JP4066083B2 - 光学素子光洗浄方法および投影露光装置 - Google Patents

光学素子光洗浄方法および投影露光装置 Download PDF

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Publication number
JP4066083B2
JP4066083B2 JP02730198A JP2730198A JP4066083B2 JP 4066083 B2 JP4066083 B2 JP 4066083B2 JP 02730198 A JP02730198 A JP 02730198A JP 2730198 A JP2730198 A JP 2730198A JP 4066083 B2 JP4066083 B2 JP 4066083B2
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Japan
Prior art keywords
light
cleaning
optical system
exposure
projection
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Expired - Fee Related
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JP02730198A
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Japanese (ja)
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JPH11233402A (ja
JPH11233402A5 (enExample
Inventor
由佳子 松本
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Nikon Corp
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Nikon Corp
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Priority to JP02730198A priority Critical patent/JP4066083B2/ja
Publication of JPH11233402A publication Critical patent/JPH11233402A/ja
Publication of JPH11233402A5 publication Critical patent/JPH11233402A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cleaning In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP02730198A 1998-02-09 1998-02-09 光学素子光洗浄方法および投影露光装置 Expired - Fee Related JP4066083B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02730198A JP4066083B2 (ja) 1998-02-09 1998-02-09 光学素子光洗浄方法および投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02730198A JP4066083B2 (ja) 1998-02-09 1998-02-09 光学素子光洗浄方法および投影露光装置

Publications (3)

Publication Number Publication Date
JPH11233402A JPH11233402A (ja) 1999-08-27
JPH11233402A5 JPH11233402A5 (enExample) 2006-06-15
JP4066083B2 true JP4066083B2 (ja) 2008-03-26

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JP02730198A Expired - Fee Related JP4066083B2 (ja) 1998-02-09 1998-02-09 光学素子光洗浄方法および投影露光装置

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JP (1) JP4066083B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003320329A (ja) * 2002-05-07 2003-11-11 Honda Electronic Co Ltd 超音波洗浄装置
US7580111B2 (en) 2004-05-21 2009-08-25 Jsr Corporation Liquid for immersion exposure and immersion exposure method
JP2007027631A (ja) * 2005-07-21 2007-02-01 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法
JP5025236B2 (ja) * 2006-11-29 2012-09-12 キヤノン株式会社 露光装置及び方法、並びに、デバイス製造方法

Also Published As

Publication number Publication date
JPH11233402A (ja) 1999-08-27

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