MXPA03010801A - Material polimerico que contiene un acido latente. - Google Patents
Material polimerico que contiene un acido latente.Info
- Publication number
- MXPA03010801A MXPA03010801A MXPA03010801A MXPA03010801A MXPA03010801A MX PA03010801 A MXPA03010801 A MX PA03010801A MX PA03010801 A MXPA03010801 A MX PA03010801A MX PA03010801 A MXPA03010801 A MX PA03010801A MX PA03010801 A MXPA03010801 A MX PA03010801A
- Authority
- MX
- Mexico
- Prior art keywords
- polymeric material
- latent acid
- acid
- latent
- irradiation
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G14/00—Condensation polymers of aldehydes or ketones with two or more other monomers covered by at least two of the groups C08G8/00 - C08G12/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
- B41M5/333—Colour developing components therefor, e.g. acidic compounds
- B41M5/3333—Non-macromolecular compounds
- B41M5/3335—Compounds containing phenolic or carboxylic acid groups or metal salts thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
- C07D277/62—Benzothiazoles
- C07D277/68—Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
- C07D277/70—Sulfur atoms
- C07D277/72—2-Mercaptobenzothiazole
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
- C09B67/0077—Preparations with possibly reduced vat, sulfur or indigo dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
- B41M5/337—Additives; Binders
- B41M5/3375—Non-macromolecular compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Material polimerico, que contiene un acido latente, que puede convertirse a un acido por irradiacion por un laser y opcionalmente adicionales ingredientes.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0114265.2A GB0114265D0 (en) | 2001-06-12 | 2001-06-12 | Polymeric material containing a latent acid |
PCT/EP2002/006109 WO2002100914A2 (en) | 2001-06-12 | 2002-06-04 | Polymeric material, containing a latent acid |
Publications (1)
Publication Number | Publication Date |
---|---|
MXPA03010801A true MXPA03010801A (es) | 2004-02-17 |
Family
ID=9916403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MXPA03010801A MXPA03010801A (es) | 2001-06-12 | 2002-06-04 | Material polimerico que contiene un acido latente. |
Country Status (14)
Country | Link |
---|---|
US (4) | US7150958B2 (es) |
EP (1) | EP1468331B1 (es) |
JP (1) | JP4202246B2 (es) |
KR (1) | KR100901278B1 (es) |
CN (1) | CN100480853C (es) |
BR (1) | BR0210348A (es) |
CA (1) | CA2447235A1 (es) |
CZ (1) | CZ200444A3 (es) |
GB (1) | GB0114265D0 (es) |
IL (1) | IL158748A0 (es) |
MX (1) | MXPA03010801A (es) |
TW (1) | TW591043B (es) |
WO (1) | WO2002100914A2 (es) |
ZA (1) | ZA200308560B (es) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ATE502383T1 (de) | 2001-06-06 | 2011-04-15 | Spectra Systems Corp | Markieren und authentisieren von artikeln |
US7393623B2 (en) | 2001-06-06 | 2008-07-01 | Spectra Systems Corporation | Incorporation of markings in optical media |
GB0114266D0 (en) * | 2001-06-12 | 2001-08-01 | Ciba Sc Holding Ag | Laser marking method |
GB0228647D0 (en) * | 2002-12-09 | 2003-01-15 | Ciba Sc Holding Ag | Polyeric material containing a latent acid |
KR101193824B1 (ko) * | 2004-07-20 | 2012-10-24 | 시바 홀딩 인크 | 옥심 유도체 및 잠산으로서의 이의 용도 |
WO2007031454A2 (en) | 2005-09-15 | 2007-03-22 | Ciba Specialty Chemicals Holding Inc. | Coating compositions comprising a latent activator for marking substrates |
KR20080091285A (ko) * | 2006-01-31 | 2008-10-09 | 시바 홀딩 인크 | 기재 표시용 피복 조성물 |
KR20090043591A (ko) * | 2006-08-24 | 2009-05-06 | 시바 홀딩 인크 | Uv-선량 표시기 |
US8865620B2 (en) | 2007-03-15 | 2014-10-21 | Datalase, Ltd. | Heat-sensitive coating compositions based on resorcinyl triazine derivatives |
WO2009010405A1 (en) | 2007-07-18 | 2009-01-22 | Basf Se | Laser-sensitive coating formulation |
KR20100063014A (ko) * | 2007-07-18 | 2010-06-10 | 바스프 에스이 | 피복 조성물 |
ES2377852T3 (es) * | 2007-08-22 | 2012-04-02 | Datalase Ltd | Composición de revestimiento sensible al láser |
JP5180315B2 (ja) | 2007-11-07 | 2013-04-10 | データレース リミテッド | 新規繊維製品 |
KR101691898B1 (ko) | 2008-10-23 | 2017-01-02 | 데이터레이즈 리미티드 | 열 흡수 첨가제 |
US20120045624A1 (en) | 2008-10-27 | 2012-02-23 | Basf Se | Aqueous laser-sensitive composition for marking substrates |
US9267042B2 (en) | 2008-10-27 | 2016-02-23 | Datalase Ltd. | Coating composition for marking substrates |
EP2414894B1 (en) | 2009-03-30 | 2014-02-12 | Basf Se | Uv-dose indicator films |
JP6447298B2 (ja) * | 2015-03-26 | 2019-01-09 | Jsr株式会社 | 表示素子用の硬化膜形成用組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法、表示素子及び表示素子の製造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4343885A (en) | 1978-05-09 | 1982-08-10 | Dynachem Corporation | Phototropic photosensitive compositions containing fluoran colorformer |
JPS58188689A (ja) * | 1982-04-28 | 1983-11-04 | Fuji Photo Film Co Ltd | 感熱記録紙 |
GB2120243B (en) | 1982-05-14 | 1986-05-08 | Ici Plc | Phenolic antioxidant |
US4631084A (en) * | 1983-01-17 | 1986-12-23 | Minnesota Mining And Manufacturing Company | Heat-sensitive composition and imaging sheet incorporating same |
AU612143B2 (en) | 1987-03-19 | 1991-07-04 | Xytronyx, Inc. | Systems for the visualization of exposure to ultraviolet radiation and for the utilization of ultraviolet radiation to effect color changes |
GB8804457D0 (en) | 1988-02-25 | 1988-03-23 | Ciba Geigy Ag | Compositions |
US5677107A (en) * | 1991-10-02 | 1997-10-14 | Spectra Group Limited, Inc. | Production of three-dimensional objects |
JP2751089B2 (ja) | 1992-11-30 | 1998-05-18 | 大日本インキ化学工業株式会社 | レーザーマーキング方法及び印刷インキ |
DE69418826T2 (de) * | 1993-11-22 | 1999-10-21 | Ciba Sc Holding Ag | Zusammensetzungen zur Herstellung strukturierter Farbbilder und deren Anwendung |
US5885746A (en) | 1994-12-29 | 1999-03-23 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate |
JPH08240908A (ja) * | 1994-12-29 | 1996-09-17 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物、それを用いた感光性平版印刷版、および平版印刷用版材の製造方法 |
US6589641B1 (en) * | 1998-06-04 | 2003-07-08 | Seagate Technology Llc | Thin films of crosslinked fluoropolymer on a carbon substrate |
US6316165B1 (en) * | 1999-03-08 | 2001-11-13 | Shipley Company, L.L.C. | Planarizing antireflective coating compositions |
GB0004436D0 (en) * | 2000-02-25 | 2000-04-12 | Clariant Int Ltd | Synergistic stabilizer compositions for thermoplastic polymers in prolonged contact with water |
TWI255393B (en) * | 2000-03-21 | 2006-05-21 | Hitachi Chemical Co Ltd | Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern and process for producing printed wiring board |
US6635400B2 (en) * | 2000-04-17 | 2003-10-21 | Shin-Etsu Chemical Co., Ltd. | Resist composition and patterning process |
AU2002245163A1 (en) * | 2000-10-20 | 2002-07-24 | Photomedex | Controlled dose delivery of ultraviolet light for treating skin disorders |
TW200405128A (en) * | 2002-05-01 | 2004-04-01 | Shinetsu Chemical Co | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process |
-
2001
- 2001-06-12 GB GBGB0114265.2A patent/GB0114265D0/en not_active Ceased
-
2002
- 2002-06-04 CZ CZ200444A patent/CZ200444A3/cs unknown
- 2002-06-04 US US10/477,362 patent/US7150958B2/en not_active Expired - Fee Related
- 2002-06-04 IL IL15874802A patent/IL158748A0/xx unknown
- 2002-06-04 KR KR1020037016226A patent/KR100901278B1/ko not_active IP Right Cessation
- 2002-06-04 CA CA002447235A patent/CA2447235A1/en not_active Abandoned
- 2002-06-04 MX MXPA03010801A patent/MXPA03010801A/es not_active Application Discontinuation
- 2002-06-04 BR BR0210348-6A patent/BR0210348A/pt not_active IP Right Cessation
- 2002-06-04 EP EP02754619A patent/EP1468331B1/en not_active Expired - Lifetime
- 2002-06-04 CN CNB028113861A patent/CN100480853C/zh not_active Expired - Fee Related
- 2002-06-04 JP JP2003503680A patent/JP4202246B2/ja not_active Expired - Fee Related
- 2002-06-04 WO PCT/EP2002/006109 patent/WO2002100914A2/en not_active Application Discontinuation
- 2002-06-10 TW TW091112471A patent/TW591043B/zh not_active IP Right Cessation
-
2003
- 2003-11-03 ZA ZA200308560A patent/ZA200308560B/en unknown
-
2006
- 2006-11-06 US US11/593,372 patent/US20070054220A1/en not_active Abandoned
-
2009
- 2009-02-13 US US12/378,447 patent/US7655380B2/en not_active Expired - Fee Related
- 2009-12-14 US US12/637,202 patent/US8003297B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
BR0210348A (pt) | 2004-07-20 |
WO2002100914A2 (en) | 2002-12-19 |
US7150958B2 (en) | 2006-12-19 |
US20070054220A1 (en) | 2007-03-08 |
TW591043B (en) | 2004-06-11 |
KR100901278B1 (ko) | 2009-06-09 |
GB0114265D0 (en) | 2001-08-01 |
IL158748A0 (en) | 2004-05-12 |
KR20040008219A (ko) | 2004-01-28 |
CA2447235A1 (en) | 2002-12-19 |
US20040157947A1 (en) | 2004-08-12 |
EP1468331B1 (en) | 2012-10-03 |
CN1592869A (zh) | 2005-03-09 |
EP1468331A2 (en) | 2004-10-20 |
US20100093950A1 (en) | 2010-04-15 |
US7655380B2 (en) | 2010-02-02 |
CZ200444A3 (cs) | 2004-07-14 |
US8003297B2 (en) | 2011-08-23 |
JP4202246B2 (ja) | 2008-12-24 |
JP2005501135A (ja) | 2005-01-13 |
US20090155716A1 (en) | 2009-06-18 |
ZA200308560B (en) | 2004-05-21 |
WO2002100914A3 (en) | 2004-08-12 |
CN100480853C (zh) | 2009-04-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FA | Abandonment or withdrawal |