JP4069436B2 - カラーフィルター基板の製造方法 - Google Patents
カラーフィルター基板の製造方法 Download PDFInfo
- Publication number
- JP4069436B2 JP4069436B2 JP2000095412A JP2000095412A JP4069436B2 JP 4069436 B2 JP4069436 B2 JP 4069436B2 JP 2000095412 A JP2000095412 A JP 2000095412A JP 2000095412 A JP2000095412 A JP 2000095412A JP 4069436 B2 JP4069436 B2 JP 4069436B2
- Authority
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- Japan
- Prior art keywords
- transparent conductive
- film
- conductive film
- color filter
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 225
- 238000004519 manufacturing process Methods 0.000 title claims description 43
- 230000001681 protective effect Effects 0.000 claims description 133
- 239000007789 gas Substances 0.000 claims description 62
- 238000004544 sputter deposition Methods 0.000 claims description 58
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 40
- 239000001301 oxygen Substances 0.000 claims description 40
- 229910052760 oxygen Inorganic materials 0.000 claims description 40
- 238000007733 ion plating Methods 0.000 claims description 31
- 230000015572 biosynthetic process Effects 0.000 claims description 29
- 238000004380 ashing Methods 0.000 claims description 27
- 239000004020 conductor Substances 0.000 claims description 24
- 238000004140 cleaning Methods 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 4
- 239000010408 film Substances 0.000 description 594
- 239000004973 liquid crystal related substance Substances 0.000 description 84
- 238000000034 method Methods 0.000 description 64
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 45
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 32
- 238000005530 etching Methods 0.000 description 27
- 230000002829 reductive effect Effects 0.000 description 25
- 239000003566 sealing material Substances 0.000 description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 229910052786 argon Inorganic materials 0.000 description 16
- 239000012298 atmosphere Substances 0.000 description 16
- 239000011521 glass Substances 0.000 description 16
- 230000002441 reversible effect Effects 0.000 description 15
- 238000000151 deposition Methods 0.000 description 14
- 230000008021 deposition Effects 0.000 description 14
- 230000002093 peripheral effect Effects 0.000 description 13
- 230000008569 process Effects 0.000 description 13
- 230000007547 defect Effects 0.000 description 12
- 239000011159 matrix material Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 229910052814 silicon oxide Inorganic materials 0.000 description 7
- 229910052581 Si3N4 Inorganic materials 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- 210000002858 crystal cell Anatomy 0.000 description 4
- 230000010365 information processing Effects 0.000 description 4
- 230000036961 partial effect Effects 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Landscapes
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Manufacturing Of Electric Cables (AREA)
- Optical Filters (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000095412A JP4069436B2 (ja) | 2000-03-30 | 2000-03-30 | カラーフィルター基板の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000095412A JP4069436B2 (ja) | 2000-03-30 | 2000-03-30 | カラーフィルター基板の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001281435A JP2001281435A (ja) | 2001-10-10 |
| JP2001281435A5 JP2001281435A5 (enExample) | 2004-11-18 |
| JP4069436B2 true JP4069436B2 (ja) | 2008-04-02 |
Family
ID=18610315
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000095412A Expired - Fee Related JP4069436B2 (ja) | 2000-03-30 | 2000-03-30 | カラーフィルター基板の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4069436B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4050709B2 (ja) * | 2003-04-01 | 2008-02-20 | セイコーエプソン株式会社 | 電気光学装置及びこの電気光学装置を備えた電子機器 |
| JP2006269338A (ja) * | 2005-03-25 | 2006-10-05 | Dainippon Printing Co Ltd | フレキシブル透明電極基板および有機ｅｌディスプレイデバイス |
| JP4732778B2 (ja) * | 2005-03-28 | 2011-07-27 | パイオニア株式会社 | 有機膜製造方法、有機ｅｌパネル |
| JP2006310070A (ja) * | 2005-04-28 | 2006-11-09 | Dainippon Printing Co Ltd | フレキシブル透明電極基板および有機ｅｌディスプレイデバイス |
| JP4894060B2 (ja) * | 2005-12-26 | 2012-03-07 | 日本電気硝子株式会社 | フラットディスプレイ用ガラス基板 |
| KR20090083197A (ko) | 2008-01-29 | 2009-08-03 | 삼성전자주식회사 | 컬러필터기판의 제조 방법 |
| JP5492479B2 (ja) * | 2009-07-10 | 2014-05-14 | ジオマテック株式会社 | 透明導電膜の製造方法 |
| JP6268773B2 (ja) * | 2013-07-08 | 2018-01-31 | 日亜化学工業株式会社 | 窒化物半導体層にｎ電極を形成する方法及び半導体レーザ素子の製造方法 |
-
2000
- 2000-03-30 JP JP2000095412A patent/JP4069436B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001281435A (ja) | 2001-10-10 |
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