DE60330843D1 - Lichtempfindliche zusammensetzung, lichtempfindliche flachdruckplatte und verfahren zur herstellung einer flachdruckplatte damit - Google Patents

Lichtempfindliche zusammensetzung, lichtempfindliche flachdruckplatte und verfahren zur herstellung einer flachdruckplatte damit

Info

Publication number
DE60330843D1
DE60330843D1 DE60330843T DE60330843T DE60330843D1 DE 60330843 D1 DE60330843 D1 DE 60330843D1 DE 60330843 T DE60330843 T DE 60330843T DE 60330843 T DE60330843 T DE 60330843T DE 60330843 D1 DE60330843 D1 DE 60330843D1
Authority
DE
Germany
Prior art keywords
light
pressure plate
flat pressure
sensitive
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60330843T
Other languages
English (en)
Inventor
Yasuhiro Ishizuka
Yasuhiko Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphic Communications Japan Ltd
Original Assignee
Kodak Graphic Communications Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphic Communications Japan Ltd filed Critical Kodak Graphic Communications Japan Ltd
Application granted granted Critical
Publication of DE60330843D1 publication Critical patent/DE60330843D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C08L61/14—Modified phenol-aldehyde condensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/34—Condensation polymers of aldehydes or ketones with monomers covered by at least two of the groups C08L61/04, C08L61/18 and C08L61/20
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217—Polyurethanes; Epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
DE60330843T 2002-02-19 2003-02-18 Lichtempfindliche zusammensetzung, lichtempfindliche flachdruckplatte und verfahren zur herstellung einer flachdruckplatte damit Expired - Lifetime DE60330843D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002042116 2002-02-19
JP2003008326A JP4184813B2 (ja) 2002-02-19 2003-01-16 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法
PCT/JP2003/001720 WO2003071355A2 (en) 2002-02-19 2003-02-18 Photosensitive composition, photosensitive planographic printing plate, and method for manufacturing planographic printing plate using the same

Publications (1)

Publication Number Publication Date
DE60330843D1 true DE60330843D1 (de) 2010-02-25

Family

ID=27759642

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60330843T Expired - Lifetime DE60330843D1 (de) 2002-02-19 2003-02-18 Lichtempfindliche zusammensetzung, lichtempfindliche flachdruckplatte und verfahren zur herstellung einer flachdruckplatte damit

Country Status (5)

Country Link
US (1) US6824947B2 (de)
EP (1) EP1476786B1 (de)
JP (1) JP4184813B2 (de)
DE (1) DE60330843D1 (de)
WO (1) WO2003071355A2 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7358032B2 (en) * 2002-11-08 2008-04-15 Fujifilm Corporation Planographic printing plate precursor
JP2004226472A (ja) * 2003-01-20 2004-08-12 Fuji Photo Film Co Ltd 平版印刷版原版
WO2005017617A1 (en) 2003-07-17 2005-02-24 Honeywell International Inc. Planarization films for advanced microelectronic applications and devices and methods of production thereof
EP1552954B1 (de) * 2004-01-09 2008-05-28 FUJIFILM Corporation Blindplattenvorläufer für Flachdruck
US7005227B2 (en) * 2004-01-21 2006-02-28 Intel Corporation One component EUV photoresist
US7901863B2 (en) * 2004-01-27 2011-03-08 Asahi Kasei Chemicals Corporation Photosensitive resin composition for laser engravable printing substrate
JP4308687B2 (ja) * 2004-03-11 2009-08-05 富士フイルム株式会社 平版印刷版原版
ATE380117T1 (de) * 2004-04-09 2007-12-15 Fujifilm Corp Flachdruckplattenvorläufer und flachdruckverfahren.
KR101232249B1 (ko) * 2004-08-10 2013-02-12 간또 가가꾸 가부시끼가이샤 반도체 기판 세정액 및 반도체 기판 세정방법
JP2006096838A (ja) * 2004-09-29 2006-04-13 Air Water Chemical Inc エポキシ樹脂の硬化剤、その組成物及びその用途
US6969579B1 (en) 2004-12-21 2005-11-29 Eastman Kodak Company Solvent resistant imageable element
JP4738827B2 (ja) * 2005-02-08 2011-08-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版
US7601482B2 (en) * 2006-03-28 2009-10-13 Az Electronic Materials Usa Corp. Negative photoresist compositions
US7704670B2 (en) * 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US20080131812A1 (en) * 2006-11-30 2008-06-05 Konica Minolta Medical & Graphic, Inc. Resin for printing plate material and lithographic printing plate material by use thereof
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
WO2008104881A1 (en) 2007-02-27 2008-09-04 Az Electronic Materials Usa Corp. Silicon-based antifrelective coating compositions
JP5002399B2 (ja) * 2007-09-28 2012-08-15 富士フイルム株式会社 平版印刷版原版の処理方法
JP5444933B2 (ja) * 2008-08-29 2014-03-19 富士フイルム株式会社 ネガ型平版印刷版原版及びそれを用いる平版印刷方法
TWI497200B (zh) * 2008-09-19 2015-08-21 Jsr Corp 光阻圖型塗佈劑及光阻圖型之形成方法
CN101762982B (zh) * 2008-12-24 2013-03-13 成都新图新材料股份有限公司 一种红外阳图热敏平版印刷版
EP2233288A1 (de) 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Strahlungsempfindliche Zusammensetzung und Verfahren zur Herstellung der strahlungsempfindlichen Zusammensetzung
KR20120066924A (ko) * 2010-12-15 2012-06-25 제일모직주식회사 오르토-니트로벤질 에스테르 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물
US8906594B2 (en) 2012-06-15 2014-12-09 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working thick film photoresist
US9012126B2 (en) 2012-06-15 2015-04-21 Az Electronic Materials (Luxembourg) S.A.R.L. Positive photosensitive material
JP6116954B2 (ja) * 2013-03-22 2017-04-19 旭化成株式会社 感光性樹脂組成物及び硬化レリーフパターンの製造方法
EP3106921A4 (de) 2014-02-12 2017-10-04 Nissan Chemical Industries, Ltd. Filmbildende zusammensetzung mit fluorhaltigem tensid
KR101654463B1 (ko) * 2014-03-06 2016-09-05 주식회사 엘지화학 오프셋 인쇄 조성물, 이를 이용한 인쇄방법 및 오프셋 인쇄 조성물을 포함하는 패턴
CN106164772B (zh) * 2014-03-31 2019-09-03 富士胶片株式会社 感光性树脂组合物、平版印刷版原版及平版印刷版的制作方法
EP3346331A4 (de) 2015-08-31 2018-07-11 FUJIFILM Corporation Lichtempfindliche harzzusammensetzung, lithografische originaldruckplatte und verfahren zur herstellung einer lithografischen druckplatte
TWI731961B (zh) 2016-04-19 2021-07-01 德商馬克專利公司 正向感光材料及形成正向凸紋影像之方法
KR102275345B1 (ko) * 2018-05-16 2021-07-09 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 전자 소자
US20200096865A1 (en) * 2018-09-21 2020-03-26 Eastman Kodak Company Lithographic printing plate precursor and color-forming composition

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3076789A (en) * 1957-07-23 1963-02-05 Du Pont Polyamides from diamines having two deuterium atoms on both chain carbons alpha to the two amino nitrogens
US3072595A (en) * 1959-12-24 1963-01-08 Union Carbide Corp Punk resistant, water-dilutable binder compositions comprising a phenolic resole anda polymeric condensation product of an alkyl ether of dimethylol urea, and mineral fibers bonded therewith
AT293449B (de) 1965-11-24 1971-10-11 Kalle Ag Verfahren zum Herstellen einer Offsetdruckplatte aus vorsensibilisiertem Druckplattenmaterial
DE1447963B2 (de) 1965-11-24 1972-09-07 KaIIe AG, 6202 Wiesbaden Biebnch Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial
US4757108A (en) * 1986-06-18 1988-07-12 Borden, Inc. Water soluble phenolic resole-urea composition
JPH0727208B2 (ja) 1987-04-20 1995-03-29 富士写真フイルム株式会社 感光性組成物
JPH07120041B2 (ja) 1987-05-21 1995-12-20 富士写真フイルム株式会社 感光性組成物
JP2631143B2 (ja) 1989-03-16 1997-07-16 富士写真フイルム株式会社 光重合性組成物
US5372915A (en) 1993-05-19 1994-12-13 Eastman Kodak Company Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer
JP3556756B2 (ja) 1995-04-11 2004-08-25 コダックポリクロームグラフィックス株式会社 感光性組成物及び感光性平版印刷版
JP3583217B2 (ja) 1995-04-11 2004-11-04 コダックポリクロームグラフィックス株式会社 感光性組成物及び感光性平版印刷版
US5731127A (en) * 1995-04-11 1998-03-24 Dainippon Ink And Chemicals, Inc. Photosensitive composition and photosensitive planographic printing plate having a resin with urea bonds in the side chain
JP2000181059A (ja) 1998-10-07 2000-06-30 Mitsubishi Chemicals Corp 感光性組成物、画像形成材料及びそれを用いた画像形成方法
JP2000199950A (ja) 1999-01-07 2000-07-18 Konica Corp 画像形成材料及びそれを用いた画像形成方法
JP2000330265A (ja) 1999-05-24 2000-11-30 Fuji Photo Film Co Ltd 画像形成材料
US6294311B1 (en) * 1999-12-22 2001-09-25 Kodak Polychrome Graphics Llc Lithographic printing plate having high chemical resistance

Also Published As

Publication number Publication date
EP1476786A2 (de) 2004-11-17
WO2003071355A2 (en) 2003-08-28
EP1476786B1 (de) 2010-01-06
US6824947B2 (en) 2004-11-30
WO2003071355A3 (en) 2004-04-22
JP2003315995A (ja) 2003-11-06
JP4184813B2 (ja) 2008-11-19
US20030224281A1 (en) 2003-12-04

Similar Documents

Publication Publication Date Title
DE60330843D1 (de) Lichtempfindliche zusammensetzung, lichtempfindliche flachdruckplatte und verfahren zur herstellung einer flachdruckplatte damit
DE50204080D1 (de) Strahlungsempfindliches Gemisch, damit hergestelltes Aufzeichnungsmaterial, und Verfahren zur Herstellung einer Druckplatte
DE60318600D1 (de) Verfahren zur herstellung einer lithografischen druckplatte
DE60215762D1 (de) Verfahren zur Herstellung einer Mehrfachlodplatte
DE60333438D1 (de) Beschichtete gefässprothesen, verfahren zu deren herstellung und verwendung derselben
DE60331453D1 (de) Kopfs mit elektrostatischer anziehung, verfahren zur herstellung einer düsenplatte
DE69802712D1 (de) Ein durch innenhochdruck umgeformten bauteil, sowie verfahren und vorrichtung zur dessen herstellung
DE50304622D1 (de) Verfahren zur Herstellung einer elastischen, luftdurchlässigen Verbundfolie
DE60313602D1 (de) N-iPHENYL(PIPERIDIN-2-YL)METHYLöBENZAMIDDERIVATE,VERFAHREN ZU IHRER HERSTELLUNG UND IHRE THERAPEUTISCHE ANWENDUNG
DE60325188D1 (de) Verfahren zur herstellung von sterilen, stabilisierten nanodispersionen
DE60332268D1 (de) Druckbehälter und verfahren zur herstellung des druckbehälters
DE60217860D1 (de) Verfahren zur herstellung von haftverschlüssen
DE50300813D1 (de) Neue fluorencarbonsaureester, verfahren zu deren herstellung sowie deren verwendung als arzneimittel
DE60312949D1 (de) Vorrichtung zur Herstellung einer Reifenlage
DE60239075D1 (de) Verfahren zur herstellung einer stahlplatte
DE60336300D1 (de) Verfahren zur herstellung einer beschichteten stahlplatte
DE60329470D1 (de) Vorrichtung zur herstellung von broschüren
ATE506351T1 (de) Verfahren zur herstellung von 10,11-dihydro-10- oxo-5h-dibenzoäb,füazepin-5-carboxamid
ATE388947T1 (de) Escitalopramhydrobromid und ein verfahren zu dessen herstellung
DE60019985D1 (de) Verfahren zur Herstellung eines korrosionsbeständigen Bauteils, und korrosionsbeständiges Bauteil
DE502004010268D1 (de) Bitleitungsstruktur sowie verfahren zu deren herstellung
ATE328010T1 (de) Verfahren zur herstellung von polyisobuten
ATE323677T1 (de) Verfahren zur herstellung von 4-amino-2,5- bisheterocyclylchinazolinen
DE60336822D1 (de) Verfahren zur herstellung von kristallinem 1,2-polybutadien
ATE439447T1 (de) Insektresistente pflanzen und verfahren zu deren herstellung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition