JPH10282669A5 - - Google Patents
Info
- Publication number
- JPH10282669A5 JPH10282669A5 JP1997055224A JP5522497A JPH10282669A5 JP H10282669 A5 JPH10282669 A5 JP H10282669A5 JP 1997055224 A JP1997055224 A JP 1997055224A JP 5522497 A JP5522497 A JP 5522497A JP H10282669 A5 JPH10282669 A5 JP H10282669A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- groups
- carbon atoms
- branched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05522497A JP3890358B2 (ja) | 1996-03-11 | 1997-03-10 | ポジ型感光性樹脂組成物及びパターン形成方法 |
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5331696 | 1996-03-11 | ||
| JP13891896 | 1996-05-31 | ||
| JP16797696 | 1996-06-27 | ||
| JP9-27111 | 1997-02-10 | ||
| JP2711197 | 1997-02-10 | ||
| JP8-138918 | 1997-02-10 | ||
| JP8-53316 | 1997-02-10 | ||
| JP8-167976 | 1997-02-10 | ||
| JP05522497A JP3890358B2 (ja) | 1996-03-11 | 1997-03-10 | ポジ型感光性樹脂組成物及びパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10282669A JPH10282669A (ja) | 1998-10-23 |
| JPH10282669A5 true JPH10282669A5 (enExample) | 2004-10-07 |
| JP3890358B2 JP3890358B2 (ja) | 2007-03-07 |
Family
ID=27520898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP05522497A Expired - Fee Related JP3890358B2 (ja) | 1996-03-11 | 1997-03-10 | ポジ型感光性樹脂組成物及びパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3890358B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001125268A (ja) * | 1999-10-28 | 2001-05-11 | Sony Corp | 露光方法 |
| JP4177966B2 (ja) * | 2001-01-25 | 2008-11-05 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
| JP2002229210A (ja) * | 2001-02-06 | 2002-08-14 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| US7678528B2 (en) * | 2005-11-16 | 2010-03-16 | Az Electronic Materials Usa Corp. | Photoactive compounds |
| JP2008120700A (ja) * | 2006-11-08 | 2008-05-29 | San Apro Kk | スルホニウム塩 |
| JP5514583B2 (ja) | 2009-03-13 | 2014-06-04 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物及び該組成物を用いたパターン形成方法 |
| JP7763576B2 (ja) * | 2018-07-11 | 2025-11-04 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| KR102867844B1 (ko) * | 2019-11-12 | 2025-10-01 | 도요 고세이 고교 가부시키가이샤 | 술포늄염, 산 발생제, 레지스트 조성물 및 디바이스의 제조 방법 |
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1997
- 1997-03-10 JP JP05522497A patent/JP3890358B2/ja not_active Expired - Fee Related