JPH11305439A5 - - Google Patents
Info
- Publication number
- JPH11305439A5 JPH11305439A5 JP1998112196A JP11219698A JPH11305439A5 JP H11305439 A5 JPH11305439 A5 JP H11305439A5 JP 1998112196 A JP1998112196 A JP 1998112196A JP 11219698 A JP11219698 A JP 11219698A JP H11305439 A5 JPH11305439 A5 JP H11305439A5
- Authority
- JP
- Japan
- Prior art keywords
- acid
- photosensitive composition
- action
- composition according
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11219698A JP3851440B2 (ja) | 1998-04-22 | 1998-04-22 | ポジ型感光性組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11219698A JP3851440B2 (ja) | 1998-04-22 | 1998-04-22 | ポジ型感光性組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11305439A JPH11305439A (ja) | 1999-11-05 |
| JPH11305439A5 true JPH11305439A5 (enExample) | 2005-02-24 |
| JP3851440B2 JP3851440B2 (ja) | 2006-11-29 |
Family
ID=14580677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11219698A Expired - Lifetime JP3851440B2 (ja) | 1998-04-22 | 1998-04-22 | ポジ型感光性組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3851440B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4328428B2 (ja) * | 1999-11-08 | 2009-09-09 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4177952B2 (ja) * | 2000-05-22 | 2008-11-05 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP2002006483A (ja) * | 2000-06-20 | 2002-01-09 | Sumitomo Chem Co Ltd | フォトレジスト組成物 |
| US6692897B2 (en) * | 2000-07-12 | 2004-02-17 | Fuji Photo Film Co., Ltd. | Positive resist composition |
| JP2006096965A (ja) | 2004-02-20 | 2006-04-13 | Tokyo Ohka Kogyo Co Ltd | 高分子化合物、該高分子化合物を含有するフォトレジスト組成物、およびレジストパターン形成方法 |
| JP2006291160A (ja) * | 2005-03-14 | 2006-10-26 | Fuji Photo Film Co Ltd | 膜形成用組成物、それを用いた絶縁膜および電子デバイス |
| US10520813B2 (en) * | 2016-12-15 | 2019-12-31 | Taiwan Semiconductor Manufacturing Co., Ltd | Extreme ultraviolet photoresist with high-efficiency electron transfer |
-
1998
- 1998-04-22 JP JP11219698A patent/JP3851440B2/ja not_active Expired - Lifetime