JPH10239846A5 - - Google Patents
Info
- Publication number
- JPH10239846A5 JPH10239846A5 JP1997043974A JP4397497A JPH10239846A5 JP H10239846 A5 JPH10239846 A5 JP H10239846A5 JP 1997043974 A JP1997043974 A JP 1997043974A JP 4397497 A JP4397497 A JP 4397497A JP H10239846 A5 JPH10239846 A5 JP H10239846A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- photoresist composition
- positive photoresist
- resin
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04397497A JP3832780B2 (ja) | 1997-02-27 | 1997-02-27 | ポジ型フォトレジスト組成物 |
| US09/023,801 US6214517B1 (en) | 1997-02-17 | 1998-02-13 | Positive photoresist composition |
| KR1019980004846A KR100560597B1 (ko) | 1997-02-17 | 1998-02-17 | 포지티브형포토레지스트조성물 |
| US09/729,953 US7223516B2 (en) | 1997-02-17 | 2000-12-06 | Positive type photoresist composition |
| KR1020050006341A KR100522487B1 (ko) | 1997-02-17 | 2005-01-24 | 포지티브형 포토레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04397497A JP3832780B2 (ja) | 1997-02-27 | 1997-02-27 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10239846A JPH10239846A (ja) | 1998-09-11 |
| JPH10239846A5 true JPH10239846A5 (enExample) | 2004-10-07 |
| JP3832780B2 JP3832780B2 (ja) | 2006-10-11 |
Family
ID=12678700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04397497A Expired - Lifetime JP3832780B2 (ja) | 1997-02-17 | 1997-02-27 | ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3832780B2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6706826B1 (en) | 1998-03-27 | 2004-03-16 | Mitsubishi Rayon Co., Ltd. | Copolymer, process for producing the same, and resist composition |
| US6787283B1 (en) | 1999-07-22 | 2004-09-07 | Fuji Photo Film Co., Ltd. | Positive photoresist composition for far ultraviolet exposure |
| TW527522B (en) * | 1999-11-09 | 2003-04-11 | Sumitomo Chemical Co | Chemical amplification type resist composition |
| JP4576737B2 (ja) | 2000-06-09 | 2010-11-10 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP4255100B2 (ja) | 2001-04-06 | 2009-04-15 | 富士フイルム株式会社 | ＡｒＦエキシマレ−ザ−露光用ポジ型フォトレジスト組成物及びそれを用いたパタ−ン形成方法 |
| JP4149153B2 (ja) * | 2001-09-28 | 2008-09-10 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| TWI349831B (en) | 2003-02-20 | 2011-10-01 | Maruzen Petrochem Co Ltd | Resist polymer and method for producing the polymer |
| TWI344966B (en) | 2003-03-10 | 2011-07-11 | Maruzen Petrochem Co Ltd | Novel thiol compound, copolymer and method for producing the copolymer |
| JP3759526B2 (ja) | 2003-10-30 | 2006-03-29 | 丸善石油化学株式会社 | 半導体リソグラフィー用共重合体の製造方法 |
| JP3694692B2 (ja) | 2003-12-11 | 2005-09-14 | 丸善石油化学株式会社 | レジスト用ポリマー溶液およびその製造方法 |
-
1997
- 1997-02-27 JP JP04397497A patent/JP3832780B2/ja not_active Expired - Lifetime