JPH11327145A5 - - Google Patents
Info
- Publication number
- JPH11327145A5 JPH11327145A5 JP1998132291A JP13229198A JPH11327145A5 JP H11327145 A5 JPH11327145 A5 JP H11327145A5 JP 1998132291 A JP1998132291 A JP 1998132291A JP 13229198 A JP13229198 A JP 13229198A JP H11327145 A5 JPH11327145 A5 JP H11327145A5
- Authority
- JP
- Japan
- Prior art keywords
- acid
- resin composition
- photosensitive resin
- positive photosensitive
- action
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13229198A JP3901342B2 (ja) | 1998-05-14 | 1998-05-14 | ポジ型感光性樹脂組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13229198A JP3901342B2 (ja) | 1998-05-14 | 1998-05-14 | ポジ型感光性樹脂組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11327145A JPH11327145A (ja) | 1999-11-26 |
| JPH11327145A5 true JPH11327145A5 (enExample) | 2005-02-24 |
| JP3901342B2 JP3901342B2 (ja) | 2007-04-04 |
Family
ID=15077863
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13229198A Expired - Fee Related JP3901342B2 (ja) | 1998-05-14 | 1998-05-14 | ポジ型感光性樹脂組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3901342B2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002006483A (ja) * | 2000-06-20 | 2002-01-09 | Sumitomo Chem Co Ltd | フォトレジスト組成物 |
| JP2002062667A (ja) * | 2000-08-23 | 2002-02-28 | Sumitomo Chem Co Ltd | 微粒子量の低減されたフォトレジスト組成物の製造方法 |
| JP4067284B2 (ja) * | 2001-03-12 | 2008-03-26 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4710193B2 (ja) * | 2001-08-01 | 2011-06-29 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP3874092B2 (ja) | 2001-12-26 | 2007-01-31 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| EP1324134B1 (en) | 2001-12-27 | 2010-10-20 | Shin-Etsu Chemical Co., Ltd. | Resist composition and patterning process |
| JP3912516B2 (ja) | 2002-08-09 | 2007-05-09 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| AU2003287194A1 (en) * | 2002-10-21 | 2004-05-13 | Shipley Company L.L.C. | Photoresists containing sulfonamide component |
| JP4724465B2 (ja) | 2005-05-23 | 2011-07-13 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| CN111393336A (zh) * | 2020-03-09 | 2020-07-10 | 华东师范大学 | 磺胺类化合物及其无金属催化的构建方法和应用 |
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1998
- 1998-05-14 JP JP13229198A patent/JP3901342B2/ja not_active Expired - Fee Related