も好適には、暴露に使用される光線は、半導体レーザーダイオード、Nd−YAGまたはNd−YLFレーザーのような、約750〜約1500nm、より好適には750〜1100nmの範囲の波長をもつ近赤外光を放射するレーザーである。
市販の印刷版前駆体Thermostar P970(745mm×605mm)を、Eastman Kodak Corp.から市販の、150rpmおよび2400dpiで稼働する、40Wの赤外線レーザーヘッド(830nm)をもつプレートセッターのCreo Trendsetterを使用して様々な(a range of)エネルギー密度において画像様に暴露して、200mJ/cm2を得た。記録された画像は0%のドットカバレッジを有した。
静電発電機を結像装置Creo Trendesetter(前記参照)上に設置した。SIMCO−ION
から市販のSIMCO線状6ピンナー電極DC正電荷静電発電機(positive electrostatic generator)を、接地されたドラムシリンダーから20〜30mmの距離で、レーザー台車(laser carriage)からできるだけ遠くのレーザーヘッド上に取付けた。静電発電機から平版表面までの最適な距離は実験により確定される。適切に調整されると、融除粉塵(ablation dust)の形成は減少/防止され、そして電極から印刷版への火花連絡(spark−over)は起こらない。
市販の印刷版前駆体P970の融除動態を下記の融除試験法に従って試験した。融除試験の結果は以下の写真および表2に示される。
第1の工程において、融除粉塵(dust)を「急速フィルター回収(Fast Filter Collection(FFC)」法により回収する。その後、「総有機炭素(TOC)」測定が、版の面積当りの放出固形粉塵の重量の詳細な値(例えば、炭素のm
g/m2)を提供する。
急速フィルター回収(FFC)法を、Eastman Kodak Corp.から市販の、140rpmおよび2400dpiで作動する、20Wの赤外線レーザーヘッド(830nm)をもつプレートセッターのCreo Trendsetter上で実施する。
TOC分析はFFC法により得られるサンプル中に存在する全有機炭素原子の総重量を提供する定量法である。融除現象により暴露工程中に放出された炭素原子の量−すなわち炭素のmg/m2−が得られ、融除の度合いについての概念を与える。
ISO NBN EN 15936/2012:スラッジ、処理済み生物廃棄物、土壌および廃棄物−乾式燃焼による総有機炭素(TOC)の決定。
暴露工程時またはその直前に、静電発電機を起動して、それぞれ10μA、15μAおよび20μAの電流を発生した。対照サンプルとして、静電発電機を起動せずに同様な暴露工程を実施した。急速フィルター回収法の結果は、以下の写真および以下の表2のTOC分析に示される。
Claims (5)
- 画像を形成するための、レーザービームを発生するためのレーザーヘッドを含むプレートセッターを含み、
該プレートセッターが更に、被膜の表面を静電気的に荷電することができる静電発電機を含むことを特徴とする、
支持体上の被膜を含む感熱性および/または感光性印刷版前駆体を暴露するためのシステム。 - 被膜の表面が、正または負に静電気的に荷電される、請求項1記載のシステム。
- 静電発電機が少なくとも1本の荷電バーおよび1基のDC高電圧発電機を含む、請求項1記載のシステム。
- DC高電圧発電機が0.5μA以上の電流を発生する、請求項3記載のシステム。
- 前記荷電バーが一つ以上のピンナー電極(pinner electrode)を含む、請求項3または4記載のシステム。
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PCT/EP2015/077647 WO2016091589A1 (en) | 2014-12-08 | 2015-11-25 | A novel system for reducing ablation debris |
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2014
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- 2014-12-08 EP EP14196734.9A patent/EP3032334B1/en not_active Not-in-force
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- 2015-11-25 CN CN201580066875.4A patent/CN107000425B/zh not_active Expired - Fee Related
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EP3032334A1 (en) | 2016-06-15 |
EP3032334B1 (en) | 2017-10-18 |
CN107000425B (zh) | 2019-05-03 |
JP2018508377A (ja) | 2018-03-29 |
US10369777B2 (en) | 2019-08-06 |
CN107000425A (zh) | 2017-08-01 |
US20170326869A1 (en) | 2017-11-16 |
WO2016091589A1 (en) | 2016-06-16 |
ES2655798T3 (es) | 2018-02-21 |
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