JP4073266B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4073266B2
JP4073266B2 JP2002209680A JP2002209680A JP4073266B2 JP 4073266 B2 JP4073266 B2 JP 4073266B2 JP 2002209680 A JP2002209680 A JP 2002209680A JP 2002209680 A JP2002209680 A JP 2002209680A JP 4073266 B2 JP4073266 B2 JP 4073266B2
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JP
Japan
Prior art keywords
group
alicyclic hydrocarbon
carbon atoms
general formula
hydrocarbon group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002209680A
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English (en)
Japanese (ja)
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JP2004053822A (ja
JP2004053822A5 (US07494231-20090224-C00006.png
Inventor
健一郎 佐藤
敦司 菅崎
一人 國田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002209680A priority Critical patent/JP4073266B2/ja
Publication of JP2004053822A publication Critical patent/JP2004053822A/ja
Publication of JP2004053822A5 publication Critical patent/JP2004053822A5/ja
Application granted granted Critical
Publication of JP4073266B2 publication Critical patent/JP4073266B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2002209680A 2002-07-18 2002-07-18 ポジ型レジスト組成物 Expired - Fee Related JP4073266B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002209680A JP4073266B2 (ja) 2002-07-18 2002-07-18 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002209680A JP4073266B2 (ja) 2002-07-18 2002-07-18 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004053822A JP2004053822A (ja) 2004-02-19
JP2004053822A5 JP2004053822A5 (US07494231-20090224-C00006.png) 2005-09-22
JP4073266B2 true JP4073266B2 (ja) 2008-04-09

Family

ID=31933467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002209680A Expired - Fee Related JP4073266B2 (ja) 2002-07-18 2002-07-18 ポジ型レジスト組成物

Country Status (1)

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JP (1) JP4073266B2 (US07494231-20090224-C00006.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220125240A (ko) 2020-01-06 2022-09-14 제이에스알 가부시끼가이샤 감방사선성 수지 조성물 및 레지스트 패턴의 형성 방법

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4110398B2 (ja) 2003-03-07 2008-07-02 信越化学工業株式会社 α位メチル基に酸素置換基を有する脂環含有メタクリレート化合物
JP4738803B2 (ja) * 2004-12-14 2011-08-03 東京応化工業株式会社 高分子化合物、ポジ型レジスト組成物、およびレジストパターン形成方法
JP2007086514A (ja) * 2005-09-22 2007-04-05 Fujifilm Corp レジスト組成物及びそれを用いたパターン形成方法
TWI430030B (zh) 2005-11-08 2014-03-11 Fujifilm Corp 正型光阻組成物及使用此正型光阻組成物之圖案形成方法
JP5005216B2 (ja) * 2005-12-27 2012-08-22 富士フイルム株式会社 インク組成物
JP5198471B2 (ja) * 2007-02-08 2013-05-15 エルジー・ケム・リミテッド アルカリ現像可能樹脂、その製造方法、および前記アルカリ現像可能樹脂を含む感光性樹脂組成物
JP5052921B2 (ja) * 2007-02-26 2012-10-17 東京応化工業株式会社 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法
KR101948957B1 (ko) * 2011-11-11 2019-02-15 제이에스알 가부시끼가이샤 레지스트 상층막 형성용 조성물, 레지스트 패턴 형성 방법, 화합물, 화합물의 제조 방법 및 중합체
WO2013147267A1 (ja) * 2012-03-30 2013-10-03 Jsr株式会社 液浸上層膜形成用組成物
JP5910445B2 (ja) * 2012-09-28 2016-04-27 Jsr株式会社 液浸上層膜形成用組成物及びレジストパターン形成方法
JP6398793B2 (ja) * 2015-03-02 2018-10-03 Jsr株式会社 感放射線性樹脂組成物、レジストパターン形成方法及び重合体

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220125240A (ko) 2020-01-06 2022-09-14 제이에스알 가부시끼가이샤 감방사선성 수지 조성물 및 레지스트 패턴의 형성 방법

Also Published As

Publication number Publication date
JP2004053822A (ja) 2004-02-19

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