JP2002278053A5 - - Google Patents
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- JP2002278053A5 JP2002278053A5 JP2001076747A JP2001076747A JP2002278053A5 JP 2002278053 A5 JP2002278053 A5 JP 2002278053A5 JP 2001076747 A JP2001076747 A JP 2001076747A JP 2001076747 A JP2001076747 A JP 2001076747A JP 2002278053 A5 JP2002278053 A5 JP 2002278053A5
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- JP
- Japan
- Prior art keywords
- group
- substituent
- general formula
- carbon atoms
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 125000001424 substituent group Chemical group 0.000 description 7
- 239000002253 acid Substances 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004450 alkenylene group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 125000005556 thienylene group Chemical group 0.000 description 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001076747A JP2002278053A (ja) | 2001-03-16 | 2001-03-16 | ポジ型フォトレジスト組成物 |
| TW091104764A TWI243285B (en) | 2001-03-16 | 2002-03-14 | Positive photoresist composition |
| US10/097,983 US6743562B2 (en) | 2001-03-16 | 2002-03-15 | Positive photoresist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001076747A JP2002278053A (ja) | 2001-03-16 | 2001-03-16 | ポジ型フォトレジスト組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002278053A JP2002278053A (ja) | 2002-09-27 |
| JP2002278053A5 true JP2002278053A5 (enExample) | 2006-01-19 |
Family
ID=18933631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001076747A Pending JP2002278053A (ja) | 2001-03-16 | 2001-03-16 | ポジ型フォトレジスト組成物 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6743562B2 (enExample) |
| JP (1) | JP2002278053A (enExample) |
| TW (1) | TWI243285B (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6657632B2 (en) * | 2001-01-24 | 2003-12-02 | Hewlett-Packard Development Company, L.P. | Unified memory distributed across multiple nodes in a computer graphics system |
| TWI267697B (en) * | 2001-06-28 | 2006-12-01 | Tokyo Ohka Kogyo Co Ltd | Chemical amplified type positive resist component and resist packed-layer material and forming method of resist pattern and manufacturing method of semiconductor device |
| JP4040392B2 (ja) * | 2002-08-22 | 2008-01-30 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
| JP2004334060A (ja) | 2003-05-12 | 2004-11-25 | Shin Etsu Chem Co Ltd | 化学増幅型レジスト用光酸発生剤及びそれを含有するレジスト材料並びにパターン形成方法 |
| KR100583096B1 (ko) * | 2003-06-27 | 2006-05-23 | 주식회사 하이닉스반도체 | 포토레지스트 중합체 및 이를 포함하는 포토레지스트 조성물 |
| TWI332122B (en) | 2005-04-06 | 2010-10-21 | Shinetsu Chemical Co | Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process |
| EP1780198B1 (en) | 2005-10-31 | 2011-10-05 | Shin-Etsu Chemical Co., Ltd. | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
| EP1780199B1 (en) | 2005-10-31 | 2012-02-01 | Shin-Etsu Chemical Co., Ltd. | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
| JP4548617B2 (ja) | 2006-06-09 | 2010-09-22 | 信越化学工業株式会社 | 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法 |
| JP4623311B2 (ja) | 2006-06-14 | 2011-02-02 | 信越化学工業株式会社 | 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法 |
| US20080268839A1 (en) * | 2007-04-27 | 2008-10-30 | Ayers John I | Reducing a number of registration termination massages in a network for cellular devices |
| WO2010082232A1 (ja) * | 2009-01-15 | 2010-07-22 | ダイセル化学工業株式会社 | フォトレジスト用樹脂溶液の製造方法、フォトレジスト組成物およびパターン形成方法 |
| JP5698922B2 (ja) * | 2009-06-26 | 2015-04-08 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 電子デバイスを形成する方法 |
| KR102227564B1 (ko) * | 2014-01-20 | 2021-03-15 | 삼성디스플레이 주식회사 | 포토레지스트 조성물 |
| CN107207456B (zh) | 2015-02-02 | 2021-05-04 | 巴斯夫欧洲公司 | 潜酸及其用途 |
| US11385543B2 (en) | 2016-08-09 | 2022-07-12 | Merck Patent Gmbh | Enviromentally stable, thick film, chemically amplified resist |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2944663A1 (de) | 1979-11-06 | 1981-05-14 | Bayer Ag, 5090 Leverkusen | Imidazolderivate, verfahren zu ihrer herstellung sowie ihre verwendung in arzneimitteln |
| US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| JP3030672B2 (ja) | 1991-06-18 | 2000-04-10 | 和光純薬工業株式会社 | 新規なレジスト材料及びパタ−ン形成方法 |
| JP3665166B2 (ja) * | 1996-07-24 | 2005-06-29 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
| TWI277830B (en) | 1999-01-28 | 2007-04-01 | Sumitomo Chemical Co | Resist composition |
| SG78412A1 (en) | 1999-03-31 | 2001-02-20 | Ciba Sc Holding Ag | Oxime derivatives and the use thereof as latent acids |
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2001
- 2001-03-16 JP JP2001076747A patent/JP2002278053A/ja active Pending
-
2002
- 2002-03-14 TW TW091104764A patent/TWI243285B/zh not_active IP Right Cessation
- 2002-03-15 US US10/097,983 patent/US6743562B2/en not_active Expired - Lifetime