JP4202246B2 - 潜在性酸を含有するポリマー材料 - Google Patents
潜在性酸を含有するポリマー材料 Download PDFInfo
- Publication number
- JP4202246B2 JP4202246B2 JP2003503680A JP2003503680A JP4202246B2 JP 4202246 B2 JP4202246 B2 JP 4202246B2 JP 2003503680 A JP2003503680 A JP 2003503680A JP 2003503680 A JP2003503680 A JP 2003503680A JP 4202246 B2 JP4202246 B2 JP 4202246B2
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- JP
- Japan
- Prior art keywords
- alkyl
- copolymers
- styrene
- acid
- ethylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G14/00—Condensation polymers of aldehydes or ketones with two or more other monomers covered by at least two of the groups C08G8/00 - C08G12/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
- B41M5/333—Colour developing components therefor, e.g. acidic compounds
- B41M5/3333—Non-macromolecular compounds
- B41M5/3335—Compounds containing phenolic or carboxylic acid groups or metal salts thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
- C07D277/62—Benzothiazoles
- C07D277/68—Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
- C07D277/70—Sulfur atoms
- C07D277/72—2-Mercaptobenzothiazole
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
- C09B67/0077—Preparations with possibly reduced vat, sulfur or indigo dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
- B41M5/337—Additives; Binders
- B41M5/3375—Non-macromolecular compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
A環は、1個以上のヘテロ原子を含有することができ、および/または縮合環(anelated ring)を含有することができ、
R1は、水素、アルキル、好ましくはC1〜C20アルキル、アルケニル、好ましくはC2〜C20アルケニル、アリール、好ましくはフェニル、またはC1〜C4アルキルもしくはC1〜C4アルコキシで1〜3回置換されているフェニルであり、
R2、R3、R4およびR5は、互いに独立して水素または官能性置換基であり、そして
Rは、C1〜C6アルキル、−Z1−Q1、または−Z2−Q2を表し、
ここで、
Z1は、単結合、S、NHまたはOであり、そして
Q1は、C、S、OおよびNから選ばれる環原子5〜9個を有し、その環系中で少なくとも2個、好ましくは少なくとも3個、より好ましくは少なくとも4個が炭素原子である複素環系があり、好ましくはQ1は、モルホリン、ピリジン(これは、C1〜C4アルキルまたはヒドロキシで1〜3回置換されていてよい)、メルカプトベンゾオキサゾール、メルカプトベンゾチアゾールを表し、
またここで、
Z2は、C1〜C4アルキレン(これは、C1〜C4アルキルまたはQ3で置換されていることができる)を表し、ここでQ3はフェニル(これは、C1〜C4アルキル、ヒドロキシ、C5〜C8シクロアルキルおよび/またはC、S、OおよびNから選ばれる環原子5〜9個を有し、その環系中で少なくとも2個、好ましくは少なくとも3個、より好ましくは少なくとも4個が炭素原子である複素環系)で1〜3回置換されていることができる)を表し、そして
Q2は、フェニルC1〜C4アルキル、ヒドロキシ、C5〜C8シクロアルキルおよび/またはC、S、OおよびNから選ばれる環原子5〜9個を有し、その環系で少なくとも2個、好ましくは少なくとも3個、より好ましくは少なくとも4個が炭素原子である複素環系)で1〜3回置換されていることができるを表すが、
ただし、Rに対してα−位置にある炭素原子における水素原子は光照射によって分裂しうる)
で示される化合物である。
Q2は、フェニルまたは4−ヒドロキシ−3−イソプロピル−6−メチルフェニル、4−ヒドロキシ−3−tert−ブチル−6−メチルフェニル、または4−ヒドロキシ−3−シクロヘキシル−6−メチルフェニルを表す。
(式中、
A環は、フェニルまたはピリジルであり、
R1は、水素であり、
R2およびR3は、互いに独立してC1〜C4アルキルであり、
R4およびR5は、それぞれ水素であり、そして
Rは、窒素、酸素または硫黄原子を介してCHR1基に結合している複素環基であるか、または非置換もしくは置換されているC1〜C6アルキルである)
で示される潜在性酸を含有する。
1.モノオレフィン類およびジオレフィン類のポリマー、たとえばポリプロピレン、ポリイソブチレン、ポリブタ−1−エン、ポリ−4−メチルペンタ−1−エン、ポリビニルシクロヘキサン、ポリイソプレンまたはポリブタジエン、およびシクロオレフィン類、たとえばシクロペンテンまたはノルボルネンのポリマー、ポリエチレン(場合により架橋されうる)、たとえば高密度ポリエチレン(HDPE)、高密度高分子量ポリエチレン(HDPE−HMW)、高密度超高分子量ポリエチレン(HDPE−UHMW)、中密度ポリエチレン(MDPE)、低密度ポリエチレン(LDPE)、線状低密度ポリエチレン(LLDPE)、(VLDPE)および(ULDPE)。
a)ラジカル重合(通常、高温高圧下における)。
反応用フラスコに、メルカプトベンゾチアゾール16.7g、2−tert−ブチル−5−メチルフェノール16.4g、パラホルムアルデヒド3.0gおよびジブチルアミン1mLを仕込んだ。混合物を120℃に加熱し、この温度で6時間保持した。室温に冷却後、エタノール75mLを加えた。次に、混合物を2時間加熱還流させ、次に20℃に冷却してろ過した。生成物を熱メタノールと一緒に摩砕し、融点177.9〜183.9℃を有する生成物を得た。この生成物は下記の式のものであった:
2−tert−ブチル−5−メチルフェノールをチモール15.0gに代えて、例1を繰り返した結果、下記の式の化合物を得た:
ポリカーボネート100部、および例1記載の潜在性酸1部および下記式:
例3と同様な方法で、以下の潜在性酸をポリカーボネートに混合した:
Claims (8)
- 潜在性酸を0.001〜10重量%含有する、請求項1記載のポリマー材料。
- さらなる成分として、安定剤、酸化防止剤または軟化剤を含有する、請求項1または2のいずれか1項記載のポリマー材料。
- 潜在性酸を含有するポリマー材料をUV光で照射することを特徴とする、請求項1〜3のいずれか1項記載の潜在性酸含有ポリマー材料を、酸含有ポリマー材料に変換する方法。
- 光照射を、285〜400nmのUV光を用いるUVレーザーにより実行する、請求項4記載の方法。
- 請求項4または5のいずれか1項記載の方法によって得られるポリマー材料。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0114265.2A GB0114265D0 (en) | 2001-06-12 | 2001-06-12 | Polymeric material containing a latent acid |
PCT/EP2002/006109 WO2002100914A2 (en) | 2001-06-12 | 2002-06-04 | Polymeric material, containing a latent acid |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005501135A JP2005501135A (ja) | 2005-01-13 |
JP4202246B2 true JP4202246B2 (ja) | 2008-12-24 |
Family
ID=9916403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003503680A Expired - Fee Related JP4202246B2 (ja) | 2001-06-12 | 2002-06-04 | 潜在性酸を含有するポリマー材料 |
Country Status (14)
Country | Link |
---|---|
US (4) | US7150958B2 (ja) |
EP (1) | EP1468331B1 (ja) |
JP (1) | JP4202246B2 (ja) |
KR (1) | KR100901278B1 (ja) |
CN (1) | CN100480853C (ja) |
BR (1) | BR0210348A (ja) |
CA (1) | CA2447235A1 (ja) |
CZ (1) | CZ200444A3 (ja) |
GB (1) | GB0114265D0 (ja) |
IL (1) | IL158748A0 (ja) |
MX (1) | MXPA03010801A (ja) |
TW (1) | TW591043B (ja) |
WO (1) | WO2002100914A2 (ja) |
ZA (1) | ZA200308560B (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE60239457D1 (de) | 2001-06-06 | 2011-04-28 | Spectra Systems Corp | Markieren und authentisieren von artikeln |
US7393623B2 (en) | 2001-06-06 | 2008-07-01 | Spectra Systems Corporation | Incorporation of markings in optical media |
GB0114266D0 (en) * | 2001-06-12 | 2001-08-01 | Ciba Sc Holding Ag | Laser marking method |
GB0228647D0 (en) * | 2002-12-09 | 2003-01-15 | Ciba Sc Holding Ag | Polyeric material containing a latent acid |
KR101193824B1 (ko) * | 2004-07-20 | 2012-10-24 | 시바 홀딩 인크 | 옥심 유도체 및 잠산으로서의 이의 용도 |
JP2009507977A (ja) | 2005-09-15 | 2009-02-26 | チバ ホールディング インコーポレーテッド | 潜在性活性剤を含む基材マーキング用コーティング組成物 |
KR20080091285A (ko) * | 2006-01-31 | 2008-10-09 | 시바 홀딩 인크 | 기재 표시용 피복 조성물 |
EP2054769A1 (en) * | 2006-08-24 | 2009-05-06 | Ciba Holding Inc. | Uv-dosis indicators |
MX2009009394A (es) | 2007-03-15 | 2009-09-11 | Basf Se | Composiciones de revestimiento sensibles al calor a base de derivados de resorcinil triazina. |
CN101755019A (zh) * | 2007-07-18 | 2010-06-23 | 巴斯夫欧洲公司 | 涂料组合物 |
US9333786B2 (en) | 2007-07-18 | 2016-05-10 | Datalase, Ltd. | Laser-sensitive coating formulations |
WO2009024497A1 (en) * | 2007-08-22 | 2009-02-26 | Basf Se | Laser-sensitive coating composition |
CA2702732A1 (en) | 2007-11-07 | 2009-05-14 | Basf Se | New fiber products |
RU2011120235A (ru) | 2008-10-23 | 2012-11-27 | Дейталейз Лимитед | Теплопоглощающие добавки |
US9267042B2 (en) | 2008-10-27 | 2016-02-23 | Datalase Ltd. | Coating composition for marking substrates |
US20120045624A1 (en) | 2008-10-27 | 2012-02-23 | Basf Se | Aqueous laser-sensitive composition for marking substrates |
WO2010112408A1 (en) | 2009-03-30 | 2010-10-07 | Basf Se | Uv-dose indicator films |
JP6447298B2 (ja) * | 2015-03-26 | 2019-01-09 | Jsr株式会社 | 表示素子用の硬化膜形成用組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法、表示素子及び表示素子の製造方法 |
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GB8804457D0 (en) | 1988-02-25 | 1988-03-23 | Ciba Geigy Ag | Compositions |
US5677107A (en) * | 1991-10-02 | 1997-10-14 | Spectra Group Limited, Inc. | Production of three-dimensional objects |
JP2751089B2 (ja) | 1992-11-30 | 1998-05-18 | 大日本インキ化学工業株式会社 | レーザーマーキング方法及び印刷インキ |
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JPH08240908A (ja) * | 1994-12-29 | 1996-09-17 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物、それを用いた感光性平版印刷版、および平版印刷用版材の製造方法 |
US5885746A (en) | 1994-12-29 | 1999-03-23 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate |
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GB0004436D0 (en) * | 2000-02-25 | 2000-04-12 | Clariant Int Ltd | Synergistic stabilizer compositions for thermoplastic polymers in prolonged contact with water |
TWI255393B (en) * | 2000-03-21 | 2006-05-21 | Hitachi Chemical Co Ltd | Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern and process for producing printed wiring board |
US6635400B2 (en) * | 2000-04-17 | 2003-10-21 | Shin-Etsu Chemical Co., Ltd. | Resist composition and patterning process |
WO2002055149A2 (en) * | 2000-10-20 | 2002-07-18 | Photomedex | Controlled dose delivery of ultraviolet light for treating skin disorders |
TW200405128A (en) * | 2002-05-01 | 2004-04-01 | Shinetsu Chemical Co | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process |
-
2001
- 2001-06-12 GB GBGB0114265.2A patent/GB0114265D0/en not_active Ceased
-
2002
- 2002-06-04 BR BR0210348-6A patent/BR0210348A/pt not_active IP Right Cessation
- 2002-06-04 MX MXPA03010801A patent/MXPA03010801A/es not_active Application Discontinuation
- 2002-06-04 US US10/477,362 patent/US7150958B2/en not_active Expired - Fee Related
- 2002-06-04 CA CA002447235A patent/CA2447235A1/en not_active Abandoned
- 2002-06-04 JP JP2003503680A patent/JP4202246B2/ja not_active Expired - Fee Related
- 2002-06-04 IL IL15874802A patent/IL158748A0/xx unknown
- 2002-06-04 EP EP02754619A patent/EP1468331B1/en not_active Expired - Lifetime
- 2002-06-04 CZ CZ200444A patent/CZ200444A3/cs unknown
- 2002-06-04 WO PCT/EP2002/006109 patent/WO2002100914A2/en not_active Application Discontinuation
- 2002-06-04 CN CNB028113861A patent/CN100480853C/zh not_active Expired - Fee Related
- 2002-06-04 KR KR1020037016226A patent/KR100901278B1/ko not_active IP Right Cessation
- 2002-06-10 TW TW091112471A patent/TW591043B/zh not_active IP Right Cessation
-
2003
- 2003-11-03 ZA ZA200308560A patent/ZA200308560B/en unknown
-
2006
- 2006-11-06 US US11/593,372 patent/US20070054220A1/en not_active Abandoned
-
2009
- 2009-02-13 US US12/378,447 patent/US7655380B2/en not_active Expired - Fee Related
- 2009-12-14 US US12/637,202 patent/US8003297B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
IL158748A0 (en) | 2004-05-12 |
JP2005501135A (ja) | 2005-01-13 |
CZ200444A3 (cs) | 2004-07-14 |
CN100480853C (zh) | 2009-04-22 |
EP1468331A2 (en) | 2004-10-20 |
US7150958B2 (en) | 2006-12-19 |
WO2002100914A2 (en) | 2002-12-19 |
EP1468331B1 (en) | 2012-10-03 |
ZA200308560B (en) | 2004-05-21 |
US20070054220A1 (en) | 2007-03-08 |
BR0210348A (pt) | 2004-07-20 |
US20040157947A1 (en) | 2004-08-12 |
US7655380B2 (en) | 2010-02-02 |
CA2447235A1 (en) | 2002-12-19 |
WO2002100914A3 (en) | 2004-08-12 |
KR100901278B1 (ko) | 2009-06-09 |
GB0114265D0 (en) | 2001-08-01 |
TW591043B (en) | 2004-06-11 |
US20090155716A1 (en) | 2009-06-18 |
US20100093950A1 (en) | 2010-04-15 |
CN1592869A (zh) | 2005-03-09 |
US8003297B2 (en) | 2011-08-23 |
MXPA03010801A (es) | 2004-02-17 |
KR20040008219A (ko) | 2004-01-28 |
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