JPH11233402A5 - - Google Patents

Info

Publication number
JPH11233402A5
JPH11233402A5 JP1998027301A JP2730198A JPH11233402A5 JP H11233402 A5 JPH11233402 A5 JP H11233402A5 JP 1998027301 A JP1998027301 A JP 1998027301A JP 2730198 A JP2730198 A JP 2730198A JP H11233402 A5 JPH11233402 A5 JP H11233402A5
Authority
JP
Japan
Prior art keywords
cleaning
optical
light
exposure
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998027301A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11233402A (ja
JP4066083B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP02730198A priority Critical patent/JP4066083B2/ja
Priority claimed from JP02730198A external-priority patent/JP4066083B2/ja
Publication of JPH11233402A publication Critical patent/JPH11233402A/ja
Publication of JPH11233402A5 publication Critical patent/JPH11233402A5/ja
Application granted granted Critical
Publication of JP4066083B2 publication Critical patent/JP4066083B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP02730198A 1998-02-09 1998-02-09 光学素子光洗浄方法および投影露光装置 Expired - Fee Related JP4066083B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02730198A JP4066083B2 (ja) 1998-02-09 1998-02-09 光学素子光洗浄方法および投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02730198A JP4066083B2 (ja) 1998-02-09 1998-02-09 光学素子光洗浄方法および投影露光装置

Publications (3)

Publication Number Publication Date
JPH11233402A JPH11233402A (ja) 1999-08-27
JPH11233402A5 true JPH11233402A5 (enExample) 2006-06-15
JP4066083B2 JP4066083B2 (ja) 2008-03-26

Family

ID=12217278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02730198A Expired - Fee Related JP4066083B2 (ja) 1998-02-09 1998-02-09 光学素子光洗浄方法および投影露光装置

Country Status (1)

Country Link
JP (1) JP4066083B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003320329A (ja) * 2002-05-07 2003-11-11 Honda Electronic Co Ltd 超音波洗浄装置
JP3969457B2 (ja) * 2004-05-21 2007-09-05 Ｊｓｒ株式会社 液浸露光用液体および液浸露光方法
JP2007027631A (ja) * 2005-07-21 2007-02-01 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法
JP5025236B2 (ja) * 2006-11-29 2012-09-12 キヤノン株式会社 露光装置及び方法、並びに、デバイス製造方法

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