JP2001166485A5 - - Google Patents
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- Publication number
- JP2001166485A5 JP2001166485A5 JP1999346316A JP34631699A JP2001166485A5 JP 2001166485 A5 JP2001166485 A5 JP 2001166485A5 JP 1999346316 A JP1999346316 A JP 1999346316A JP 34631699 A JP34631699 A JP 34631699A JP 2001166485 A5 JP2001166485 A5 JP 2001166485A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- photoresist composition
- positive photoresist
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims 6
- -1 polysiloxane Polymers 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 229920001296 polysiloxane Polymers 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000000732 arylene group Chemical group 0.000 claims 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 150000002989 phenols Chemical class 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34631699A JP3969916B2 (ja) | 1999-12-06 | 1999-12-06 | ポジ型フォトレジスト組成物 |
| KR1020000073376A KR100725462B1 (ko) | 1999-12-06 | 2000-12-05 | 포지티브 포토레지스트 조성물 |
| TW089125898A TW523639B (en) | 1999-12-06 | 2000-12-05 | Positive photoresist composition |
| US09/729,178 US6346363B2 (en) | 1999-12-06 | 2000-12-05 | Positive photoresist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34631699A JP3969916B2 (ja) | 1999-12-06 | 1999-12-06 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001166485A JP2001166485A (ja) | 2001-06-22 |
| JP2001166485A5 true JP2001166485A5 (enExample) | 2005-07-14 |
| JP3969916B2 JP3969916B2 (ja) | 2007-09-05 |
Family
ID=18382588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34631699A Expired - Fee Related JP3969916B2 (ja) | 1999-12-06 | 1999-12-06 | ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3969916B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4141625B2 (ja) * | 2000-08-09 | 2008-08-27 | 東京応化工業株式会社 | ポジ型レジスト組成物およびそのレジスト層を設けた基材 |
| JP4295937B2 (ja) * | 2000-12-05 | 2009-07-15 | 株式会社Ｋｒｉ | 活性成分及びそれを用いた感光性樹脂組成物 |
| JP5077237B2 (ja) * | 2006-09-25 | 2012-11-21 | 日立化成工業株式会社 | 感放射線性組成物、シリカ系被膜の形成方法、シリカ系被膜、シリカ系被膜を備える装置及び部材、並びに絶縁膜用感光剤 |
| US20120021190A1 (en) * | 2008-10-21 | 2012-01-26 | Aoki Yousuke | Photosensitive resin composition, method for forming silica coating film, and apparatus and member each comprising silica coating film |
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1999
- 1999-12-06 JP JP34631699A patent/JP3969916B2/ja not_active Expired - Fee Related