JPH10326013A5 - - Google Patents
Info
- Publication number
- JPH10326013A5 JPH10326013A5 JP1997082854A JP8285497A JPH10326013A5 JP H10326013 A5 JPH10326013 A5 JP H10326013A5 JP 1997082854 A JP1997082854 A JP 1997082854A JP 8285497 A JP8285497 A JP 8285497A JP H10326013 A5 JPH10326013 A5 JP H10326013A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alkyl group
- positive photoresist
- deep ultraviolet
- photoresist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08285497A JP3791718B2 (ja) | 1997-03-27 | 1997-04-01 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| KR10-1998-0010768A KR100479275B1 (ko) | 1997-03-27 | 1998-03-27 | 원자외선노광용포지티브포토레지스트조성물 |
| US09/048,787 US6242153B1 (en) | 1997-03-27 | 1998-03-27 | Positive photoresist composition for far ultraviolet ray exposure |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7564397 | 1997-03-27 | ||
| JP9-75643 | 1997-03-27 | ||
| JP08285497A JP3791718B2 (ja) | 1997-03-27 | 1997-04-01 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10326013A JPH10326013A (ja) | 1998-12-08 |
| JPH10326013A5 true JPH10326013A5 (enExample) | 2004-10-07 |
| JP3791718B2 JP3791718B2 (ja) | 2006-06-28 |
Family
ID=26416791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP08285497A Expired - Fee Related JP3791718B2 (ja) | 1997-03-27 | 1997-04-01 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3791718B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4667273B2 (ja) * | 2005-03-04 | 2011-04-06 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| EP1698937B1 (en) | 2005-03-04 | 2015-12-23 | FUJIFILM Corporation | Positive resist composition and pattern-forming method using the same |
| JP5598351B2 (ja) * | 2010-02-16 | 2014-10-01 | 信越化学工業株式会社 | 電子線用又はｅｕｖ用化学増幅ポジ型レジスト組成物及びパターン形成方法 |
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1997
- 1997-04-01 JP JP08285497A patent/JP3791718B2/ja not_active Expired - Fee Related