JP2003315995A5 - - Google Patents
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- Publication number
- JP2003315995A5 JP2003315995A5 JP2003008326A JP2003008326A JP2003315995A5 JP 2003315995 A5 JP2003315995 A5 JP 2003315995A5 JP 2003008326 A JP2003008326 A JP 2003008326A JP 2003008326 A JP2003008326 A JP 2003008326A JP 2003315995 A5 JP2003315995 A5 JP 2003315995A5
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- composition according
- residue
- photosensitive
- main chain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003008326A JP4184813B2 (ja) | 2002-02-19 | 2003-01-16 | 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法 |
| DE60330843T DE60330843D1 (de) | 2002-02-19 | 2003-02-18 | Lichtempfindliche zusammensetzung, lichtempfindliche flachdruckplatte und verfahren zur herstellung einer flachdruckplatte damit |
| EP03742662A EP1476786B1 (en) | 2002-02-19 | 2003-02-18 | Photosensitive composition, photosensitive planographic printing plate, and method for manufacturing planographic printing plate using the same |
| PCT/JP2003/001720 WO2003071355A2 (en) | 2002-02-19 | 2003-02-18 | Photosensitive composition, photosensitive planographic printing plate, and method for manufacturing planographic printing plate using the same |
| US10/370,385 US6824947B2 (en) | 2002-02-19 | 2003-02-19 | Photosensitive composition comprising a phenol resin having a urea bond in the main chain |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002042116 | 2002-02-19 | ||
| JP2002-42116 | 2002-02-19 | ||
| JP2003008326A JP4184813B2 (ja) | 2002-02-19 | 2003-01-16 | 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003315995A JP2003315995A (ja) | 2003-11-06 |
| JP2003315995A5 true JP2003315995A5 (enExample) | 2006-01-26 |
| JP4184813B2 JP4184813B2 (ja) | 2008-11-19 |
Family
ID=27759642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003008326A Expired - Fee Related JP4184813B2 (ja) | 2002-02-19 | 2003-01-16 | 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6824947B2 (enExample) |
| EP (1) | EP1476786B1 (enExample) |
| JP (1) | JP4184813B2 (enExample) |
| DE (1) | DE60330843D1 (enExample) |
| WO (1) | WO2003071355A2 (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7358032B2 (en) * | 2002-11-08 | 2008-04-15 | Fujifilm Corporation | Planographic printing plate precursor |
| JP2004226472A (ja) * | 2003-01-20 | 2004-08-12 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| AU2003286758A1 (en) | 2003-07-17 | 2005-03-07 | Honeywell International Inc | Planarization films for advanced microelectronic applications and devices and methods of production thereof |
| ATE406260T1 (de) * | 2004-01-09 | 2008-09-15 | Fujifilm Corp | Verfahren zur herstellung einer planographischen druckplatte und einer blindplatte |
| US7005227B2 (en) * | 2004-01-21 | 2006-02-28 | Intel Corporation | One component EUV photoresist |
| EP1710093B1 (en) * | 2004-01-27 | 2013-11-20 | Asahi Kasei Chemicals Corporation | Photosensitive resin composition for laser engravable printing substrate |
| JP4308687B2 (ja) * | 2004-03-11 | 2009-08-05 | 富士フイルム株式会社 | 平版印刷版原版 |
| US7524605B2 (en) * | 2004-04-09 | 2009-04-28 | Fujifilm Corporation | Lithographic printing plate precursor and lithographic printing method |
| KR101232249B1 (ko) * | 2004-08-10 | 2013-02-12 | 간또 가가꾸 가부시끼가이샤 | 반도체 기판 세정액 및 반도체 기판 세정방법 |
| JP2006096838A (ja) * | 2004-09-29 | 2006-04-13 | Air Water Chemical Inc | エポキシ樹脂の硬化剤、その組成物及びその用途 |
| US6969579B1 (en) | 2004-12-21 | 2005-11-29 | Eastman Kodak Company | Solvent resistant imageable element |
| JP4738827B2 (ja) * | 2005-02-08 | 2011-08-03 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版 |
| US7601482B2 (en) * | 2006-03-28 | 2009-10-13 | Az Electronic Materials Usa Corp. | Negative photoresist compositions |
| US7704670B2 (en) * | 2006-06-22 | 2010-04-27 | Az Electronic Materials Usa Corp. | High silicon-content thin film thermosets |
| US20080131812A1 (en) * | 2006-11-30 | 2008-06-05 | Konica Minolta Medical & Graphic, Inc. | Resin for printing plate material and lithographic printing plate material by use thereof |
| US8026040B2 (en) | 2007-02-20 | 2011-09-27 | Az Electronic Materials Usa Corp. | Silicone coating composition |
| CN101622296B (zh) | 2007-02-27 | 2013-10-16 | Az电子材料美国公司 | 硅基抗反射涂料组合物 |
| JP5002399B2 (ja) * | 2007-09-28 | 2012-08-15 | 富士フイルム株式会社 | 平版印刷版原版の処理方法 |
| JP5444933B2 (ja) * | 2008-08-29 | 2014-03-19 | 富士フイルム株式会社 | ネガ型平版印刷版原版及びそれを用いる平版印刷方法 |
| TWI497200B (zh) * | 2008-09-19 | 2015-08-21 | Jsr Corp | 光阻圖型塗佈劑及光阻圖型之形成方法 |
| CN101762982B (zh) * | 2008-12-24 | 2013-03-13 | 成都新图新材料股份有限公司 | 一种红外阳图热敏平版印刷版 |
| EP2233288A1 (en) | 2009-03-23 | 2010-09-29 | Founder Fine Chemical Industry Co., Ltd. | Radiation sensitive composition and method for preparing radiation sensitive composition |
| KR20120066924A (ko) * | 2010-12-15 | 2012-06-25 | 제일모직주식회사 | 오르토-니트로벤질 에스테르 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물 |
| US8906594B2 (en) | 2012-06-15 | 2014-12-09 | Az Electronic Materials (Luxembourg) S.A.R.L. | Negative-working thick film photoresist |
| US9012126B2 (en) | 2012-06-15 | 2015-04-21 | Az Electronic Materials (Luxembourg) S.A.R.L. | Positive photosensitive material |
| JP6116954B2 (ja) * | 2013-03-22 | 2017-04-19 | 旭化成株式会社 | 感光性樹脂組成物及び硬化レリーフパターンの製造方法 |
| CN105940348B (zh) * | 2014-02-12 | 2019-12-06 | 日产化学工业株式会社 | 包含含有氟的表面活性剂的膜形成用组合物 |
| CN106029795B (zh) * | 2014-03-06 | 2019-04-19 | 株式会社Lg化学 | 胶版印刷组合物、使用该胶版印刷组合物的印刷方法和包括该胶版印刷组合物的图案 |
| JP6243010B2 (ja) * | 2014-03-31 | 2017-12-06 | 富士フイルム株式会社 | 感光性樹脂組成物、平版印刷版原版、及び、平版印刷版の作製方法 |
| WO2017038423A1 (ja) | 2015-08-31 | 2017-03-09 | 富士フイルム株式会社 | 感光性樹脂組成物、平版印刷版原版及び平版印刷版の製版方法 |
| TWI731961B (zh) | 2016-04-19 | 2021-07-01 | 德商馬克專利公司 | 正向感光材料及形成正向凸紋影像之方法 |
| KR102275345B1 (ko) * | 2018-05-16 | 2021-07-09 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 전자 소자 |
| CN112654928B (zh) | 2018-09-05 | 2024-09-24 | 默克专利股份有限公司 | 正型光敏材料 |
| US20200096865A1 (en) * | 2018-09-21 | 2020-03-26 | Eastman Kodak Company | Lithographic printing plate precursor and color-forming composition |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3076789A (en) * | 1957-07-23 | 1963-02-05 | Du Pont | Polyamides from diamines having two deuterium atoms on both chain carbons alpha to the two amino nitrogens |
| US3072595A (en) * | 1959-12-24 | 1963-01-08 | Union Carbide Corp | Punk resistant, water-dilutable binder compositions comprising a phenolic resole anda polymeric condensation product of an alkyl ether of dimethylol urea, and mineral fibers bonded therewith |
| DE1447963B2 (de) | 1965-11-24 | 1972-09-07 | KaIIe AG, 6202 Wiesbaden Biebnch | Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial |
| AT293449B (de) | 1965-11-24 | 1971-10-11 | Kalle Ag | Verfahren zum Herstellen einer Offsetdruckplatte aus vorsensibilisiertem Druckplattenmaterial |
| US4757108A (en) * | 1986-06-18 | 1988-07-12 | Borden, Inc. | Water soluble phenolic resole-urea composition |
| JPH0727208B2 (ja) | 1987-04-20 | 1995-03-29 | 富士写真フイルム株式会社 | 感光性組成物 |
| JPH07120041B2 (ja) | 1987-05-21 | 1995-12-20 | 富士写真フイルム株式会社 | 感光性組成物 |
| JP2631143B2 (ja) | 1989-03-16 | 1997-07-16 | 富士写真フイルム株式会社 | 光重合性組成物 |
| US5340699A (en) * | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
| JP3583217B2 (ja) | 1995-04-11 | 2004-11-04 | コダックポリクロームグラフィックス株式会社 | 感光性組成物及び感光性平版印刷版 |
| JP3556756B2 (ja) | 1995-04-11 | 2004-08-25 | コダックポリクロームグラフィックス株式会社 | 感光性組成物及び感光性平版印刷版 |
| US5731127A (en) * | 1995-04-11 | 1998-03-24 | Dainippon Ink And Chemicals, Inc. | Photosensitive composition and photosensitive planographic printing plate having a resin with urea bonds in the side chain |
| JP2000181059A (ja) | 1998-10-07 | 2000-06-30 | Mitsubishi Chemicals Corp | 感光性組成物、画像形成材料及びそれを用いた画像形成方法 |
| JP2000199950A (ja) | 1999-01-07 | 2000-07-18 | Konica Corp | 画像形成材料及びそれを用いた画像形成方法 |
| JP2000330265A (ja) | 1999-05-24 | 2000-11-30 | Fuji Photo Film Co Ltd | 画像形成材料 |
| US6294311B1 (en) * | 1999-12-22 | 2001-09-25 | Kodak Polychrome Graphics Llc | Lithographic printing plate having high chemical resistance |
-
2003
- 2003-01-16 JP JP2003008326A patent/JP4184813B2/ja not_active Expired - Fee Related
- 2003-02-18 EP EP03742662A patent/EP1476786B1/en not_active Expired - Lifetime
- 2003-02-18 WO PCT/JP2003/001720 patent/WO2003071355A2/en not_active Ceased
- 2003-02-18 DE DE60330843T patent/DE60330843D1/de not_active Expired - Lifetime
- 2003-02-19 US US10/370,385 patent/US6824947B2/en not_active Expired - Lifetime
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