JP4064943B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP4064943B2 JP4064943B2 JP2004110411A JP2004110411A JP4064943B2 JP 4064943 B2 JP4064943 B2 JP 4064943B2 JP 2004110411 A JP2004110411 A JP 2004110411A JP 2004110411 A JP2004110411 A JP 2004110411A JP 4064943 B2 JP4064943 B2 JP 4064943B2
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- polishing
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- pure water
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- 239000004065 semiconductor Substances 0.000 title claims description 30
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000005498 polishing Methods 0.000 claims description 91
- 238000004140 cleaning Methods 0.000 claims description 54
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 36
- 230000002378 acidificating effect Effects 0.000 claims description 33
- 239000004744 fabric Substances 0.000 claims description 31
- 239000002002 slurry Substances 0.000 claims description 26
- 239000007788 liquid Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 16
- 239000002253 acid Substances 0.000 claims description 10
- 238000012544 monitoring process Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 45
- 230000007547 defect Effects 0.000 description 17
- 239000000463 material Substances 0.000 description 9
- 239000000428 dust Substances 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 6
- 238000011109 contamination Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 3
- 230000003628 erosive effect Effects 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 244000132059 Carica parviflora Species 0.000 description 1
- 235000014653 Carica parviflora Nutrition 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/6723—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one plating chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
- H01L21/02074—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a planarization of conductive layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67219—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one polishing chamber
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Description
前記アルカリ性のスラリーで研磨して前記絶縁膜の表面が露出した被処理面を純水、酸性洗浄液の順で研磨処理し、前記被処理面を酸性にする工程と、
前記被処理面を酸性に保ったまま、前記半導体基板を前記研磨布上から洗浄ユニットに移動させる工程とを具備することを特徴とする。
Cuダマシン配線の形成方法を例に挙げて説明する。図1は、Cu−CMPを示す工程断面図である。
図5に示すように絶縁膜11を、LKD5109(JSR製)からなる第1の絶縁膜(膜厚3000Å)51とLKD27(JSR製)からなる第2の絶縁膜(膜厚1500Å)52との積層膜に変更し、ライナー12をTa/TaN膜53に変更した以外は、図1(a)と同様の構成で、半導体基板10上に各膜を形成した。第2の絶縁膜52の形成に用いたLKD27は、疎水性の材料である。
前述の実施形態2と同様にして、図5に示すようにTa/TaN膜53を露出した。
14…溝; 20…ターンテーブル; 21…研磨布; 22…半導体基板
23…トップリング; 24…水供給ノズル; 25…処理液供給ノズル
26…ドレッサー; 27…処理液; 30…CMP部; 31…洗浄部
32…ターンテーブル; 33…半導体ウェハー; 34…ポリッシングユニット
35…ドレッシングユニット; 36…ウェハー搬送ロボット
37…両面ロール洗浄機; 38…反転機; 39…ペンシル洗浄機
40…カセット; 50…えぐれ; 51…第1の絶縁膜; 52…第2の絶縁膜
53…Ta/TaN膜。
Claims (2)
- 半導体基板上に設けられた凹部を有する絶縁膜上に導電性膜を堆積する工程と、
被処理面としての前記導電性膜の表面を、研磨布上でアルカリ性のスラリーで研磨して、前記導電性膜を前記凹部内に選択的に残置させて前記絶縁膜の表面を露出する工程と、
前記アルカリ性のスラリーで研磨して前記絶縁膜の表面が露出した被処理面を純水、酸性洗浄液の順で研磨処理し、前記被処理面を酸性にする工程と、
前記被処理面を酸性に保ったまま、前記半導体基板を前記研磨布上から洗浄ユニットに移動させる工程とを具備することを特徴とする半導体装置の製造方法。 - 前記絶縁膜の表面が露出した被処理面の研磨処理は、前記研磨布上の酸濃度をモニターしつつ行なわれ、
前記酸性洗浄液を純水に切り替えて、前記被処理面を研磨処理する工程をさらに具備し、
前記半導体基板を前記研磨布上から前記洗浄ユニットに移動させる工程は、前記酸濃度が予め設定された所定値未満になったことを検知して行なわれることを特徴とする請求項1に記載の半導体装置の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004110411A JP4064943B2 (ja) | 2004-04-02 | 2004-04-02 | 半導体装置の製造方法 |
US11/051,624 US20050218008A1 (en) | 2004-04-02 | 2005-01-27 | Method of manufacturing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004110411A JP4064943B2 (ja) | 2004-04-02 | 2004-04-02 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005294707A JP2005294707A (ja) | 2005-10-20 |
JP4064943B2 true JP4064943B2 (ja) | 2008-03-19 |
Family
ID=35053090
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004110411A Expired - Fee Related JP4064943B2 (ja) | 2004-04-02 | 2004-04-02 | 半導体装置の製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20050218008A1 (ja) |
JP (1) | JP4064943B2 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006080138A (ja) * | 2004-09-07 | 2006-03-23 | Matsushita Electric Ind Co Ltd | 半導体ウェハの研磨装置および研磨方法 |
CN102689265B (zh) * | 2011-03-22 | 2015-04-29 | 中芯国际集成电路制造(上海)有限公司 | 化学机械抛光的方法 |
JP2016004903A (ja) | 2014-06-17 | 2016-01-12 | 株式会社東芝 | 研磨装置、研磨方法、及び半導体装置の製造方法 |
US9902038B2 (en) | 2015-02-05 | 2018-02-27 | Toshiba Memory Corporation | Polishing apparatus, polishing method, and semiconductor manufacturing method |
CN106141901A (zh) * | 2015-04-23 | 2016-11-23 | 中芯国际集成电路制造(上海)有限公司 | 晶圆表面的铜层的研磨方法 |
CN114775027B (zh) * | 2022-05-27 | 2024-01-30 | 镇江市联创表面处理科技有限公司 | 一种连续型滚式电镀装置及其使用方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3507628B2 (ja) * | 1996-08-06 | 2004-03-15 | 昭和電工株式会社 | 化学的機械研磨用研磨組成物 |
JP3111979B2 (ja) * | 1998-05-20 | 2000-11-27 | 日本電気株式会社 | ウエハの洗浄方法 |
JP3185753B2 (ja) * | 1998-05-22 | 2001-07-11 | 日本電気株式会社 | 半導体装置の製造方法 |
US6220934B1 (en) * | 1998-07-23 | 2001-04-24 | Micron Technology, Inc. | Method for controlling pH during planarization and cleaning of microelectronic substrates |
US6083840A (en) * | 1998-11-25 | 2000-07-04 | Arch Specialty Chemicals, Inc. | Slurry compositions and method for the chemical-mechanical polishing of copper and copper alloys |
JP3953682B2 (ja) * | 1999-06-02 | 2007-08-08 | 株式会社荏原製作所 | ウエハ洗浄装置 |
JP3563342B2 (ja) * | 2000-11-02 | 2004-09-08 | Necエレクトロニクス株式会社 | Cmp方法および装置、回路形成方法およびシステム、集積回路装置 |
US6455432B1 (en) * | 2000-12-05 | 2002-09-24 | United Microelectronics Corp. | Method for removing carbon-rich particles adhered on a copper surface |
JP4221191B2 (ja) * | 2002-05-16 | 2009-02-12 | 関東化学株式会社 | Cmp後洗浄液組成物 |
JP2004253775A (ja) * | 2003-01-31 | 2004-09-09 | Nec Electronics Corp | 化学機械的研磨方法 |
-
2004
- 2004-04-02 JP JP2004110411A patent/JP4064943B2/ja not_active Expired - Fee Related
-
2005
- 2005-01-27 US US11/051,624 patent/US20050218008A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2005294707A (ja) | 2005-10-20 |
US20050218008A1 (en) | 2005-10-06 |
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