JP3969916B2 - ポジ型フォトレジスト組成物 - Google Patents

ポジ型フォトレジスト組成物 Download PDF

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Publication number
JP3969916B2
JP3969916B2 JP34631699A JP34631699A JP3969916B2 JP 3969916 B2 JP3969916 B2 JP 3969916B2 JP 34631699 A JP34631699 A JP 34631699A JP 34631699 A JP34631699 A JP 34631699A JP 3969916 B2 JP3969916 B2 JP 3969916B2
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JP
Japan
Prior art keywords
group
acid
positive photoresist
photoresist composition
embedded image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP34631699A
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English (en)
Japanese (ja)
Other versions
JP2001166485A5 (enExample
JP2001166485A (ja
Inventor
一良 水谷
昭一郎 安波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP34631699A priority Critical patent/JP3969916B2/ja
Priority to KR1020000073376A priority patent/KR100725462B1/ko
Priority to US09/729,178 priority patent/US6346363B2/en
Priority to TW089125898A priority patent/TW523639B/zh
Publication of JP2001166485A publication Critical patent/JP2001166485A/ja
Publication of JP2001166485A5 publication Critical patent/JP2001166485A5/ja
Application granted granted Critical
Publication of JP3969916B2 publication Critical patent/JP3969916B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP34631699A 1999-12-06 1999-12-06 ポジ型フォトレジスト組成物 Expired - Fee Related JP3969916B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP34631699A JP3969916B2 (ja) 1999-12-06 1999-12-06 ポジ型フォトレジスト組成物
KR1020000073376A KR100725462B1 (ko) 1999-12-06 2000-12-05 포지티브 포토레지스트 조성물
US09/729,178 US6346363B2 (en) 1999-12-06 2000-12-05 Positive photoresist composition
TW089125898A TW523639B (en) 1999-12-06 2000-12-05 Positive photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34631699A JP3969916B2 (ja) 1999-12-06 1999-12-06 ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2001166485A JP2001166485A (ja) 2001-06-22
JP2001166485A5 JP2001166485A5 (enExample) 2005-07-14
JP3969916B2 true JP3969916B2 (ja) 2007-09-05

Family

ID=18382588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34631699A Expired - Fee Related JP3969916B2 (ja) 1999-12-06 1999-12-06 ポジ型フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP3969916B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4141625B2 (ja) * 2000-08-09 2008-08-27 東京応化工業株式会社 ポジ型レジスト組成物およびそのレジスト層を設けた基材
JP4295937B2 (ja) * 2000-12-05 2009-07-15 株式会社Ｋｒｉ 活性成分及びそれを用いた感光性樹脂組成物
KR101390605B1 (ko) * 2006-09-25 2014-04-29 히타치가세이가부시끼가이샤 감방사선성 조성물, 실리카계 피막의 형성방법, 실리카계 피막, 실리카계 피막을 구비하는 장치 및 부재, 및 절연막용 감광제
JPWO2010047138A1 (ja) * 2008-10-21 2012-03-22 日立化成工業株式会社 感光性樹脂組成物、シリカ系被膜の形成方法、及びシリカ系被膜を備える装置及び部材

Also Published As

Publication number Publication date
JP2001166485A (ja) 2001-06-22

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