JP4120351B2 - 高濃度酸化スズｉｔｏターゲットとその製造方法 - Google Patents
高濃度酸化スズｉｔｏターゲットとその製造方法 Download PDFInfo
- Publication number
- JP4120351B2 JP4120351B2 JP2002307326A JP2002307326A JP4120351B2 JP 4120351 B2 JP4120351 B2 JP 4120351B2 JP 2002307326 A JP2002307326 A JP 2002307326A JP 2002307326 A JP2002307326 A JP 2002307326A JP 4120351 B2 JP4120351 B2 JP 4120351B2
- Authority
- JP
- Japan
- Prior art keywords
- tin oxide
- powder
- average particle
- density
- particle size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 title claims description 42
- 229910001887 tin oxide Inorganic materials 0.000 title claims description 42
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000843 powder Substances 0.000 claims description 95
- 239000002245 particle Substances 0.000 claims description 59
- 229910003437 indium oxide Inorganic materials 0.000 claims description 18
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 18
- 239000002994 raw material Substances 0.000 claims description 15
- 238000002156 mixing Methods 0.000 claims description 8
- 238000010298 pulverizing process Methods 0.000 claims description 8
- 239000008187 granular material Substances 0.000 claims description 5
- AZWHFTKIBIQKCA-UHFFFAOYSA-N [Sn+2]=O.[O-2].[In+3] Chemical compound [Sn+2]=O.[O-2].[In+3] AZWHFTKIBIQKCA-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- 239000010408 film Substances 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000005245 sintering Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 239000011148 porous material Substances 0.000 description 4
- 238000004220 aggregation Methods 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002307326A JP4120351B2 (ja) | 2002-10-22 | 2002-10-22 | 高濃度酸化スズｉｔｏターゲットとその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002307326A JP4120351B2 (ja) | 2002-10-22 | 2002-10-22 | 高濃度酸化スズｉｔｏターゲットとその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004143484A JP2004143484A (ja) | 2004-05-20 |
| JP2004143484A5 JP2004143484A5 (enrdf_load_stackoverflow) | 2005-09-02 |
| JP4120351B2 true JP4120351B2 (ja) | 2008-07-16 |
Family
ID=32453821
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002307326A Expired - Lifetime JP4120351B2 (ja) | 2002-10-22 | 2002-10-22 | 高濃度酸化スズｉｔｏターゲットとその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4120351B2 (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009173469A (ja) * | 2008-01-22 | 2009-08-06 | Sumitomo Metal Mining Co Ltd | 高濃度酸化錫ｉｔｏ焼結体およびその製造方法 |
| KR101240167B1 (ko) | 2008-02-13 | 2013-03-07 | 삼성코닝정밀소재 주식회사 | 산화인듐주석 소결체 및 타겟 |
| JP5199023B2 (ja) * | 2008-10-24 | 2013-05-15 | 三井金属鉱業株式会社 | 酸化スズ粉末 |
| JP2013256425A (ja) * | 2012-06-14 | 2013-12-26 | Sumitomo Metal Mining Co Ltd | Ｉｔｏスパッタリングターゲット用酸化スズ粉末、ｉｔｏスパッタリングターゲット用酸化スズおよび酸化インジウムの混合粉末の製造方法、および、ｉｔｏスパッタリングターゲット用焼結体 |
| CN115482965B (zh) * | 2022-09-16 | 2024-06-04 | 北京高压科学研究中心 | 一种提升透明导电氧化物电导率和蓝光过滤效率的方法 |
-
2002
- 2002-10-22 JP JP2002307326A patent/JP4120351B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004143484A (ja) | 2004-05-20 |
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