JP4184813B2 - 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法 - Google Patents

感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法 Download PDF

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Publication number
JP4184813B2
JP4184813B2 JP2003008326A JP2003008326A JP4184813B2 JP 4184813 B2 JP4184813 B2 JP 4184813B2 JP 2003008326 A JP2003008326 A JP 2003008326A JP 2003008326 A JP2003008326 A JP 2003008326A JP 4184813 B2 JP4184813 B2 JP 4184813B2
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JP
Japan
Prior art keywords
photosensitive
printing plate
acid
photosensitive composition
lithographic printing
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003008326A
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English (en)
Japanese (ja)
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JP2003315995A5 (enExample
JP2003315995A (ja
Inventor
康弘 石塚
靖彦 児島
Original Assignee
コダックグラフィックコミュニケーションズ株式会社
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Priority to JP2003008326A priority Critical patent/JP4184813B2/ja
Priority to PCT/JP2003/001720 priority patent/WO2003071355A2/en
Priority to EP03742662A priority patent/EP1476786B1/en
Priority to DE60330843T priority patent/DE60330843D1/de
Priority to US10/370,385 priority patent/US6824947B2/en
Publication of JP2003315995A publication Critical patent/JP2003315995A/ja
Publication of JP2003315995A5 publication Critical patent/JP2003315995A5/ja
Application granted granted Critical
Publication of JP4184813B2 publication Critical patent/JP4184813B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C08L61/14—Modified phenol-aldehyde condensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/34—Condensation polymers of aldehydes or ketones with monomers covered by at least two of the groups C08L61/04, C08L61/18 and C08L61/20
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217—Polyurethanes; Epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP2003008326A 2002-02-19 2003-01-16 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法 Expired - Fee Related JP4184813B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2003008326A JP4184813B2 (ja) 2002-02-19 2003-01-16 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法
PCT/JP2003/001720 WO2003071355A2 (en) 2002-02-19 2003-02-18 Photosensitive composition, photosensitive planographic printing plate, and method for manufacturing planographic printing plate using the same
EP03742662A EP1476786B1 (en) 2002-02-19 2003-02-18 Photosensitive composition, photosensitive planographic printing plate, and method for manufacturing planographic printing plate using the same
DE60330843T DE60330843D1 (de) 2002-02-19 2003-02-18 Lichtempfindliche zusammensetzung, lichtempfindliche flachdruckplatte und verfahren zur herstellung einer flachdruckplatte damit
US10/370,385 US6824947B2 (en) 2002-02-19 2003-02-19 Photosensitive composition comprising a phenol resin having a urea bond in the main chain

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002042116 2002-02-19
JP2002-42116 2002-02-19
JP2003008326A JP4184813B2 (ja) 2002-02-19 2003-01-16 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法

Publications (3)

Publication Number Publication Date
JP2003315995A JP2003315995A (ja) 2003-11-06
JP2003315995A5 JP2003315995A5 (enExample) 2006-01-26
JP4184813B2 true JP4184813B2 (ja) 2008-11-19

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JP2003008326A Expired - Fee Related JP4184813B2 (ja) 2002-02-19 2003-01-16 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法

Country Status (5)

Country Link
US (1) US6824947B2 (enExample)
EP (1) EP1476786B1 (enExample)
JP (1) JP4184813B2 (enExample)
DE (1) DE60330843D1 (enExample)
WO (1) WO2003071355A2 (enExample)

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US7358032B2 (en) * 2002-11-08 2008-04-15 Fujifilm Corporation Planographic printing plate precursor
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JP4426526B2 (ja) 2003-07-17 2010-03-03 ハネウエル・インターナシヨナル・インコーポレーテツド 最新式のマイクロエレクトロニクス用途およびデバイス用の平坦化膜およびそれらの製造方法
US7611824B2 (en) * 2004-01-09 2009-11-03 Fujifilm Corporation Dummy plate precursor for planographic printing and method for producing printed plate and dummy plate
US7005227B2 (en) * 2004-01-21 2006-02-28 Intel Corporation One component EUV photoresist
RU2327195C1 (ru) * 2004-01-27 2008-06-20 Асахи Касеи Кемикалз Корпорейшн Фоточувствительная смола для гравируемой лазером печатной матрицы
JP4308687B2 (ja) * 2004-03-11 2009-08-05 富士フイルム株式会社 平版印刷版原版
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KR101232249B1 (ko) * 2004-08-10 2013-02-12 간또 가가꾸 가부시끼가이샤 반도체 기판 세정액 및 반도체 기판 세정방법
JP2006096838A (ja) * 2004-09-29 2006-04-13 Air Water Chemical Inc エポキシ樹脂の硬化剤、その組成物及びその用途
US6969579B1 (en) 2004-12-21 2005-11-29 Eastman Kodak Company Solvent resistant imageable element
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US7601482B2 (en) * 2006-03-28 2009-10-13 Az Electronic Materials Usa Corp. Negative photoresist compositions
US7704670B2 (en) * 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US20080131812A1 (en) * 2006-11-30 2008-06-05 Konica Minolta Medical & Graphic, Inc. Resin for printing plate material and lithographic printing plate material by use thereof
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JP6116954B2 (ja) * 2013-03-22 2017-04-19 旭化成株式会社 感光性樹脂組成物及び硬化レリーフパターンの製造方法
KR102344285B1 (ko) * 2014-02-12 2021-12-28 닛산 가가쿠 가부시키가이샤 불소함유 계면활성제를 포함하는 막형성 조성물
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Also Published As

Publication number Publication date
DE60330843D1 (de) 2010-02-25
US20030224281A1 (en) 2003-12-04
EP1476786A2 (en) 2004-11-17
WO2003071355A3 (en) 2004-04-22
EP1476786B1 (en) 2010-01-06
JP2003315995A (ja) 2003-11-06
WO2003071355A2 (en) 2003-08-28
US6824947B2 (en) 2004-11-30

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