JP4120351B2 - 高濃度酸化スズｉｔｏターゲットとその製造方法 - Google Patents

高濃度酸化スズｉｔｏターゲットとその製造方法 Download PDF

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Publication number
JP4120351B2
JP4120351B2 JP2002307326A JP2002307326A JP4120351B2 JP 4120351 B2 JP4120351 B2 JP 4120351B2 JP 2002307326 A JP2002307326 A JP 2002307326A JP 2002307326 A JP2002307326 A JP 2002307326A JP 4120351 B2 JP4120351 B2 JP 4120351B2
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tin oxide
powder
average particle
density
particle size
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JP2004143484A (ja
JP2004143484A5 (https=
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昌平 水沼
剛 小原
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Sumitomo Metal Mining Co Ltd
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Sumitomo Metal Mining Co Ltd
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JP2002307326A 2002-10-22 2002-10-22 高濃度酸化スズｉｔｏターゲットとその製造方法 Expired - Lifetime JP4120351B2 (ja)

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JP2002307326A JP4120351B2 (ja) 2002-10-22 2002-10-22 高濃度酸化スズｉｔｏターゲットとその製造方法

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JP2002307326A JP4120351B2 (ja) 2002-10-22 2002-10-22 高濃度酸化スズｉｔｏターゲットとその製造方法

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JP2004143484A JP2004143484A (ja) 2004-05-20
JP2004143484A5 JP2004143484A5 (https=) 2005-09-02
JP4120351B2 true JP4120351B2 (ja) 2008-07-16

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009173469A (ja) * 2008-01-22 2009-08-06 Sumitomo Metal Mining Co Ltd 高濃度酸化錫ｉｔｏ焼結体およびその製造方法
KR101240167B1 (ko) 2008-02-13 2013-03-07 삼성코닝정밀소재 주식회사 산화인듐주석 소결체 및 타겟
JP5199023B2 (ja) * 2008-10-24 2013-05-15 三井金属鉱業株式会社 酸化スズ粉末
JP2013256425A (ja) * 2012-06-14 2013-12-26 Sumitomo Metal Mining Co Ltd Ｉｔｏスパッタリングターゲット用酸化スズ粉末、ｉｔｏスパッタリングターゲット用酸化スズおよび酸化インジウムの混合粉末の製造方法、および、ｉｔｏスパッタリングターゲット用焼結体
CN115482965B (zh) * 2022-09-16 2024-06-04 北京高压科学研究中心 一种提升透明导电氧化物电导率和蓝光过滤效率的方法

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